An interference optical system unit includes at least one electromagnetic lens that forms an image of a charged particle beam, at least one charged particle beam biprism, and a support member for the electromagnetic lens and the charged particle beam biprism. The electromagnetic lens, the charged particle beam biprism, the support member, and a space to an image plane of the electromagnetic lens are integrally configured as one unit. The interference optical system unit is disposed to have an optical axis coaxialized with an optical axis of an imaging optical system of an upstream stage that is disposed on an upstream side of the unit in a flow direction of the charged particle beam. A focal length of the electromagnetic lens and a deflection angle of the charged particle beam given by the charged particle beam biprism are controlled to generate an interference fringe of the charged particle beam on the image plane of the electromagnetic lens.

An electron microscope that measures electromagnetic field information separates an electric field distribution and a magnetic field distribution of a specimen with high precision to measure the electromagnetic field information. The electron microscope is configured with an electron source 1, an electron gun deflection coil 3, converging lenses 4a and 4b, an irradiation system astigmatic compensation coil 5, irradiation system deflection coils 6a and 6b, a magnetic field application coil 8, an objective lens 11, an imaging system astigmatic compensation coil 12, imaging system deflection coils 13a and 13b, a magnifying lens 17, an electron detector 18, a control analysis apparatus 20, and the like, and the control analysis apparatus 20 repeats a plurality of times measurement of first electromagnetic field information with an output signal from the electron detector by exercising first electron beam control after a first magnetic field is applied to the specimen 10 and then measurement of second electromagnetic field information similarly by exercising second electron beam control after a second magnetic field is applied to the specimen, and separates and measures an electric field distribution and a magnetic field distribution with high precision from the obtained first and second electromagnetic field information.

An electron microscope that measures electromagnetic field information separates an electric field distribution and a magnetic field distribution of a specimen with high precision to measure the electromagnetic field information. The electron microscope is configured with an electron source 1, an electron gun deflection coil 3, converging lenses 4a and 4b, an irradiation system astigmatic compensation coil 5, irradiation system deflection coils 6a and 6b, a magnetic field application coil 8, an objective lens 11, an imaging system astigmatic compensation coil 12, imaging system deflection coils 13a and 13b, a magnifying lens 17, an electron detector 18, a control analysis apparatus 20, and the like, and the control analysis apparatus 20 repeats a plurality of times measurement of first electromagnetic field information with an output signal from the electron detector by exercising first electron beam control after a first magnetic field is applied to the specimen 10 and then measurement of second electromagnetic field information similarly by exercising second electron beam control after a second magnetic field is applied to the specimen, and separates and measures an electric field distribution and a magnetic field distribution with high precision from the obtained first and second electromagnetic field information.

An interference optical system unit includes at least one electromagnetic lens that forms an image of a charged particle beam, at least one charged particle beam biprism, and a support member for the electromagnetic lens and the charged particle beam biprism. The electromagnetic lens, the charged particle beam biprism, the support member, and a space to an image plane of the electromagnetic lens are integrally configured as one unit. The interference optical system unit is disposed to have an optical axis coaxialized with an optical axis of an imaging optical system of an upstream stage that is disposed on an upstream side of the unit in a flow direction of the charged particle beam. A focal length of the electromagnetic lens and a deflection angle of the charged particle beam given by the charged particle beam biprism are controlled to generate an interference fringe of the charged particle beam on the image plane of the electromagnetic lens.

Systems, devices, methods, and techniques for energy-loss spectroscopy at relatively large energy losses are described. A charged particle microscope system can include a beam column section. The beam column section can include one or more charged particle optical elements calibrated for a first energy and one or more charged particle optical elements calibrated for a second energy. The charged particle microscope system can include a detector section. The detector section can be disposed at a position downstream of the beam column section. The detector section can include an electrostatic or magnetic prism and one or more charged particle optical elements calibrated for the second energy. The first energy and the second energy can be different.

Multipole elements and charged particle microscope systems including the same. In an example, an apparatus can include plurality of electrodes including a first shape subset and a second shape subset. Each electrode of the first shape subset includes an electrode active surface with a shape that is different than that of each electrode of the second shape subset. In another example, an apparatus can include a plurality of electrodes including a first side subset and a second side subset. Each electrode includes an electrode extension extending along a first lateral direction or a second lateral direction. In another example, an apparatus can include an optical column with a plurality of multipole elements that are fully contained within a first angular envelope that subtends a first angle that is at most 50 degrees while the working distance is at most 10 mm.

Aberration correction systems and charged particle microscope systems including the same. An apparatus can include a plurality of electrostatic multipole elements configured to at least partially correct an axial chromatic aberration of the charged particle beam. The apparatus additionally includes a deflector assembly with a corrector electrostatic prism. The corrector electrostatic prism can include a first corrector prism electrode and a second corrector prism electrode that define an electrode gap therebetween and a deflector optical axis extends within the electrode gap. The plurality of electrostatic multipole elements can include a first hexapole-generating element, a second hexapole-generating element, a third hexapole-generating element, and/or a fourth hexapole-generating element. In some examples, the second hexapole-generating element is positioned proximate to a midpoint of the deflector optical axis. In some examples, each of the second hexapole-generating element and the third hexapole-generating element is positioned at least partially within the corrector electrostatic prism.