A stage device is disposed in a vacuum environment and moves a target placed on the stage device, the stage device including: a guide rail that is laid on a base; a carriage that moves along the guide rail; rolling elements that come into contact with the guide rail and the carriage and rotate along with the movement of the carriage; a table that is connected to a part of the carriage and moves along with the carriage; and a blocking cover that is provided to cover a normal direction of a guide surface of the guide rail and blocks foreign matter scattered from the guide rail, the carriage, or the rolling elements.

An immersion objective lens is configured below a stage such that multiple detectors can be configured above sample for large beam current application, particularly for defect inspection. Central pole piece of the immersion objective lens thus can be provided that a magnetic monopole-like field can be provided for electron beam. Auger electron detector thus can be configured to analyze materials of sample in the defect inspection.

An object of the present invention is to provide a technique for reducing a phenomenon in which fine particles derived from a sample and bounced off by ion beam irradiation are reattached to an ion milling surface. An ion milling device of the invention includes an ion source which emits an ion beam, a chamber, a sample table in which a sample is placed in the chamber, and a shielding plate placed on the sample, and by having a magnet disposed in the chamber, reattachment of fine particles derived from the sample can be reduced.

An object of the present invention is to provide a technique for reducing a phenomenon in which fine particles derived from a sample and bounced off by ion beam irradiation are reattached to an ion milling surface. An ion milling device of the invention includes an ion source which emits an ion beam, a chamber, a sample table in which a sample is placed in the chamber, and a shielding plate placed on the sample, and by having a magnet disposed in the chamber, reattachment of fine particles derived from the sample can be reduced.

An immersion objective lens is configured below a stage such that multiple detectors can be configured above sample for large beam current application, particularly for defect inspection. Central pole piece of the immersion objective lens thus can be provided that a magnetic monopole-like field can be provided for electron beam. Auger electron detector thus can be configured to analyze materials of sample in the defect inspection.

A sample holder used for a sample processing apparatus that applies a charged particle beam to a sample to process the sample. The sample holder includes a holder base thermally connected to a cooling source, a rotating body rotatably supported on the holder base to hold the sample, and a drive unit that rotates the rotating body. The rotating body has a sliding surface that comes into slidable surface contact with the holder base.

An apparatus includes a wall defining a boundary of an evacuated space and having a first side interior to the evacuated space and a second side exterior to the evacuated space, a first plate positioned on a first side of the wall and including a first magnet, a second plate positioned on a second side of the wall and including a second magnet, and a motor mechanically coupled to the second plate and configured to drive rotation of the second plate. The second magnet exerts an attractive force on the first magnet that causes rotation of the first plate in response to the rotation of the second plate.

An object is to provide a stage device capable of preventing thermal deformation of a stage and improving positioning accuracy in positioning the stage even in a method in which a Peltier element is arranged on a stage on the stationary side, and a charged particle beam device including the stage device. Provided are a stage device having a first stage that moves linearly, a first fin having a comb-like cross-sectional shape and extending in the linear movement direction of the first stage, a second stage having a second fin disposed opposite the first fin and being stationary in relation to the first stage, a heat transfer mechanism that transfers heat between the first fin and the second fin while maintaining a non-contact relation therebetween, a Peltier module between the second fin and the second stage with one heat transfer surface of the Peltier module in contact with the second fin and the other heat transfer surface in contact with the second stage, and a control unit to control the temperature of the second fin by the Peltier module, and a charged particle beam device including the stage device.