H01J27/022

High propellant throughput hall-effect thrusters

High propellant throughput Hall-effect thrusters (HETs) and components thereof are disclosed. A compact and high propellant throughput HET has an improved magnetic circuit that mostly shields the discharge chamber walls from high-energy ionized propellant, low-profile sacrificial pole covers to delay magnetic pole erosion, a unique discharge chamber subassembly, a mechanically crimped cathode emitter retainer to increase efficiency, a center-mounted hollow cathode, or a combination thereof. Such feature(s) may balance propellant throughput and thruster performance, minimize the volume of the thruster envelope, and/or simplify the thruster assembly.

Crucible Design For Liquid Metal In An Ion Source

A crucible that exploits the observation that molten metal tends to flow toward the hottest regions is disclosed. The crucible includes an interior in which dopant material may be disposed. The crucible has a pathway leading from the interior toward an aperture, wherein the temperature is continuously increasing along the pathway. The aperture may be disposed in or near the interior of the arc chamber of an ion source. The liquid metal flows along the pathway toward the arc chamber, where it is vaporized and then ionized. By controlling the flow rate of the pathway, spillage may be reduced. In another embodiment, an inverted crucible is disclosed. The inverted crucible comprises a closed end in communication with the interior of the ion source, so that the closed end is the hottest region of the crucible. An opening is disposed on a different wall to allow vapor to exit the crucible.

Extended Cathode And Repeller Life By Active Management Of Halogen Cycle

A system and method for extending the life of a cathode and repeller in an IHC ion source is disclosed. The system monitors the health of the cathode by operating using a known set of parameters and measuring the bias power used to generate the desired extracted beam current or the desired current from the arc voltage power supply. Based on the measured bias power, the system may determine whether the cathode is becoming too thin, and may take a corrective action. This corrective action may be to alert the operator; to operate the IHC ion source using a predetermined set of parameters; or to change the dilution used within the IHC source. By performing these actions, the life of the cathode may be more than doubled.

Ion source having a magnetic field translatable along an axis of the source
11574788 · 2023-02-07 · ·

An ion source has a vacuum envelope structure having a cylindrical portion with a lengthwise axis and an inside diameter defining an interior volume, joined at one end to a flange concentric with the axis, the cylindrical portion open by an exit aperture through the flange and open at an end opposite the flange, an RF feedthrough closing the open end of the cylindrical portion opposite the flange, creating a cylindrical interior volume open only through the exit aperture, and a magnet system carrier structure surrounding the cylindrical portion of the vacuum envelope and carrying at least one annular permanent magnet concentric with the lengthwise axis, providing a magnetic field penetrating the interior volume. The ion source is characterized in that the magnet system carrier structure is translatable along the lengthwise axis enabling variable positioning of the magnetic field in the interior volume along the lengthwise axis.

Apparatus and method for operating a heaterless hollow cathode, and an electric space propulsion system employing such a cathode

A heaterless hollow cathode provides electron emission current in an electric space propulsion system. A mechanical, thermal, and electromagnetic design of the cathode apparatus is presented, and a method of operation for rapid ignition and stabilization of the cathode is provided. The keeper of the cathode apparatus has a thickness change which reduces the flow of heat away from the cathode's emitter assembly. The method for heating the emitter assembly includes controlling applied voltages so that the current flowing from the emitter assembly to the keeper is maintained at a predetermined fixed value. By this method, damage to the electron emitting surfaces of the emitter assembly by electric arcing and/or by depletion of dopant materials is avoided.

Ion source with single-slot tubular cathode

An ion source including a chamber housing defining an ion source chamber and including an extraction plate on a front side thereof, the extraction plate having an extraction aperture formed therein, and a tubular cathode disposed within the ion source chamber and having an opening formed in a front half thereof nearest the extraction aperture, wherein a rear half of the tubular cathode furthest from the extraction aperture is closed.

Extended cathode and repeller life by active management of halogen cycle

A system and method for extending the life of a cathode and repeller in an IHC ion source is disclosed. The system monitors the health of the cathode by operating using a known set of parameters and measuring the bias power used to generate the desired extracted beam current or the desired current from the arc voltage power supply. Based on the measured bias power, the system may determine whether the cathode is becoming too thin, and may take a corrective action. This corrective action may be to alert the operator; to operate the IHC ion source using a predetermined set of parameters; or to change the dilution used within the IHC source. By performing these actions, the life of the cathode may be more than doubled.

ADJUSTABLE SUPPORT FOR ARC CHAMBER OF ION SOURCE
20220336181 · 2022-10-20 ·

An assembly present in an ion source for supporting an arc chamber upon a base plate includes a first arc support plate, a first screw, and a second screw. The first screw passes through a smooth through-hole in an arm of the first arc support plate and extends into a bore in the base plate. The second (or adjustable) screw passes through a threaded through-hole in an arm of the first arc support plate and engages an upper surface of the base plate itself, and can be used to change the altitude and angle of the first arc support plate relative to the base plate. This adjustment ability improves the beam quality of the ion source.

ION SOURCE REPELLER
20220319796 · 2022-10-06 ·

An ion source has an arc chamber having one or more arc chamber walls defining and interior region of the arc chamber. A cathode electrode is disposed along an axis. A repeller has a repeller shaft and a ceramic target member separated by a gap. The repeller shaft is not in electrical or mechanical contact with the target member, and the repeller shaft is configured to indirectly heat the target member. The target member, can be a cylinder encircling the repeller shaft, where the gap separates the cylinder from the repeller shaft. A top cap can enclose the cylinder can be separated from a top repeller surface of the repeller shaft by the gap. A target hole can be in the top cap. The target member can be supported by a bottom liner of the arc chamber or a support member mechanically and electrically coupled to the repeller shaft.

GAS INLET FOR AN ION THRUSTER
20170316909 · 2017-11-02 ·

A gas inlet suitable in particular for use in an ion thruster includes a housing which is made of a gas-tight ceramics material, and an insert which is arranged in the housing and is made of a porous ceramics material. The geometry and pore structure of the insert are such that the insert forms a desired flow resistance for a gas stream flowing through the insert.