A semiconductor device assembly has a first substrate, a second substrate, and an anisotropic conductive film. The first substrate includes a first plurality of connectors. The second substrate includes a second plurality of connectors. The anisotropic conductive film is positioned between the first plurality of connectors and the second plurality of connectors. The anisotropic conductive film has an electrically insulative material and a plurality of interconnects laterally separated by the electrically insulative material. The plurality of interconnects forms electrically conductive channels extending from the first plurality of connectors to the second plurality of connectors. A method includes connecting the plurality of interconnects to the first plurality of connectors and the second plurality of connectors, such that the electrically conductive channels are operable to conduct electricity from the first substrate to the second substrate. The method may include passing electrical current through the plurality of interconnects.

A semiconductor device assembly has a first substrate, a second substrate, and an anisotropic conductive film. The first substrate includes a first plurality of connectors. The second substrate includes a second plurality of connectors. The anisotropic conductive film is positioned between the first plurality of connectors and the second plurality of connectors. The anisotropic conductive film has an electrically insulative material and a plurality of interconnects laterally separated by the electrically insulative material. The plurality of interconnects forms electrically conductive channels extending from the first plurality of connectors to the second plurality of connectors. A method includes connecting the plurality of interconnects to the first plurality of connectors and the second plurality of connectors, such that the electrically conductive channels are operable to conduct electricity from the first substrate to the second substrate. The method may include passing electrical current through the plurality of interconnects.

An imaging module of the invention includes: an image-sensing device that has a light-receiving face, a terminal surface located on an opposite side of the light-receiving face, and a plurality of image-sensing terminals provided on the terminal surface; a support that has a first end disposed on the terminal surface, a second end disposed on an opposite side of the first end, a side face disposed between the first end and the second end, and a guide disposed on the side face so as to correspond to positions of the image-sensing terminals and that is formed of an insulator; a coaxial cable including a conductor disposed on the guide; and solder that electrically connects the conductor to an image-sensing terminal corresponding to the conductor on the guide.

A semiconductor device assembly has a first substrate, a second substrate, and an anisotropic conductive film. The first substrate includes a first plurality of connectors. The second substrate includes a second plurality of connectors. The anisotropic conductive film is positioned between the first plurality of connectors and the second plurality of connectors. The anisotropic conductive film has an electrically insulative material and a plurality of interconnects laterally separated by the electrically insulative material. The plurality of interconnects forms electrically conductive channels extending from the first plurality of connectors to the second plurality of connectors. A method includes connecting the plurality of interconnects to the first plurality of connectors and the second plurality of connectors, such that the electrically conductive channels are operable to conduct electricity from the first substrate to the second substrate. The method may include passing electrical current through the plurality of interconnects.

An integrated passive device (IPD) comprises a conductive substrate having a front side and a back side and a plurality of layers including front and back dielectric layers and front and back conductive polymer layers, the plurality of layers defining front and back isolation trenches revealing the front and back sides of the substrate. The IPD may comprise a first metal contact electrically connected to the substrate by way of a blind via defined from a front outer surface of the IPD to the front side of the substrate and positioned within the front isolation trench. The IPD may comprise a second metal contact electrically isolated from the first and electrically connected to the polymer layers, connection to the back polymer layer being by way of a through via defined from the front surface to a back surface of the IPD and positioned within the front and back isolation trenches.

An imaging module of the invention includes: an image-sensing device that has a light-receiving face, a terminal surface located on an opposite side of the light-receiving face, and a plurality of image-sensing terminals provided on the terminal surface; a support that has a first end disposed on the terminal surface, a second end disposed on an opposite side of the first end, a side face disposed between the first end and the second end, and a guide disposed on the side face so as to correspond to positions of the image-sensing terminals and that is formed of an insulator; a coaxial cable including a conductor disposed on the guide; and solder that electrically connects the conductor to an image-sensing terminal corresponding to the conductor on the guide.

A semiconductor device assembly has a first substrate, a second substrate, and an anisotropic conductive film. The first substrate includes a first plurality of connectors. The second substrate includes a second plurality of connectors. The anisotropic conductive film is positioned between the first plurality of connectors and the second plurality of connectors. The anisotropic conductive film has an electrically insulative material and a plurality of interconnects laterally separated by the electrically insulative material. The plurality of interconnects forms electrically conductive channels extending from the first plurality of connectors to the second plurality of connectors. A method includes connecting the plurality of interconnects to the first plurality of connectors and the second plurality of connectors, such that the electrically conductive channels are operable to conduct electricity from the first substrate to the second substrate. The method may include passing electrical current through the plurality of interconnects.

A semiconductor device assembly has a first substrate, a second substrate, and an anisotropic conductive film. The first substrate includes a first plurality of connectors. The second substrate includes a second plurality of connectors. The anisotropic conductive film is positioned between the first plurality of connectors and the second plurality of connectors. The anisotropic conductive film has an electrically insulative material and a plurality of interconnects laterally separated by the electrically insulative material. The plurality of interconnects forms electrically conductive channels extending from the first plurality of connectors to the second plurality of connectors. A method includes connecting the plurality of interconnects to the first plurality of connectors and the second plurality of connectors, such that the electrically conductive channels are operable to conduct electricity from the first substrate to the second substrate. The method may include passing electrical current through the plurality of interconnects.

An apparatus comprising a first integrated circuit device, the first integrated circuit device comprising a first layer with an area comprising metallization and metal-free slits; and a fiducial in a second layer above the first layer, the fiducial formed over the area comprising the metallization and metal-free slits.

An apparatus comprising an integrated circuit device comprising a fiducial area of a first layer, the fiducial area comprising a metal area and a metal free area; and a plurality of zones that are metal free in multiple layers adjacent to the first layer, wherein the zones are defined by a footprint based on the fiducial area of the first layer and a second fiducial area of a second integrated circuit device, the footprint comprising multiple slits.