In order to suppress a charge-up in an ion source configured to ionize a component contained in a sample gas, a mass spectrometer according to the present invention is provided with an ion source (3) including: an ionization chamber (30) having an ion ejection opening (301) and internally having a space substantially separated from an outside area; a repeller electrode (31), located within the ionization chamber, for creating an expelling electric field which acts on an ion generated within the ionization chamber to expel the ion through the ion ejection opening to the outside area; and a voltage generator (7) configured to selectively apply, to the repeller electrode, a first voltage for creating the expelling electric field and a second voltage for creating a charge-up-removing electric field, where the second voltage is a positive voltage having a larger absolute value than the first voltage.

An ion source includes an electron generator, an ionization chamber, and a magnetic field. The electron generator is configured to produce electrons. The ionization chamber has an electron entrance aperture through a first wall, an ion exit aperture through a second wall, and an axis. The ionization chamber is configured to produce ions. The magnetic field is arranged to confine electrons in a beam directed through the electron entrance aperture, in a direction within 45 degrees of parallel to the axis, and towards a location displaced from the ion exit aperture.

A mass spectrometer system (10) is provided in which the voltage controller (12) can have separate first and second high-voltage control circuits (34, 40) which are physically disconnected from and at different ground planes to one another. Communication between the first and second high-voltage control circuits (34, 40) is enabled via an interface circuit (30) and one or more wireless, preferably radio-frequency, communicators (38, 44, 46, 48).

A method for detecting radicals in process gases in a semiconductor fabrication assembly is provided where the semiconductor fabrication includes a plasma source and a mass spectrometer with an ion source. The method includes separating ions from the process gases and determining a fixed electron energy in which to measure the process gases. Process gases in the semiconductor fabrication assembly are continuously sampled. A first measurement is performed on the sampled process gases at the electron energy using the mass spectrometer, where the first measurement is performed with the plasma source off. A second measurement of the sampled process gases is performed at the fixed electron energy using the mass spectrometer, where the second measurement is performed with the plasma source on. An amount of a radical present in the sampled process gases is determined as a difference between the second measurement and the first measurement.

In a system for processing gas, a gas analyzer in a gas analyzer chamber measures a quantity of ions generated from a gas. An ionization source includes an ionization chamber and an electron source for generating ions for the gas analyzer. The ionization chamber encompasses an ionization region in which particles of the gas are charged to form the ions. A channel directs the gas from a gas source into the ionization chamber, and the channel extends to a surface of the ionization chamber. An ionization source vacuum pump is in gaseous communication with the ionization chamber via a substantially large opening, and operates to draw gas from the ionization chamber.

An ionizer 1 including an ionization chamber 10, a sample gas introduction port 14 provided in the ionization chamber 10 for introducing sample gas, an electron beam emitting section 11 which emits an electron beam toward the ionization chamber 10, electron beam passage openings 10a and 10b which are formed on a path of the electron beam emitted from the electron beam emitting section 11 on a wall of the ionization chamber 10 and has a length in a direction of the path longer than a width of a cross section orthogonal to the direction, and an ion outlet 10c provided in the ionization chamber 10 for emitting an ion of the sample gas generated by irradiation with the electron beam, and a mass spectrometer 60 including the ionizer 1.

A machine, article, process of using, process of making, products produced thereby and necessary intermediates. Illustratively, there can be a process that includes: ionizing at least some injected gas to form ions; confining, without using magnetic fields, at least some of said ions to produce confined ions; accumulating at least some of said confined ions to produce accumulated ions; cooling at least some of said accumulated ions to produce cooled ions; compressing, without using magnetic fields, at least some of said accumulated ions to produce compressed ions; accelerating at least some of said compressed ions to produce accelerated ions; ejecting at least some of said accelerated ions; and measuring at least one property of said ejected ions.

Disclosed herein are specimen imaging systems, comprising: a sample stage in a vacuum environment, the sample stage configured to support a specimen; an electron beam generator configured to focus an electron beam on a first predetermined location on the specimen; a nanospray dispenser configured to dispense a nanospray onto a second predetermined location on the specimen; a mass spectrometer; and an extraction conduit configured to extract a plume of charged particles generated as a result of contact between the nanospray and the specimen and deliver the charged particles to the mass spectrometer. The system can create a topological and chemical map of the specimen by analyzing at least a portion of the specimen with a mass spectrometer to determine a chemical composition of the specimen at the second predetermined location and analyzing at least a portion of the specimen with the electron beam to determine a surface topology.

The invention relates to a holding device for at least one filament, comprising: at least one filament receptacle for receiving the at least one filament. The holding device is designed for the detachable attachment, in particular clamping attachment, of the at least one filament receptacle to a container of an ionization device. The invention also relates to a mass spectrometer comprising: an ionization device having a container in which an ionization space for ionizing a gas is formed, at least one holding device which is designed for the detachable attachment, in particular clamping attachment, of the at least one filament receptacle to the container, and a vacuum housing to which the holding device, in particular a base body of the holding device, is detachably connected.

A gas chromatograph mass spectrometer includes a separator that separates a sample, and a mass analyzer that performs mass spectrometry on the sample introduced from the separator, the mass analyzer includes a filament and an ionization chamber into which thermal electrons from the filament and the sample from the separator are introduced, and an opening through which the thermal electrons emitted from the filament pass and which is formed in the ionization chamber or in a member arranged between the ionization chamber and the filament has a maximum diameter of less than 3 mm.