Disclosed herein is an electron-optical assembly testing system for testing an electron-optical assembly, the system comprising: a source of charged particles configured to emit a beam of charged particles; an electron-optical assembly holder configured to hold an electron-optical assembly to be tested such that, when the system is in use with an electron-optical assembly held by the electron-optical assembly holder, the electron-optical assembly is illuminated by the beam; and a sub-beam detector for detecting sub-beams of charged particles that have been transmitted through the electron-optical assembly.

Disclosed herein is an electron-optical assembly testing system for testing an electron-optical assembly, the system comprising: a source of charged particles configured to emit a beam of charged particles; an electron-optical assembly holder configured to hold an electron-optical assembly to be tested such that, when the system is in use with an electron-optical assembly held by the electron-optical assembly holder, the electron-optical assembly is illuminated by the beam; and a sub-beam detector for detecting sub-beams of charged particles that have been transmitted through the electron-optical assembly.

In one embodiment, a method for inspecting a blanking plate includes generating a plurality of beams by causing a charged particle beam to pass through a shaping aperture array having a plurality of holes, performing blanking deflection on the plurality of beams by using a plurality of blankers provided in a blanking plate, each of the plurality of blankers corresponding to one of the plurality of beams, writing a first inspection pattern on a substrate by using a first writing mode in which beams that have not been deflected by the plurality of blankers are radiated onto the substrate, writing a second inspection pattern on the substrate by using a second writing mode in which beams that have been deflected by the plurality of blankers are radiated onto the substrate, obtaining a pattern image of the first inspection pattern and a pattern image of the second inspection pattern, the first and second inspection patterns having been formed on the substrate, and determining a defect by comparing the obtained pattern images.

A secondary electron emissive layer resistant to infiltration and fouling. A barrier layer is formed by atomic layer deposition. The barrier layer may be an emissive layer and/or an interlayer. The barrier layer may form an interlayer that is a part of an electron amplifier positioned between an emissive layer and a resistive layer. The barrier layer is resistive to fluorine migration from either the emissive layer or the resistive layer.

A secondary electron emissive layer resistant to infiltration and fouling. A barrier layer is formed by atomic layer deposition. The barrier layer may be an emissive layer and/or an interlayer. The barrier layer may form an interlayer that is a part of an electron amplifier positioned between an emissive layer and a resistive layer. The barrier layer is resistive to fluorine migration from either the emissive layer or the resistive layer.

An apparatus for generating electrical discharge includes a component that generates an electrical discharge, a measurement circuit configured to measure a magnitude of the electrical discharge, and a controller configured to control the magnitudes of the electrical discharge. A method for controlling a reference partial discharge signal in an electric power system includes generating a partial discharge for built in self test, controlling an expected discharge magnitude of the partial discharge, and includes measuring an actual discharge magnitude of the partial discharge.

A measuring device and method, provided in a region surrounded by a focus ring and configured to measure an amount of consumption of the focus ring, includes a disc-shaped base substrate, sensor electrodes provided on the base substrate, a high frequency oscillator configured to apply a high frequency signal to the sensor electrodes, and an operation unit configured to calculate measurement values indicating electrostatic capacitances of the sensor electrodes from detection values corresponding to potentials of the sensor electrodes. The operation unit calculates a representative value (for example an average value) of the measurement values corresponding to the amount of consumption of the focus ring and derives the amount of consumption of the focus ring with reference to a table in which the amount of consumption of the focus ring is associated with the representative value of the measurement values.

A method includes performing by a processor: estimating a total cathode space current for a thermionic vacuum tube having at least one grid and a plate, such that at least one amplification factor associated with the at least one grid is determined by a polynomial based on a variable that represents at plurality of voltages associated with the at least one grid and the plate, the variable being heuristically determine. Transitions between positive and negative grid operation may experience a step change in estimated current value caused by the inclusion or elimination of grid current. A part of the grid current may be added back into the plate current during transition. This small contribution to plate current may gradually diminish as tube operation moves farther away from the transition boundary.

A microwave excited ultraviolet lamp system with a data logging and retrieval circuit and method for operating the same. The data logging and retrieval circuit stores operational data in a cache memory using a FIFO data storage protocol. The contents of the cache memory are periodically copied to a larger removable memory so that the removable memory contains a relatively long historical record of the system operational parameters. The data logging and retrieval circuit includes a data port configured to load the contents of the cache memory into an external device when the device is coupled to the data port. A second data port allows the external device to supply power to the data logging and retrieval circuit so that data may be retrieved when the internal power supply is malfunctioning. Data stored in the removable memory may be protected so that it may only be accessed by authorized personnel.

A microwave excited ultraviolet lamp system with a data logging and retrieval circuit and method for operating the same. The data logging and retrieval circuit stores operational data in a cache memory using a FIFO data storage protocol. The contents of the cache memory are periodically copied to a larger removable memory so that the removable memory contains a relatively long historical record of the system operational parameters. The data logging and retrieval circuit includes a data port configured to load the contents of the cache memory into an external device when the device is coupled to the data port. A second data port allows the external device to supply power to the data logging and retrieval circuit so that data may be retrieved when the internal power supply is malfunctioning. Data stored in the removable memory may be protected so that it may only be accessed by authorized personnel.