Patent classifications
H
H01
H01L
2224/00
H01L2224/01
H01L2224/26
H01L2224/31
H01L2224/33
H01L2224/331
H01L2224/3312
H01L2224/3314
H01L2224/3314
FIDUCIALS WITH UNDERLYING DUMMY METALLIZATION FOR INTEGRATED CIRCUIT DEVICE ALIGNMENT
20250006652
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2025-01-02
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An apparatus comprising a first integrated circuit device, the first integrated circuit device comprising a first layer with an area comprising metallization and metal-free slits; and a fiducial in a second layer above the first layer, the fiducial formed over the area comprising the metallization and metal-free slits.