H01J61/20

Lamp device, exposure apparatus, and method of manufacturing article

The present invention provides a lamp device comprising: a glass tube configured to cover a discharge space in which a pair of electrodes are arranged so as to face each other; and a bayonet cap portion provided in an end portion of the glass tube and electrically connected to one electrode of the pair of electrodes, wherein the bayonet cap portion is formed to have a shape including a bottom surface and a peripheral surface, and includes, in the bottom surface, a first opening configured to supply a gas to an inside of the bayonet cap portion and a second opening configured to exhaust the gas from the inside of the bayonet cap portion.

Lamp device, exposure apparatus, and method of manufacturing article

The present invention provides a lamp device comprising: a glass tube configured to cover a discharge space in which a pair of electrodes are arranged so as to face each other; and a bayonet cap portion provided in an end portion of the glass tube and electrically connected to one electrode of the pair of electrodes, wherein the bayonet cap portion is formed to have a shape including a bottom surface and a peripheral surface, and includes, in the bottom surface, a first opening configured to supply a gas to an inside of the bayonet cap portion and a second opening configured to exhaust the gas from the inside of the bayonet cap portion.

METHOD FOR EXPOSING PHOTOPOLYMERIZATION LAYER COMPRISING PHOTOPOLYMER
20230069972 · 2023-03-09 ·

A method for exposing a photopolymerization layer comprising photopolymers includes: providing a printed circuit board, with a photopolymerization layer disposed on the top side of the printed circuit board; performing first-instance exposure on the photopolymerization layer, using a UV source and a digital micro-lens device, wherein the UV source is of a power less than 0.2 kW; stopping the first-instance exposure; covering the photopolymerization layer with a mask, with the mask having a bottom side in contact with the photopolymerization layer; and performing second-instance exposure on the photopolymerization layer, using a mercury lamp and the mask, wherein the mercury lamp is of a power greater than 5 kW.

METHOD FOR EXPOSING PHOTOPOLYMERIZATION LAYER COMPRISING PHOTOPOLYMER
20230069972 · 2023-03-09 ·

A method for exposing a photopolymerization layer comprising photopolymers includes: providing a printed circuit board, with a photopolymerization layer disposed on the top side of the printed circuit board; performing first-instance exposure on the photopolymerization layer, using a UV source and a digital micro-lens device, wherein the UV source is of a power less than 0.2 kW; stopping the first-instance exposure; covering the photopolymerization layer with a mask, with the mask having a bottom side in contact with the photopolymerization layer; and performing second-instance exposure on the photopolymerization layer, using a mercury lamp and the mask, wherein the mercury lamp is of a power greater than 5 kW.

Photoactivated semiconductor photocatalytic air purification

In various embodiments, an air purifier capable of destroying and deactivating airborne contaminants such as SARS-CoV-2 is described. The air purifier comprises a photocatalytic system comprising at least one photoactivated semiconductor photocatalyst and a lamp configured to irradiate and excite the at least one photoactivated semiconductor photocatalyst to generate reductive and/or oxidative reactive species from oxygen and/or water on the photocatalyst surface. In various embodiments, the photocatalytic system comprises a stack of PCB cards, each card having a photocatalytic layer disposed thereon, or a 3-dimensionally ordered macroporous (3-DOM) structure comprising an open cell lattice.

Photoactivated semiconductor photocatalytic air purification

In various embodiments, an air purifier capable of destroying and deactivating airborne contaminants such as SARS-CoV-2 is described. The air purifier comprises a photocatalytic system comprising at least one photoactivated semiconductor photocatalyst and a lamp configured to irradiate and excite the at least one photoactivated semiconductor photocatalyst to generate reductive and/or oxidative reactive species from oxygen and/or water on the photocatalyst surface. In various embodiments, the photocatalytic system comprises a stack of PCB cards, each card having a photocatalytic layer disposed thereon, or a 3-dimensionally ordered macroporous (3-DOM) structure comprising an open cell lattice.

FAST START FLUORESCENT LIGHT BULB

An RF fluorescent lamp, comprising a bulbous vitreous portion of the RF fluorescent lamp comprising a vitreous envelope filled with a working gas mixture, a power coupler to induce an alternating electric field within the vitreous envelope, an electronic ballast, and a mercury amalgam accommodating structure mounted within the lamp envelope and adapted to absorb power from the electric field to rapidly heat and vaporize an amalgam of mercury to rapidly illuminate the lamp envelope during a turn-on phase of the RF fluorescent lamp, wherein the structure is comprised of a substrate material coated with a mixture of indium and gold.

System and Method for Inhibiting VUV Radiative Emission of a Laser-Sustained Plasma Source

A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element configured to focus the pump illumination from the pumping source into the volume of the gas mixture in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas containment element may be configured to contain a volume of a gas mixture including a first gas component and a second gas component. The second gas component suppresses at least one of a portion of the broadband radiation associated with the first gas component or radiation by one or more excimers associated with the first gas component from a spectrum of radiation exiting the gas mixture.

UV light source having combined ionization and formation of excimers

The invention relates to a device for producing UV light. Said device provides light from light sources that operate in accordance with different physical principles. The device comprises a chamber having several gas-filled plasma chambers (11, 12), wherein the chamber has at least one area (37, 39) transparent to UV light and/or VUV light. A first group (11) of plasma chambers is filled with an ionizable gas containing mercury and a second group (12) of plasma chambers is filled with a gas that forms excimers when suitably excited.

UV light source having combined ionization and formation of excimers

The invention relates to a device for producing UV light. Said device provides light from light sources that operate in accordance with different physical principles. The device comprises a chamber having several gas-filled plasma chambers (11, 12), wherein the chamber has at least one area (37, 39) transparent to UV light and/or VUV light. A first group (11) of plasma chambers is filled with an ionizable gas containing mercury and a second group (12) of plasma chambers is filled with a gas that forms excimers when suitably excited.