A plasma lamp for use in a laser-sustained plasma (LSP) light source is disclosed. The plasma lamp includes a gas containment structure for containing a gas, a gas seal positioned at a base of the gas containment structure, a gas inlet, and a gas outlet. The plasma lamp includes a gas swirler including a set of nozzles configured to generate a vortex gas flow and a swirler shaft including an inlet channel for delivering the gas from the gas inlet to the nozzles and an outlet channel for delivering the gas from the gas containment structure to the gas outlet. The plasma lamp includes a distributor including one or more plenums to distribute the gas from the gas inlet into the swirler. The plasma lamp may also include a deflector fluidically coupled to the swirler shaft and extending above the set of nozzles and configured to direct gas flow around the swirler.

A plasma lamp for use in a laser-sustained plasma (LSP) light source is disclosed. The plasma lamp includes a gas containment structure for containing a gas, a gas seal positioned at a base of the gas containment structure, a gas inlet, and a gas outlet. The plasma lamp includes a gas swirler including a set of nozzles configured to generate a vortex gas flow and a swirler shaft including an inlet channel for delivering the gas from the gas inlet to the nozzles and an outlet channel for delivering the gas from the gas containment structure to the gas outlet. The plasma lamp includes a distributor including one or more plenums to distribute the gas from the gas inlet into the swirler. The plasma lamp may also include a deflector fluidically coupled to the swirler shaft and extending above the set of nozzles and configured to direct gas flow around the swirler.

A UV C light source including a UV C bulb adapted to emit and project UV C light at a wavelength and an interchangeable UV C light modifier through which at least a portion of the UV C light emitted from said UV C bulb is projected. The UV C light modifier may be reflective, such as a reflector, perforated, holographic material, or mechanical modifier such as a barn door. The UV C light modifier might produce a narrow pattern, circular pattern, flat pattern, or asymmetrical pattern or other desired geometric pattern, or upper air pattern. The UV C light modifier is easily removed and interchanged or may be selectable such as by receiving a base UV C fixture including the UV C light source of the present invention and selecting a desired light modifier.

A UV C light source including a UV C bulb adapted to emit and project UV C light at a wavelength and an interchangeable UV C light modifier through which at least a portion of the UV C light emitted from said UV C bulb is projected. The UV C light modifier may be reflective, such as a reflector, perforated, holographic material, or mechanical modifier such as a barn door. The UV C light modifier might produce a narrow pattern, circular pattern, flat pattern, or asymmetrical pattern or other desired geometric pattern, or upper air pattern. The UV C light modifier is easily removed and interchanged or may be selectable such as by receiving a base UV C fixture including the UV C light source of the present invention and selecting a desired light modifier.

UV lamp modules for the ultraviolet irradiation of a substrate. The modules include multiple low-pressure mercury lamps, each having a longitudinal axis, located in a waterproof housing having a bottom, a top and a beam exit opening in the bottom which is closed by a beam exit window. To maintain hygiene, homogeneity and compactness, a first airflow zone for the supply of cooling air and a second, separate airflow zone for the discharge of heated cooling air are formed iii the housing. Viewed in a cross-section through the housing perpendicular to the longitudinal axes of the lamps and in a viewing direction from the bottom to the top, the beam exit window, the lamps and the airflow zones are arranged one after the other. The first airflow zone comprises an air supply duct which is equipped with at least one air-guiding mechanism for supplying cooling air to the lamps.

A system and method of extracting or inspecting a feature of an object using thermal imaging, and a method of inspecting an object of a garment product. The system includes a source of thermal influence arranged to heat or cool an object; an imager arranged to capture a plurality of images of the object when the object is subjected to the thermal influence; and an image processor arrange to processing the plurality of images and to distinguish a feature of interest from the other portions of the object presented on the plurality of images.

The present invention provides a lamp device comprising: a glass tube configured to cover a discharge space in which a pair of electrodes are arranged so as to face each other; and a bayonet cap portion provided in an end portion of the glass tube and electrically connected to one electrode of the pair of electrodes, wherein the bayonet cap portion is formed to have a shape including a bottom surface and a peripheral surface, and includes, in the bottom surface, a first opening configured to supply a gas to an inside of the bayonet cap portion and a second opening configured to exhaust the gas from the inside of the bayonet cap portion.

A Far UV radiation system including a Far UV radiation source and a high pass filter. The high pass filter having a cutoff wavelength of 234 nm-237 nm when measured at an incidence angle of zero degrees and adapted to substantially reduce UV C radiation emitted from the Far UV radiation source so that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm. The Far UV radiation system may be adapted to substantially reduce UV C, UV B, and UV A radiation from the Far UV radiation source.

A Far UV radiation system including a Far UV radiation source and a high pass filter. The high pass filter having a cutoff wavelength of 234 nm-237 nm when measured at an incidence angle of zero degrees and adapted to substantially reduce UV C radiation emitted from the Far UV radiation source so that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm. The Far UV radiation system may be adapted to substantially reduce UV C, UV B, and UV A radiation from the Far UV radiation source.

A light source apparatus (100) includes: a chamber (101) having a chamber wall (103) defining an opening (107); and a support apparatus (110) including a support device (111) positioned within the opening of the chamber wall. The support device includes: a cup (112) having an inner surface (114) configured to retain a movable apparatus and an outer surface (116) having a first outer diameter; and a plurality of rods (118) arranged at the outer surface of the cup such that the arrangement of the plurality of rods defines a second outer diameter, the second outer diameter greater than the first outer diameter. The chamber wall is configured to hold the support device such that the chamber wall contacts the plurality of rods when the support device is positioned within the opening of the chamber wall, and the outer surface of the cup does not contact the chamber wall.