A plasma lamp for use in a laser-sustained plasma (LSP) light source is disclosed. The plasma lamp includes a gas containment structure for containing a gas, a gas seal positioned at a base of the gas containment structure, a gas inlet, and a gas outlet. The plasma lamp includes a gas swirler including a set of nozzles configured to generate a vortex gas flow and a swirler shaft including an inlet channel for delivering the gas from the gas inlet to the nozzles and an outlet channel for delivering the gas from the gas containment structure to the gas outlet. The plasma lamp includes a distributor including one or more plenums to distribute the gas from the gas inlet into the swirler. The plasma lamp may also include a deflector fluidically coupled to the swirler shaft and extending above the set of nozzles and configured to direct gas flow around the swirler.

A plasma lamp is disclosed. The plasma lamp includes a gas containment structure configured to contain a gas and generate a plasma within the gas containment structure. The gas containment structure is formed from a glass material transparent to illumination from a pump laser and the broadband radiation emitted by the plasma. The gas containment structure includes a glass wall and the glass within the glass wall includes an OH concentration distribution that varies across a thickness of the glass wall.

A UV C light source including a UV C bulb adapted to emit and project UV C light at a wavelength and an interchangeable UV C light modifier through which at least a portion of the UV C light emitted from said UV C bulb is projected. The UV C light modifier may be reflective, such as a reflector, perforated, holographic material, or mechanical modifier such as a barn door. The UV C light modifier might produce a narrow pattern, circular pattern, flat pattern, or asymmetrical pattern or other desired geometric pattern, or upper air pattern. The UV C light modifier is easily removed and interchanged or may be selectable such as by receiving a base UV C fixture including the UV C light source of the present invention and selecting a desired light modifier.

In a light source device, a control unit causes an energy density of a laser light in a lighting start region RS when a laser support light is maintained to be lower than an energy density of the laser light in the lighting start region RS when the laser support light is put on. For this reason, when the laser support light is maintained, a laser light L is radiated to the lighting start region RS at an energy density of a degree where sputtering does not occur. Therefore, in the light source device, because sputtering in a light emission sealing body can be suppressed, a sufficiently long life can be realized.

An ultraviolet irradiation device includes: a lamp house having at least one surface formed with a light extraction surface; an excimer lamp that is accommodated in the lamp house at a position apart from the light extraction surface in a first direction, the excimer lamp emitting ultraviolet light having a main emission wavelength belonging to a first wavelength band of 190 nm or more and 225 nm or less; a pair of electrodes that applies a voltage to a light-emitting tube of the excimer lamp; an optical filter that is disposed on the light extraction surface, and that substantially transmits the ultraviolet light having the first wavelength band and substantially fails to transmit ultraviolet light having a wavelength of 240 nm or more and 300 nm or less; and a light diffuser that is disposed between the excimer lamp and the optical filter in the lamp house in the first direction, for diffusing and reflecting light incident on the light diffuser.

An illumination source includes a laser driver unit configured to emit a plasma sustaining beam. An ingress collimator receives the plasma sustaining beam and produces a collimated ingress beam. A focusing optic receives the collimated ingress beam and produce a focused sustaining beam. A sealed lamp chamber contains an ionizable media that, once ignited, forms a high intensity light emitting plasma having a waist size smaller than 150 microns. The sealed lamp chamber further includes an ingress window configured to receive the focused sustaining beam and an egress window configured to emit the high intensity light. An ignition source is configured to ignite the ionizable media, and an exit fiber is configured to receive and convey the high intensity light. The high intensity light is white light with a black body spectrum, and the exit fiber has a diameter in the range of 200-500 micrometers.

An ultraviolet irradiation device includes: a lamp house having at least one surface formed with a light extraction surface; an excimer lamp that is accommodated in the lamp house at a position apart from the light extraction surface in a first direction, the excimer lamp emitting ultraviolet light having a main emission wavelength belonging to a first wavelength band of 190 nm or more and 225 nm or less; a pair of electrodes that applies a voltage to a light-emitting tube of the excimer lamp; an optical filter disposed on the light extraction surface, and that substantially transmits the ultraviolet light having the first wavelength band and substantially fails to transmit ultraviolet light having a wavelength of 240 nm or more and 300 nm or less; and a light diffuser that is disposed between the excimer lamp and the optical filter in the lamp house in the first direction.

An aspect of some embodiments of the present invention relates to a plasma chamber for containing a solution electrode glow discharge (SEGD) apparatus, the plasma chamber comprising a hollow body and a lens. The hollow body is configured to enclose a plasma generated between a solid electrode and a solution electrode, and includes at least one viewing port for letting light generated from the plasma leave the hollow body. The lens is disposed at or near the viewing port, the lens being configured to collect light from the plasma and direct the light onto a light receiving unit.

A Far UV radiation system including a Far UV radiation source and a high pass filter. The high pass filter having a cutoff wavelength of 234 nm-237 nm when measured at an incidence angle of zero degrees and adapted to substantially reduce UV C radiation emitted from the Far UV radiation source so that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm. The Far UV radiation system may be adapted to substantially reduce UV C, UV B, and UV A radiation from the Far UV radiation source.

Provided is a portable IPL sterilizer comprising: a body partitioned into a central region and a peripheral region surrounding at least a portion of the central region; a xenon lamp light source for sterilization provided in the central region of the body; and a light-shielding comb part provided in the peripheral region of the body.