A method for producing a radiation window includes patterning a photo resist structure onto a double-sided silicon wafer, plasma etching the silicon wafer to create an etched silicon wafer having a silicon supporting structure etched upon a first side of the double-sided silicon wafer, applying a silicon nitride thin film to the etched silicon wafer, patterning a photo resist structure and plasma etching a second side of the double-sided silicon wafer to create an initial window in the silicon nitride thin film, and wet etching the second side of the double-sided silicon wafer to release the silicon nitride thin film and supporting structure from the portion of the double-sided silicon wafer defined by the initial window.

A method for producing a radiation window includes patterning a photo resist structure onto a double-sided silicon wafer, plasma etching the silicon wafer to create an etched silicon wafer having a silicon supporting structure etched upon a first side of the double-sided silicon wafer, applying a silicon nitride thin film to the etched silicon wafer, patterning a photo resist structure and plasma etching a second side of the double-sided silicon wafer to create an initial window in the silicon nitride thin film, and wet etching the second side of the double-sided silicon wafer to release the silicon nitride thin film and supporting structure from the portion of the double-sided silicon wafer defined by the initial window.

A method of forming a high-pressure plasma lamp includes providing a lamp bulb. The lamp bulb includes a top channel and a bottom channel. The method includes inserting a top electrode element into the top channel of the lamp bulb. The method includes providing a glass tubular structure attached to a bottom electrode element. The method includes filling the lamp bulb with a liquified gas through the bottom channel of the lamp bulb. The method includes inserting the bottom electrode element and the glass tubular structure into the bottom channel.

A method is for manufacturing a multilayer radiation window for an X-ray measurement apparatus. The method includes: producing a gas diffusion stop layer made of silicon nitride on a polished surface of a carrier; producing at least one combined layer on an opposite side of the gas diffusion stop layer than the carrier; attaching the combined structure including the carrier, the gas diffusion stop layer, the at least one combined layer to a region around an opening in a support structure with the at least one combined layer facing the support structure; and etching away the carrier. The at least one combined layer includes: a light attenuation layer made of aluminium, and a strengthening layer. A radiation window is manufactured with the method.

A flame detector including an ultraviolet emitter configured to emit ultraviolet light at a strike voltage less than or equal to approximately 230 volts. A method of manufacturing an ultraviolet emitter for use in a flame detector, the ultraviolet emitter including a hermetically sealed, alkali rich, ultraviolet transmissive glass envelope, the method including: (a) wrapping an envelope exterior surface with a conductive material; (b) performing a first injection of at least one non-radioactive gas into the glass envelope at a first pressure; (c) applying a voltage bias to the glass envelope; (d) baking the hermetically sealed, alkali rich, ultraviolet transmissive glass envelope at a baking temperature for a baking duration of time; (e) cooling the hermetically sealed, alkali rich, ultraviolet transmissive glass envelope to a desired temperature; and (f) performing a second injection of at least one non-radioactive gas into the glass envelope at a second pressure.

A flame detector including an ultraviolet emitter configured to emit ultraviolet light at a strike voltage less than or equal to approximately 230 volts. A method of manufacturing an ultraviolet emitter for use in a flame detector, the ultraviolet emitter including a hermetically sealed, alkali rich, ultraviolet transmissive glass envelope, the method including: (a) wrapping an envelope exterior surface with a conductive material; (b) performing a first injection of at least one non-radioactive gas into the glass envelope at a first pressure; (c) applying a voltage bias to the glass envelope; (d) baking the hermetically sealed, alkali rich, ultraviolet transmissive glass envelope at a baking temperature for a baking duration of time; (e) cooling the hermetically sealed, alkali rich, ultraviolet transmissive glass envelope to a desired temperature; and (f) performing a second injection of at least one non-radioactive gas into the glass envelope at a second pressure.

An RF fluorescent lamp, comprising a bulbous vitreous portion of the RF fluorescent lamp comprising a vitreous envelope filled with a working gas mixture, a power coupler to induce an alternating electric field within the vitreous envelope, an electronic ballast, and a mercury amalgam accommodating structure mounted within the lamp envelope and adapted to absorb power from the electric field to rapidly heat and vaporize an amalgam of mercury to rapidly illuminate the lamp envelope during a turn-on phase of the RF fluorescent lamp, wherein the structure is comprised of a substrate material coated with a mixture of indium and gold.

The invention includes a flat-panel-display (FPD) manufacturing machine which utilizes x-rays for electrostatic dissipation of a bottom side of a FPD when lifting the FPD off of a table during manufacture of the FPD. The invention also includes a method of electrostatic dissipation of a bottom side of an FPD.

A method and system for reducing static charges on a material. X-rays can ionize a flowing fluid. The ions can be transported to the material and can reduce or dissipate the static charges.

An electrostatic-dissipation device comprising an x-ray tube and an electrically-conductive shell that is electrically coupled to an anode of the x-ray tube can be used for electrostatic dissipation, especially at a bottom side of a flat-panel-display (FPD).