A vacuum apparatus temperature sensor assembly for measuring the temperature of a vacuum apparatus and a method are disclosed. The vacuum apparatus temperature sensor assembly comprises: a sheet substrate configured to conform to a shape of an item, equipment or apparatus whose temperature is to be determined; and a temperature sensor thermally coupled with the sheet substrate, wherein the sheet substrate is configured to provide a thermal path from the apparatus to the temperature sensor. In this way, the substrate provides a larger area than that of the temperature sensor to couple with the apparatus which enables the average temperature of the apparatus to be more reliably and accurately conveyed to the temperature sensor and make the temperature measurements less reliant on the exact placing of the temperature sensor with respect to the apparatus.

A vacuum apparatus temperature sensor assembly for measuring the temperature of a vacuum apparatus and a method are disclosed. The vacuum apparatus temperature sensor assembly comprises: a sheet substrate configured to conform to a shape of an item, equipment or apparatus whose temperature is to be determined; and a temperature sensor thermally coupled with the sheet substrate, wherein the sheet substrate is configured to provide a thermal path from the apparatus to the temperature sensor. In this way, the substrate provides a larger area than that of the temperature sensor to couple with the apparatus which enables the average temperature of the apparatus to be more reliably and accurately conveyed to the temperature sensor and make the temperature measurements less reliant on the exact placing of the temperature sensor with respect to the apparatus.

An apparatus for analyzing and/or processing a sample with a particle beam, comprising: a providing unit for providing the particle beam; a shielding element for shielding an electric field (E) generated by charges (Q) accumulated on the sample, wherein the shielding element has a through opening for the particle beam to pass through towards the sample; a detecting unit configured to detect an actual position of the shielding element; and an adjusting unit for adjusting the shielding element from the actual position into a target position.

An apparatus for analyzing and/or processing a sample with a particle beam, comprising: a providing unit for providing the particle beam; a shielding element for shielding an electric field (E) generated by charges (Q) accumulated on the sample, wherein the shielding element has a through opening for the particle beam to pass through towards the sample; a detecting unit configured to detect an actual position of the shielding element; and an adjusting unit for adjusting the shielding element from the actual position into a target position.

A physical package is provided with: a MOT device; an optical chamber which constitutes an optical lattice formation portion; and a vacuum chamber which surrounds these components and has a substantially cylindrical shape. The MOT device is arranged along the beam axis of an atomic beam and traps an atom cluster. The optical lattice formation portion uses optical lattice light that enters therein to form an optical lattice in a cavity, confines the atom cluster trapped by the MOT device in the optical lattice, and transfers, along the X-axis which is a movement axis perpendicular to the beam axis, the atom cluster to a clock transition space which facilitates clock transition. The central axis of the cylinder of the main body of the vacuum chamber passes through the clock transition space, and is set to be substantially parallel with the beam axis.

A physical package is provided with: a MOT device; an optical chamber which constitutes an optical lattice formation portion; and a vacuum chamber which surrounds these components and has a substantially cylindrical shape. The MOT device is arranged along the beam axis of an atomic beam and traps an atom cluster. The optical lattice formation portion uses optical lattice light that enters therein to form an optical lattice in a cavity, confines the atom cluster trapped by the MOT device in the optical lattice, and transfers, along the X-axis which is a movement axis perpendicular to the beam axis, the atom cluster to a clock transition space which facilitates clock transition. The central axis of the cylinder of the main body of the vacuum chamber passes through the clock transition space, and is set to be substantially parallel with the beam axis.

The disclosure relates to an electron-optical module of an electron-optical apparatus. The electron-optical module comprises a vacuum chamber, a high voltage shielding arrangement located within the vacuum chamber, and an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement. Wherein the electron-optical module can be configured to be removable from the electron-optical apparatus.

The disclosure relates to an electron-optical module of an electron-optical apparatus. The electron-optical module comprises a vacuum chamber, a high voltage shielding arrangement located within the vacuum chamber, and an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement. Wherein the electron-optical module can be configured to be removable from the electron-optical apparatus.

There is provision of a plasma processing apparatus including a processing vessel, a first member provided in the processing vessel, and a second member provided outside the first member. In at least one of the first member and the second member, a gas flow passage is formed, and the gas flow passage is configured to cause a gas to flow into a gap between the first member and the second member.

There is provision of a plasma processing apparatus including a processing vessel, a first member provided in the processing vessel, and a second member provided outside the first member. In at least one of the first member and the second member, a gas flow passage is formed, and the gas flow passage is configured to cause a gas to flow into a gap between the first member and the second member.