An electron source is disclosed. The electron source may include an electron emitter configured to generate one or more electron beams. The electron source may further include a magnetic suppressor electrode surrounding at least a portion of the electron emitter. The magnetic suppressor electrode may be formed from one or more magnetic materials. The magnetic suppressor may be configured to shield at least a portion of the electron emitter from an axial magnetic field. The electron source may further include an extractor electrode positioned adjacent to a tip of the electron emitter.

The present disclosure provides a magnetic immersion electron gun and a method of generating an electron beam using a magnetic immersion electron gun. The electron gun includes a magnetic lens forming a magnetic field, a cathode tip disposed in the magnetic field, and a multi-filament heater configured to directly heat the cathode tip to emit electrons through the magnetic lens. The multi-filament heater includes a first filament connected at each end to first and second positive terminals of a power source and a second filament connected at each end to first and second negative terminals of the power source. The first positive terminal, the second positive terminal, the first negative terminal, and the second negative terminal are arranged alternately around the cathode tip such that the first filament and the second filament intersect at the cathode tip and a resultant magnetic force applied to the cathode tip is reduced.

Provided are a charged particle beam generator and a charged particle beam device that can improve insulation reliability as a result of reducing the high electric field generated around a connection section for a conductor. The charged particle beam generator 100 has: a plug 151 that guides high voltage from outside to a charged particle source that is in a vacuum; and a socket 251 having the charged particle source attached thereto. An electric field reduction ring 161 that electrically connects to one of a plurality of conductors that guide high voltage is embedded inside the tip of the plug 151. The plurality of conductors that guide the high voltage are arranged so as to penetrate the electric field reduction ring 161.

Provided are a charged particle beam generator and a charged particle beam device that can improve insulation reliability as a result of reducing the high electric field generated around a connection section for a conductor. The charged particle beam generator 100 has: a plug 151 that guides high voltage from outside to a charged particle source that is in a vacuum; and a socket 251 having the charged particle source attached thereto. An electric field reduction ring 161 that electrically connects to one of a plurality of conductors that guide high voltage is embedded inside the tip of the plug 151. The plurality of conductors that guide the high voltage are arranged so as to penetrate the electric field reduction ring 161.

Provided are a charged particle beam generator and a charged particle beam device that can improve insulation reliability as a result of reducing the high electric field generated around a connection section for a conductor. The charged particle beam generator 100 has: a plug 151 that guides high voltage from outside to a charged particle source that is in a vacuum; and a socket 251 having the charged particle source attached thereto. An electric field reduction ring 161 that electrically connects to one of a plurality of conductors that guide high voltage is embedded inside the tip of the plug 151. The plurality of conductors that guide the high voltage are arranged so as to penetrate the electric field reduction ring 161.

Provided are a charged particle beam generator and a charged particle beam device that can improve insulation reliability as a result of reducing the high electric field generated around a connection section for a conductor. The charged particle beam generator 100 has: a plug 151 that guides high voltage from outside to a charged particle source that is in a vacuum; and a socket 251 having the charged particle source attached thereto. An electric field reduction ring 161 that electrically connects to one of a plurality of conductors that guide high voltage is embedded inside the tip of the plug 151. The plurality of conductors that guide the high voltage are arranged so as to penetrate the electric field reduction ring 161.

A charged-particle beam apparatus is provided with a cathode to emit charged particle beams, an anode to propagate the charged particle beams emitted from the cathode in a sample surface direction, an aperture to propagate a charged particle beam passing through an opening at a predetermined position and of a predetermined shape, among the charged particle beams passing through the anode, in the sample surface direction, and a first electrode that is disposed between the anode and the aperture, and is set at a first electric potential of a polarity repelling a polarity of an ion generated due to collision of a charged particle beam.

A charged-particle beam apparatus is provided with a cathode to emit charged particle beams, an anode to propagate the charged particle beams emitted from the cathode in a sample surface direction, an aperture to propagate a charged particle beam passing through an opening at a predetermined position and of a predetermined shape, among the charged particle beams passing through the anode, in the sample surface direction, and a first electrode that is disposed between the anode and the aperture, and is set at a first electric potential of a polarity repelling a polarity of an ion generated due to collision of a charged particle beam.

The present disclosure provides an electron source, including one or more tips, wherein at least one of the tips comprises one or more fixed emission sites, wherein at least one of the tips includes one or more fixed emission sites, wherein the emission sites includes a reaction product of metal atoms on a surface of the tip with gas molecules.

The present disclosure provides an electron source, including one or more tips, wherein at least one of the tips comprises one or more fixed emission sites, wherein at least one of the tips includes one or more fixed emission sites, wherein the emission sites includes a reaction product of metal atoms on a surface of the tip with gas molecules.