A Far UV radiation system including a Far UV radiation source and a high pass filter. The high pass filter having a cutoff wavelength of 234 nm-237 nm when measured at an incidence angle of zero degrees and adapted to substantially reduce UV C radiation emitted from the Far UV radiation source so that the Far UV radiation system does not emit substantial UV radiation in wavelengths longer than 240 nm. The Far UV radiation system may be adapted to substantially reduce UV C, UV B, and UV A radiation from the Far UV radiation source.

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

The invention relates to a device for producing UV light. Said device provides light from light sources that operate in accordance with different physical principles. The device comprises a chamber having several gas-filled plasma chambers (11, 12), wherein the chamber has at least one area (37, 39) transparent to UV light and/or VUV light. A first group (11) of plasma chambers is filled with an ionizable gas containing mercury and a second group (12) of plasma chambers is filled with a gas that forms excimers when suitably excited.

The invention relates to a device for producing UV light. Said device provides light from light sources that operate in accordance with different physical principles. The device comprises a chamber having several gas-filled plasma chambers (11, 12), wherein the chamber has at least one area (37, 39) transparent to UV light and/or VUV light. A first group (11) of plasma chambers is filled with an ionizable gas containing mercury and a second group (12) of plasma chambers is filled with a gas that forms excimers when suitably excited.

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

An excimer bulb fixture including an excimer bulb emitting a beam of UV light at a far UV C wavelength. The fixture includes a krypton/chloride bulb, a band pass filter and a diffusion layer or lens. The krypton/chloride bulb is adapted to project a beam of far UV C light through the filter and then through the diffusion layer or lens. The band pass filter is adapted to block substantial UV radiation wavelengths longer than 234 nm. The diffusion layer or lens is adapted to widen the beam of far UV C light. A method far widening a beam of far UV C light includes the steps of projecting a beam of far UV C light produced by a krypton/chloride bulb through a band pass filter; blocking substantially UV C radiation longer than 234 nm; projecting the filtered beam through a diffusion filter or lens; and, widening the filtered beam.

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

An excimer bulb assembly, with an excimer bulb, at least one integral captured reflector, and an integral filter such that the excimer bulb only emits substantial UV radiation between 200 nm and 230 nm, using a filter that passes light from about 200 nm to 234 nm (+/−2 nm).

An excimer bulb assembly including a krypton/chlorine excimer bulb and a pass filter. The excimer bulb assembly does not emit substantial UV C radiation in wavelengths longer than deadly 240 nm through UV C wavelengths. The pass filter is adapted to block substantial UV C radiation in wavelengths in the range of 240 nm-280 nm. The assembly may include a captured reflector, a smart chip, and/or a heat sink. The bulb and its electrical connectors may form a cartridge. The assembly may include a housing and the cartridge may swivel in the housing.

A can type fixture including a housing adapted for insertion into a hole in a ceiling. An excimer bulb or plurality of excimer bulbs supported in the housing and adapted for emitting Far UV C radiation at a plurality of wavelengths. A filter or a plurality of filters adapted for removing Far UV C wavelengths harmful to humans. A reflector and/or a diffusion layer. A driver/power supply is supported by the housing. The driver/power supply is adapted for providing electrical power to the excimer bulb(s) and is in electrical communication with the excimer bulb(s). The driver/power supply may be adapted to dim the excimer bulb(s). An illumination element, such as an LED array may be supported in the housing. The fixture may also include a motion sensor, crowd density sensor, proximity sensor, and/or distance sensor and may communicate via IoT.