A high frequency plasma apparatus includes a reaction chamber, a first electrode, a second electrode, and a plurality of feed points located at one of the two electrodes at least. The feed points are used to simultaneously generate a first standing wave and a second standing wave, with different temporal and spatial patterns. By adjusting amplitudes of the two standing waves and the temporal and spatial phase differences between the two standing waves appropriately, plasma uniformity of the high frequency plasma apparatus can be effectively improved.

An ionic wind purifier is described. The ionic wind purifier includes a generating electrode and a collecting electrode, which are arranged oppositely. A potential difference exists between the generating electrode and the collecting electrode, and at least one first projecting part is arranged on each collecting electrode plate of the collecting electrode. The first projecting part has a smooth surface. Thus, by arranging the first projecting part, the adsorption area of the collecting electrode is increased and the absorption capability of the collecting electrode is improved, thereby improving the purification efficiency of the ionic wind purifier and improving the use performance thereof. A discharge monitoring and protective circuit of a high-voltage ion purifier is also described.

In one embodiment, an RF generator includes an RF amplifier comprising an RF input, a DC input, and an RF output, the RF amplifier configured to receive at the RF input an RF signal from an RF source; receive at the DC input a DC voltage from a DC source; and provide an output power at the RF output; and a control unit operably coupled to the DC source and the RF source, the control unit configured to receive a power setpoint indicative of a desired output power at the RF output; determine a power dissipation at the RF generator; alter the DC voltage to decrease the power dissipation at the RF generator; and alter the RF signal to enable the output power at the RF output to be substantially equal to the power setpoint.

A plasma treatment device having an electrode arrangement (3) for generating a plasma in a supplied gas stream. The electrode arrangement has at least one movably mounted electrode. The plasma is preferably a cold atmospheric pressure plasma and can be generated so as to vary in location by means of movement of the at least one electrode.

A gas field ionization source for forming an electric field for ionizing gas comprises: an emitter tip having a tip end; an extraction electrode facing the emitter tip and having an aperture at a position distant therefrom; a gas supply means for supplying the gas in the vicinity of the emitter tip; a vacuum partition made of a metal having a hole; and a high voltage power source for applying voltage between the emitter tip and the extraction electrode. The hole is constructed so that the tip end of the emitter tip can pass therethrough and the vacuum partition has a micro protrusion, around the hole, protruding toward a side of the extraction electrode.

A gas field ionization source for forming an electric field for ionizing gas comprises: an emitter tip having a tip end; an extraction electrode facing the emitter tip and having an aperture at a position distant therefrom; a gas supply means for supplying the gas in the vicinity of the emitter tip; a vacuum partition made of a metal having a hole; and a high voltage power source for applying voltage between the emitter tip and the extraction electrode. The hole is constructed so that the tip end of the emitter tip can pass therethrough and the vacuum partition has a micro protrusion, around the hole, protruding toward a side of the extraction electrode.

In one embodiment, the present disclosure is directed to an RF impedance matching network that includes an electronically variable capacitor (EVC) and a control circuit. The control circuit is coupled to a sensor configured to detecting an RF parameter. To cause an impedance match between an RF source and a plasma chamber, the control circuit determines, using a match lookup table with a value based on the detected RF parameter, a match combination of a new EVC configuration for providing a new EVC capacitance, and a new source frequency for the RF source. The control circuit then alters the EVC to the new EVC configuration, and alters the variable frequency of the RF source to the new source frequency.

An IHC ion source that employs a negatively biased cathode and one or more side electrodes is disclosed. The one or more side electrodes are left electrically unconnected in certain embodiments and are grounded in other embodiments. The floating side electrodes may be beneficial in the formation of certain species. In certain embodiments, a relay is used to allow the side electrodes to be easily switched between these two modes. By changing the configuration of the side electrodes, beam current can be optimized for different species. For example, certain species, such as arsenic, may be optimized when the side electrodes are at the same voltage as the chamber. Other species, such as boron, may be optimized when the side electrodes are left floating relative to the chamber. In certain embodiments, a controller is in communication with the relay so as to control which mode is used, based on the desired feed gas.

An electrical arrangement, which may, for example be a magnetron, has a sealed chamber and electrically insulating fluid contained within the chamber. A temperature expansion compensation bladder comprising a helical tube is located within the chamber, the helical tube having an end open to ambient atmosphere outside the chamber, and having a closed end within the chamber.

An illumination device capable of appropriately suppressing a temperature rise of a light emitting part, wherein the illumination device comprises a light emitting part configured to emit light for illumination, a cooling part configured to cool the light emitting part. The illumination device acquires a temperature at a first position, acquires a temperature at a second position that is less susceptible to a temperature change of the light emitting part than the first position, determines presence or absence of light emission of the light emitting part, and controls driving of the cooling part based on the acquired temperature at the first position, the acquired temperature at the second position and a determination result of the presence or absence of light emission.