Certain configurations of plasma discharge chambers and plasma ionization sources comprising a plasma discharge chamber are described. In some examples, the discharge chamber comprises a conductive area and is configured to sustain a plasma discharge within the discharge chamber. In other examples, the discharge chamber comprises at least one inlet configured to receive a plasma gas and at least one outlet configured to provide ionized analyte from the discharge chamber. Systems and methods using the discharge chambers are also described.

An ionizer 1 including an ionization chamber 10, a sample gas introduction port 14 provided in the ionization chamber 10 for introducing sample gas, an electron beam emitting section 11 which emits an electron beam toward the ionization chamber 10, electron beam passage openings 10a and 10b which are formed on a path of the electron beam emitted from the electron beam emitting section 11 on a wall of the ionization chamber 10 and has a length in a direction of the path longer than a width of a cross section orthogonal to the direction, and an ion outlet 10c provided in the ionization chamber 10 for emitting an ion of the sample gas generated by irradiation with the electron beam, and a mass spectrometer 60 including the ionizer 1.

One example embodiment includes one or more current-controlled electrodes exposed to a fluid and configured to generate ions in the fluid within an electric field, one or more current-controlling elements having one or more current-limiting elements configured to limit an amount of current permitted in the one or more current-controlled electrodes, and one or more current-changing elements configured to change a limit on the amount of current permitted in the one or more current-controlled electrodes, and an amount of ions generated in the fluid is based on the amount of current permitted in the one or more current-controlled electrodes as regulated by the one or more current-limiting elements and the one or more current-changing elements.

One example embodiment includes one or more current-controlled electrodes exposed to a fluid and configured to generate ions in the fluid within an electric field, one or more current-controlling elements having one or more current-limiting elements configured to limit an amount of current permitted in the one or more current-controlled electrodes, and one or more current-changing elements configured to change a limit on the amount of current permitted in the one or more current-controlled electrodes, and an amount of ions generated in the fluid is based on the amount of current permitted in the one or more current-controlled electrodes as regulated by the one or more current-limiting elements and the one or more current-changing elements.

An ion accelerator includes: an inner magnet having a channel extending through it in an axial direction; an outer magnet extending around the inner magnet, the magnets having like polarities so as to produce a magnetic field having two locations of zero magnetic field strength. The locations are spaced apart in the axial direction; and an anode and a cathode are arranged to generate an electrical potential difference between the locations.

An ion source apparatus which generates dopant species in a manner enabling low vapor pressure dopant source materials to be employed. The ion source apparatus (10), comprising: an ion source chamber (12); and a consumable structure in or associated with the ion source chamber (12), said consumable structure comprising a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber. For example, the consumable structure is a dopant gas feed line (14) comprising a pipe or conduit having an interior layer formed of a solid dopant source material.

An ion source apparatus which generates dopant species in a manner enabling low vapor pressure dopant source materials to be employed. The ion source apparatus (10), comprising: an ion source chamber (12); and a consumable structure in or associated with the ion source chamber (12), said consumable structure comprising a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber. For example, the consumable structure is a dopant gas feed line (14) comprising a pipe or conduit having an interior layer formed of a solid dopant source material.

An ion source includes an external housing, an electrically conductive tip, a gas supply system, configured to supply an operating gas into the neighborhood of the tip, and a cooling system configured to cool the tip. The gas supply system includes a first tube with a hollow interior, and a chemical getter material is provided in the hollow interior of the tube.

An ion source includes an external housing, an electrically conductive tip, a gas supply system, configured to supply an operating gas into the neighborhood of the tip, and a cooling system configured to cool the tip. The gas supply system includes a first tube with a hollow interior, and a chemical getter material is provided in the hollow interior of the tube.

An analytical apparatus for mass spectrometry comprises an electron impact ionizer including an electron emitter and an ionization target zone. The target zone is arranged to be populated with matter to be ionized for analysis. An electron extracting element is aligned with an electron pathway defined between the electron emitter and the ionization target zone. The electron extracting element is configured to accelerate electrons away from the emitter along the electron pathway between the emitter and the extracting element and to decelerate the electrons along the electron pathway between the extracting element and the ionization target zone to enable soft ionization while avoiding the effects of Coulombic repulsion at the electron source.