Certain configurations of plasma discharge chambers and plasma ionization sources comprising a plasma discharge chamber are described. In some examples, the discharge chamber comprises a conductive area and is configured to sustain a plasma discharge within the discharge chamber. In other examples, the discharge chamber comprises at least one inlet configured to receive a plasma gas and at least one outlet configured to provide ionized analyte from the discharge chamber. Systems and methods using the discharge chambers are also described.

Bubble plasma ionisation probe for analysing liquids by mass spectrometry. A means of a detecting analytes dissolved in a liquid by mass spectrometry is described. Gas flows from a source through a first conduit 105 and thereafter through a coaxial second conduit 103 that also serves as the inlet to the mass spectrometer 102. The coaxial arrangement of conduits is submerged in the liquid to be analysed 301. Using a feedback loop, the gas pressure is adjusted and controlled such that an attached bubble 302 forms at the open end of the first conduit 105. A plasma 305 is provided in the bubble. The plasma is preferably generated by a dielectric barrier discharge between a collar electrode 107 and mass spectrometer inlet 103. Analytes dissolved in the liquid are both desorbed form the gas-liquid interface and ionised by the action of the plasma. Ions formed in this way become entrained in the gas flow and are consequently transferred to the mass spectrometer, where they are analysed.

Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

A device and method is described for analysing the elemental composition of a liquid sample utilizing a combination of electrochemical pre-concentration followed by spectrochemical analysis of analytes in a single device. The device consists of two electrodes for the purpose of pre-concentration of the analyte ions by electrodeposition, a DC power supply/potentiostat/galvanostat, a high voltage power supply capable of creating an electrical discharge such as arc, spark, glow discharge or plasma, a spectrometer capable of recording a spectrum generated during such discharges as well as a pump(s) for pumping the analyte containing solution. Such a device is autonomous, field-deployable and capable of providing online analysis.

A device and method is described for analysing the elemental composition of a liquid sample utilizing a combination of electrochemical pre-concentration followed by spectrochemical analysis of analytes in a single device. The device consists of two electrodes for the purpose of pre-concentration of the analyte ions by electrodeposition, a DC power supply/potentiostat/galvanostat, a high voltage power supply capable of creating an electrical discharge such as arc, spark, glow discharge or plasma, a spectrometer capable of recording a spectrum generated during such discharges as well as a pump(s) for pumping the analyte containing solution. Such a device is autonomous, field-deployable and capable of providing online analysis.

Bubble plasma ionisation probe for analysing liquids by mass spectrometry. A means of a detecting analytes dissolved in a liquid by mass spectrometry is described. Gas flows from a source through a first conduit 105 and thereafter through a coaxial second conduit 103 that also serves as the inlet to the mass spectrometer 102. The coaxial arrangement of conduits is submerged in the liquid to be analysed 301. Using a feedback loop, the gas pressure is adjusted and controlled such that an attached bubble 302 forms at the open end of the first conduit 105. A plasma 305 is provided in the bubble. The plasma is preferably generated by a dielectric barrier discharge between a collar electrode 107 and mass spectrometer inlet 103. Analytes dissolved in the liquid are both desorbed form the gas-liquid interface and ionised by the action of the plasma. Ions formed in this way become entrained in the gas flow and are consequently transferred to the mass spectrometer, where they are analysed.

An ionization device includes: a plasma generating device for generating metastable particles and/or ions of an ionization gas in a primary plasma region; a field generating device for generating a glow discharge in a secondary plasma region; an inlet for supplying a gas to be ionized into the secondary plasma region; and a further inlet for supplying the metastable particles and/or the ions of the ionization gas into the secondary plasma region. A mass spectrometer includes such an ionization device and a detector downstream of the outlet of the ionization device for the mass-spectrometric analysis of the ionized gas.

Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

A particle charger is provided with: a filter (28) partitioning the inside of a housing (20) into a first space (29) and second space (30); a particle introducer (22) for introducing a particle into the first space; a gas ion supplier (10) for supplying the first space with a gas ion; a potential gradient creator (26, 27, 31) for creating a potential difference within the housing so as to make the gas ion and a charged particle resulting from a contact of the aforementioned particle with the gas ion move toward the second space; an AC voltage supplier (32, 33) for applying AC voltages having a phase difference to the neighboring electrodes (28a, b) included in the filter; a controller (35) for performing a control for applying, to the plurality of electrodes, predetermined voltages so as to allow the charged particle to pass through a gap between the electrodes while trapping the gas ion by the electrodes; and a charged particle extractor (23, 25, 34) for extracting the charged particle admitted to the second space to the outside of the housing. By this configuration, the occurrence frequency of the multi-charging is suppressed.

A particle charger is provided with: a filter (28) partitioning the inside of a housing (20) into a first space (29) and second space (30); a particle introducer (22) for introducing a particle into the first space; a gas ion supplier (10) for supplying the first space with a gas ion; a potential gradient creator (26, 27, 31) for creating a potential difference within the housing so as to make the gas ion and a charged particle resulting from a contact of the aforementioned particle with the gas ion move toward the second space; an AC voltage supplier (32, 33) for applying AC voltages having a phase difference to the neighboring electrodes (28a, b) included in the filter; a controller (35) for performing a control for applying, to the plurality of electrodes, predetermined voltages so as to allow the charged particle to pass through a gap between the electrodes while trapping the gas ion by the electrodes; and a charged particle extractor (23, 25, 34) for extracting the charged particle admitted to the second space to the outside of the housing. By this configuration, the occurrence frequency of the multi-charging is suppressed.