A method for producing a radiation window includes patterning a photo resist structure onto a double-sided silicon wafer, plasma etching the silicon wafer to create an etched silicon wafer having a silicon supporting structure etched upon a first side of the double-sided silicon wafer, applying a silicon nitride thin film to the etched silicon wafer, patterning a photo resist structure and plasma etching a second side of the double-sided silicon wafer to create an initial window in the silicon nitride thin film, and wet etching the second side of the double-sided silicon wafer to release the silicon nitride thin film and supporting structure from the portion of the double-sided silicon wafer defined by the initial window.

A method for producing a radiation window includes patterning a photo resist structure onto a double-sided silicon wafer, plasma etching the silicon wafer to create an etched silicon wafer having a silicon supporting structure etched upon a first side of the double-sided silicon wafer, applying a silicon nitride thin film to the etched silicon wafer, patterning a photo resist structure and plasma etching a second side of the double-sided silicon wafer to create an initial window in the silicon nitride thin film, and wet etching the second side of the double-sided silicon wafer to release the silicon nitride thin film and supporting structure from the portion of the double-sided silicon wafer defined by the initial window.

An x-ray window can include a boron-film 12 and an aluminum-film 52 spanning an aperture 15 of a support-frame 11. The boron-film 12 and the aluminum-film 52 can be the only films, or the primary films, spanning the aperture. The boron-film 12 can include boron and hydrogen. An annular-film 32 can adjoin the support-frame 11, on an opposite side of the support-frame 11 from the boron-film 12. The annular-film 32 can include boron and hydrogen. The annular-film 32 can have the same material composition as, and can be similar in thickness with, the boron-film 12.

A shield device (100) is for covering a radiation window (502). The shield device (100) includes a support structure (102) with an opening (106), and a flexible foil (104) covering at least the opening (106) of the support structure (102). The foil (104) includes carbon nanotubes in a form of a network (202) and the foil (104) is configured to allow radiation to pass through the foil (104) at least partly and to prevent objects (302) to pass through the foil (104). A radiation arrangement (500) includes a shield device (100), and a method is for producing a shield device (100) for a radiation window (502).

An x-ray window can include a boron-film 12 and an aluminum-film 52 spanning an aperture 15 of a support-frame 11. The boron-film 12 and the aluminum-film 52 can be the only films, or the primary films, spanning the aperture. The boron-film 12 can include boron and hydrogen. An annular-film 32 can adjoin the support-frame 11, on an opposite side of the support-frame 11 from the boron-film 12. The annular-film 32 can include boron and hydrogen. The annular-film 32 can have the same material composition as, and can be similar in thickness with, the boron-film 12.

The x-ray windows herein can have low gas permeability, low outgassing, high strength, low visible and infrared light transmission, high x-ray flux, low atomic number materials, corrosion resistance, high reliability, and low-cost. The x-ray window can include a film 11 with a polymer layer 22 and a graphite layer 21. The film 11 can consist essentially of graphite and polymer. Most of the film 11 can be the graphite layer 21. The polymer layer 22 can be a small portion of the film 11.

The x-ray windows herein can have low gas permeability, low outgassing, high strength, low visible and infrared light transmission, high x-ray flux, low atomic number materials, corrosion resistance, high reliability, and low-cost. The x-ray window can include a film 11 with a polymer layer 22 and a graphite layer 21. The film 11 can consist essentially of graphite and polymer. Most of the film 11 can be the graphite layer 21. The polymer layer 22 can be a small portion of the film 11.

According to an example aspect of the present invention, there is provided a radiation window manufacturing method, comprising patterning a mask on a top surface of a bulk wafer or compound wafer, etching the bulk or compound wafer from the top surface, based on the mask, either by timed etching of the bulk wafer, or until an inner insulator layer of the compound wafer, thereby generating recesses in the bulk or compound wafer, filling the recesses, at least partly, with a filling material, polishing the top surface of the bulk or compound wafer, and providing a membrane layer on the polished top surface, and etching the bulk or compound wafer from a bottom surface, opposite the top surface, to build a supporting structure for the membrane layer in accordance with a shape defined by the mask.

A method is for manufacturing a multilayer radiation window for an X-ray measurement apparatus. The method includes: producing a gas diffusion stop layer made of silicon nitride on a polished surface of a carrier; producing at least one combined layer on an opposite side of the gas diffusion stop layer than the carrier; attaching the combined structure including the carrier, the gas diffusion stop layer, the at least one combined layer to a region around an opening in a support structure with the at least one combined layer facing the support structure; and etching away the carrier. The at least one combined layer includes: a light attenuation layer made of aluminium, and a strengthening layer. A radiation window is manufactured with the method.

A method is for manufacturing a multilayer radiation window for an X-ray measurement apparatus. The method includes: producing a gas diffusion stop layer made of silicon nitride on a polished surface of a carrier; producing at least one combined layer on an opposite side of the gas diffusion stop layer than the carrier; attaching the combined structure including the carrier, the gas diffusion stop layer, the at least one combined layer to a region around an opening in a support structure with the at least one combined layer facing the support structure; and etching away the carrier. The at least one combined layer includes: a light attenuation layer made of aluminium, and a strengthening layer. A radiation window is manufactured with the method.