A micro-electromechanical system (MEMS) device includes a silicon substrate; and a Tantalum (Ta) layer comprising a first portion and a second portion, a first portion being suspended over the silicon substrate and configured to move relative to the silicon substrate, and the second portion of the structure being coupled to the silicon substrate and fixed in place relative to the silicon substrate.

An e-beam inspection tool is disclosed, the tool comprising, an electron optics system configured to generate an electron beam, an object table configured to hold a specimen, a positioning device configured to position the object table, the positioning device comprising an actuator, wherein the positioning device further comprises a heating device configured to generate a heat load and a heat load controller to control the generated heat load at least partly based on an actuator heat load generated in the actuator.

In at least one embodiment, a specimen holder includes a specimen holder shaft unit having a specimen and/or specimen mesh setting unit, an outer tubular unit capable of housing the specimen holder shaft unit, a thermal drift adjusting unit made of a material having a different thermal expansion coefficient from a thermal expansion coefficient of the specimen holder shaft unit and partially in contact with the specimen holder shaft unit, and a control mechanism which controls movement of the thermal drift adjusting unit toward a center direction of a specimen.

An e-beam inspection tool is disclosed, the tool comprising, an electron optics system configured to generate an electron beam, an object table configured to hold a specimen, a positioning device configured to position the object table, the positioning device comprising an actuator, wherein the positioning device further comprises a heating device configured to generate a heat load and a heat load controller to control the generated heat load at least partly based on an actuator heat load generated in the actuator.

In at least one embodiment, a specimen holder includes a specimen holder shaft unit having a specimen and/or specimen mesh setting unit, an outer tubular unit capable of housing the specimen holder shaft unit, a thermal drift adjusting unit made of a material having a different thermal expansion coefficient from a thermal expansion coefficient of the specimen holder shaft unit and partially in contact with the specimen holder shaft unit, and a control mechanism which controls movement of the thermal drift adjusting unit toward a center direction of a specimen.

To provide a stage device and a charged particle beam device using the same capable of effectively suppressing thermal deformation of a stage generated by temperature increase caused by heat generated by a linear motor. The stage device including a table, a linear motor driving the table in a prescribed direction, in which the table and a moving part of the linear motor are connected by components, a slide unit is attached to the component, movement of which is constrained by a rail fixed to a base, and at the same time, the slide unit is positioned vertically below a place where the component is joined to the table, thereby suppressing thermal deformation of the table.

The present invention aims at providing an ion milling apparatus for emitting an ion beam to a sample to process the sample and capable of controlling the temperature of the sample with high accuracy regardless of deformation or the like of the sample being irradiated with the ion beam, and proposes an ion milling apparatus including at least one of a shield holding member for supporting a shield for shielding the sample from the ion beam while exposing a part of the sample to the ion beam; a shifting mechanism for shifting a surface of the sample stand in contact with the sample following deformation of the sample during irradiation with the ion beam, the shifting mechanism having a temperature control mechanism for controlling temperature of at least one of the shield holding member and the sample stand; and a sample holding member disposed between the shield and the sample, the sample holding member deforming following deformation of the sample during irradiation with the ion beam, for example.

An object is to provide a stage device capable of preventing thermal deformation of a stage and improving positioning accuracy in positioning the stage even in a method in which a Peltier element is arranged on a stage on the stationary side, and a charged particle beam device including the stage device. Provided are a stage device having a first stage that moves linearly, a first fin having a comb-like cross-sectional shape and extending in the linear movement direction of the first stage, a second stage having a second fin disposed opposite the first fin and being stationary in relation to the first stage, a heat transfer mechanism that transfers heat between the first fin and the second fin while maintaining a non-contact relation therebetween, a Peltier module between the second fin and the second stage with one heat transfer surface of the Peltier module in contact with the second fin and the other heat transfer surface in contact with the second stage, and a control unit to control the temperature of the second fin by the Peltier module, and a charged particle beam device including the stage device.

A micro-electromechanical system (MEMS) device includes a silicon substrate; and a Tantalum (Ta) layer comprising a first portion and a second portion, a first portion being suspended over the silicon substrate and configured to move relative to the silicon substrate, and the second portion of the structure being coupled to the silicon substrate and fixed in place relative to the silicon substrate.