An x-ray micro-beam radiation production system is provided having: a source of accelerated electrons, an electron focusing component configured to focus the electrons provided by the source, and a target which produces x-rays when electrons impinge thereon from the source. The electron focusing component is configured to focus the electrons provided by the source such that they impinge at a focal spot having a width δ formed on a surface of the target. The focusing component is configured to move the electron beam relative to the target such that the focal spot moves across the target surface in the width direction, and/or the target is movable relative to the focusing component such that the focal spot moves across the target surface in the width direction, the surface velocity of the focal spot across the target surface in the width direction being greater than v.sub.t where:formula (I), k, ρ and c denoting respectively the heat conductivity, the density and the heat capacity of the target material, and d denoting the electron penetration depth in the target material. $v_t=\frac{\pi k}{4\rho c}.Math.\frac{\delta }{d^2},$

An x-ray micro-beam radiation production system is provided having: a source of accelerated electrons, an electron focusing component configured to focus the electrons provided by the source, and a target which produces x-rays when electrons impinge thereon from the source. The electron focusing component is configured to focus the electrons provided by the source such that they impinge at a focal spot having a width δ formed on a surface of the target. The focusing component is configured to move the electron beam relative to the target such that the focal spot moves across the target surface in the width direction, and/or the target is movable relative to the focusing component such that the focal spot moves across the target surface in the width direction, the surface velocity of the focal spot across the target surface in the width direction being greater than v.sub.t where:formula (I), k, ρ and c denoting respectively the heat conductivity, the density and the heat capacity of the target material, and d denoting the electron penetration depth in the target material. $v_t=\frac{\pi k}{4\rho c}.Math.\frac{\delta }{d^2},$

Methods for maintaining a specified beam profile of an x-ray beam extracted from an x-ray target over a large range of extraction angles relative to the target. A beam of electrons is generated and directed toward a target at an angle of incidence with respect to the target, with the beam of electrons forming a focal spot corresponding to the cross-section of the electron beam. At least one of a size, shape, and orientation of the electron beam cross-section is dynamically varied as the extraction angle is varied, and the extracted x-ray beam is collimated. Dynamically varying the size, shape or orientation of the electron beam cross-section may be performed using focusing and stigmator coils.

An X-ray imaging system, including a target; an electron beam source configured to provide an electron beam for interaction with the target to generate X-ray radiation; electron optics configured to alternately direct the electron beam to at least a first and a second location on the target; an X-ray detector array configured to receive X-ray radiation generated at the first and second locations on the target; a sample position region for receiving a sample to be exposed to generated X-ray radiation, the sample position region being located in a region where X-ray radiation generated at the first location overlaps with X-ray radiation generated at the second location; and a processing unit coupled to the X-ray detector array, the processing unit being configured to create an image of a sample, positioned in the sample position region, based on the X-ray radiation originating from the first location and from the second location.

A device and method for creating controlled radio frequency (RF) modulated X-ray radiation is described. The device includes an anode housed within a vacuum enclosure which acts to accelerate and convert an electron beam into X-ray radiation. A RF enclosure is housed within the vacuum enclosure and houses a field emission device, such as a carbon nanotube field emission device or similar cold cathode field emission device. The field emission device is biased to emit the electron beam from a field emission cathode via an extraction electrode in the RF enclosure towards the anode. Additionally an RF impedance matching and coupling circuit is connected electrically to the field emission device. The field emission device is thus directly driven with a RF signal to produce an RF modulated electron current to produce an RF modulated X-ray radiation.

A device and method for creating controlled radio frequency (RF) modulated X-ray radiation is described. The device includes an anode housed within a vacuum enclosure which acts to accelerate and convert an electron beam into X-ray radiation. A RF enclosure is housed within the vacuum enclosure and houses a field emission device, such as a carbon nanotube field emission device or similar cold cathode field emission device. The field emission device is biased to emit the electron beam from a field emission cathode via an extraction electrode in the RF enclosure towards the anode. Additionally an RF impedance matching and coupling circuit is connected electrically to the field emission device. The field emission device is thus directly driven with a RF signal to produce an RF modulated electron current to produce an RF modulated X-ray radiation.

Provided are a scanning-type X-ray source and an imaging system therefor. The scanning-type X-ray source comprises a vacuum cavity (1), wherein a cathode (2) and a plurality of anode target structures (3) are arranged in the vacuum cavity (1); a gate electrode (4) is arranged in a position, close to the cathode (2), in the vacuum cavity (1); a focusing electrode (5) is arranged in a position, close to the gate electrode (4), in the vacuum cavity (1); and a deflection coil (6) is arranged in a position, close to the gate electrode (4), at the outer periphery of the vacuum cavity (1). The scanning-type X-ray source generates electron beams by using cathode (2), controls the powering-on/off of the electron beams by the gate electrode (4), and the deflection coil (6) controls the direction of motion of the electron beams, so as to complete the switching between multiple focuses.

Some embodiments of the present disclosure provide a method that includes colliding a laser with an electron beam to produce backscattered x-rays while the electron beam is traversing a circular arc. This backscattering process is inverse Compton scattering (ICS). ICS x-rays are emitted in the same direction as the electrons. Because this ICS direction is changing as a function of time, the position of the x-ray beam on a detector will change depending on the timing of electron/laser collision. This position change is easily detected and converted to a timing measurement sensitive at the femtosecond scale, converting a very difficult timing measurement of laser pulse, electron pulse, and x-ray pulse synchronization into a simple and robust position measurement.

A micro focus X-ray tube is provided. The micro focus X-ray tube has a bonding structure in which a ceramic and a metal without an exhaust pipe are stacked by using a nano electric field emitter of an excellent feature.

A micro focus X-ray tube is provided. The micro focus X-ray tube has a bonding structure in which a ceramic and a metal without an exhaust pipe are stacked by using a nano electric field emitter of an excellent feature.