The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.

The disclosure relates to an electron-optical module of an electron-optical apparatus. The electron-optical module comprises a vacuum chamber, a high voltage shielding arrangement located within the vacuum chamber, and an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement. Wherein the electron-optical module can be configured to be removable from the electron-optical apparatus.

In one example, a workpiece support structure of a plasma treatment chamber has upper and lower ends, and first and second support members that extend between the upper and lower ends. The support members are electrically isolated from one another and offset from one another along a horizontal direction so as to define a cavity therebetween. The first and second support members support electrodes within the cavity such that (1) the electrodes are offset from one another along the vertical direction, (2) the electrodes extend between the first and second support members along the first horizontal direction, (3) a first set of the electrodes are electrically coupled to the first support member and electrically isolated from the second support member, and (4) a second set of the electrodes, different from the first set, are electrically coupled to the second support member and electrically isolated from the first support member.

A fixed outer support flange (flange 1) is formed to circumscribe an electrode within a plasma processing system. Flange 1 has a vertical portion and a horizontal portion extending radially outward from a lower end of the vertical portion. An articulating outer support flange (flange 2) is formed to circumscribe flange 1. Flange 2 has a vertical portion and a horizontal portion extending radially outward from a lower end of the vertical portion. The vertical portion of flange 2 is positioned concentrically outside of the vertical portion of flange 1. Flange 2 is spaced apart from flange 1 and moveable along the vertical portion of flange 1. Each of a plurality of electrically conductive straps has a first end portion connected to flange 2 and a second end portion connected to flange 1.

Provided is an aberration corrector having a plurality of magnetic poles including a first magnetic pole and further magnetic poles, a ring that magnetically connects the plurality of magnetic poles with one another, the ring having a constant spacing to at least the first magnetic pole, a plurality of magnetic field modulators including a first magnetic field modulator and further magnetic field modulators, and a plurality of guides including a first guide and further guides; wherein the first magnetic field modulator includes a soft magnetic material, wherein the first magnetic field modulator is disposed in a first position, the first position being one of the following: adjacent to a first air gap separating the first magnetic pole and the ring, or at an inner ring surface or radially outward of the inner ring surface along an axis of the first magnetic pole, and wherein the first guide constrains the first magnetic field modulator to positions along a first axis substantially parallel to or coincident with the axis of the first magnetic pole.

An interlocking fastening upper electrode assembly having an improved fastening force is proposed. The assembly is configured such that a bush inserted into a silicon electrode protrudes above the silicon electrode, and the protruding portion is inserted into and coupled to an anodizing plate so as to suppress rotation of the bush, the assembly including: an inner and outer tab composite nut coupled to an assembly groove of the silicon electrode and an anodizing plate so as to prevent rotation; an inner and outer tab nut assembled in the assembly groove of the silicon electrode and fitted to the outside of the inner and outer tab composite nut; and an assembly module coupled through the inside of a through part of the anodizing plate and assembled with the inner and outer tab composite nut in order to fix the anodizing plate provided above the silicon electrode.

A collimated electron beam is illuminated to a grounded metal mask such that patterns on the mask can be transferred to a substrate identically. In a preferred embodiment, a linear electron source can be provided for enhancing lithographic throughput. The metal mask is adjacent to the substrate, but does not contact with substrate.

A cathode mechanism of an electron emission source includes a crystal that includes an upper part being columnar, truncated conical, or their combined shape, and having a first surface to emit thermoelectrons, and a lower part, integrated with the upper part, having a second surface substantially parallel to the first surface, and a diameter larger than the maximum diameter of the upper part, a holding part that is a column having, in order from the holding part upper side, different inner diameters of a first diameter and a second diameter larger than the first one, and that holds the crystal in the state where the crystal first surface is projecting from the upper surface, and the crystal second surface contacts the holding part inside the column, and a retaining part that retains the crystal, at the back of the crystal lower part, not to be separated from the holding part.

The present disclosure provides a magnetic immersion electron gun and a method of generating an electron beam using a magnetic immersion electron gun. The electron gun includes a magnetic lens forming a magnetic field, a cathode tip disposed in the magnetic field, and a multi-filament heater configured to directly heat the cathode tip to emit electrons through the magnetic lens. The multi-filament heater includes a first filament connected at each end to first and second positive terminals of a power source and a second filament connected at each end to first and second negative terminals of the power source. The first positive terminal, the second positive terminal, the first negative terminal, and the second negative terminal are arranged alternately around the cathode tip such that the first filament and the second filament intersect at the cathode tip and a resultant magnetic force applied to the cathode tip is reduced.

Provided is a substrate processing apparatus. The substrate processing apparatus may include a chamber having an inner space, an electrode configured to generate plasma in the inner space, and a power supply unit configured to apply an RF voltage to the electrode, in which the power supply unit may include a first power supply configured to apply a first pulse voltage having a first frequency to the electrode, a second power supply configured to apply a second pulse voltage having a second frequency different from the first frequency to the electrode, a third power supply configured to apply an RF voltage having a third frequency different from the first frequency and the second frequency, and a phase control member for controlling at least one of the phases of the first pulse voltage and the second pulse voltage.