A lighting device 1 has phosphors, a porous material (5), and emitters 4. The emitters are interposed between the phosphors and surfaces (2a) to be irradiated with light of the lighting device. The porous material has heat conductivity and is impregnated with the phosphors.

An apparatus includes: a structure having a lumen for accommodating a beam, wherein the structure is a component of a medical radiation machine having a target for interaction with the beam to generate radiation; and a first beam position monitor comprising a first electrode and a second electrode, the first electrode being mounted to a first side of the structure, the second electrode being mounted to a second side of the structure, the second side being opposite from the first side; wherein the first beam position monitor is located upstream with respect to the target.

Systems and methods are described herein for generating, modulating, and/or shaping a plurality of electron beams to be used in various lithography processes. In some aspects, multiple beams may be individually modulated to create a pattern which is projected onto a surface proximate to the source of the electrons. In other aspects, the multiple beams may be projected at a distance through a lensing system. Targets for the electron patterns include surfaces which react with the electrons to undergo chemical or structural change. In some aspects, a parallel electron multi-beam source is constructed using edge emitters formed where etching, cleaving, or other processes have created a surface perpendicular to the edge of one conductor which is adjacent to a thin insulator which separates it from a second conductor.

Systems and methods are described herein for generating, modulating, and/or shaping a plurality of electron beams to be used in various lithography processes. In some aspects, multiple beams may be individually modulated to create a pattern which is projected onto a surface proximate to the source of the electrons. In other aspects, the multiple beams may be projected at a distance through a lensing system. Targets for the electron patterns include surfaces which react with the electrons to undergo chemical or structural change. In some aspects, a parallel electron multi-beam source is constructed using edge emitters formed where etching, cleaving, or other processes have created a surface perpendicular to the edge of one conductor which is adjacent to a thin insulator which separates it from a second conductor.

Controlling total emission current of an electron emitting construct in an x-ray emitting device by providing a cathode, providing multiple active areas each active area having a gated cone electron source, including multiple emitter tips arranged in an array, a gate electrode, and a gate interconnect lead connected to the gate electrode, providing an x-ray emitting construct comprising an anode, the anode being an x-ray target, situating the x-ray emitting construct facing the active areas face each other, selecting a set of active areas, and activating selected active areas by conductively connecting a voltage source to their associated the gate electrode interconnect lead.

An apparatus for generating electron radiation comprises: an elongated, wire-shaped hot cathode to emit electron radiation having an elongated, line-shaped cross section perpendicular to a direction of propagation of the electron radiation; a cathode electrode; an anode electrode with an opening through which the electron radiation emitted from the hot cathode can pass, wherein a voltage applied between the cathode electrode and the anode electrode accelerates electrons emitted from the hot cathode; and a deflecting unit to deflect the electron radiation downstream of the opening of the anode electrode, wherein a cross section of the electron radiation perpendicular to the direction of propagation is changed by the deflecting unit to decease a longitudinal extent of the electron radiation and to increase a transverse extent of the electron radiation such that longitudinal and transverse extents of the electron radiation perpendicular to the direction of propagation are about the same size.

An apparatus for generating electron radiation comprises: an elongated, wire-shaped hot cathode to emit electron radiation having an elongated, line-shaped cross section perpendicular to a direction of propagation of the electron radiation; a cathode electrode; an anode electrode with an opening through which the electron radiation emitted from the hot cathode can pass, wherein a voltage applied between the cathode electrode and the anode electrode accelerates electrons emitted from the hot cathode; and a deflecting unit to deflect the electron radiation downstream of the opening of the anode electrode, wherein a cross section of the electron radiation perpendicular to the direction of propagation is changed by the deflecting unit to decease a longitudinal extent of the electron radiation and to increase a transverse extent of the electron radiation such that longitudinal and transverse extents of the electron radiation perpendicular to the direction of propagation are about the same size.

An apparatus includes: a structure having a lumen for accommodating a beam (e.g., electron beam, proton beam, or a charged particle beam), wherein the structure is a component of a medical radiation machine having a target for interaction with the beam to generate radiation; and a first beam position monitor comprising a first electrode and a second electrode, the first electrode being mounted to a first side of the structure, the second electrode being mounted to a second side of the structure, the second side being opposite from the first side; wherein the first beam position monitor is located upstream with respect to the target.

An apparatus includes: a structure having a lumen for accommodating a beam (e.g., electron beam, proton beam, or a charged particle beam), wherein the structure is a component of a medical radiation machine having a target for interaction with the beam to generate radiation; and a first beam position monitor comprising a first electrode and a second electrode, the first electrode being mounted to a first side of the structure, the second electrode being mounted to a second side of the structure, the second side being opposite from the first side; wherein the first beam position monitor is located upstream with respect to the target.

Provided herein is a field emission device. The field emission device includes a cathode which is connected to a negative power supply and emits electrons, an anode which is connected to a positive power supply and includes a target material receiving the electrons emitted from the cathode, and a ground electrode which is formed to face the anode and has an opening through which the electrons emitted from the cathode pass. The ground electrode is grounded so that when an arc discharge occurs due to high voltage operation of the anode, electric charge produced by the arc discharge is emitted to a ground.