The present disclosure relates to the technical field of semiconductor packaging, and discloses a semiconductor structure and a method for forming the same. The method includes: providing a chip, the chip having interconnect structures on its surface, the top of the interconnect structures having an exposed fusible portion; providing a substrate, the substrate having conductive structures on its surface; patterning the conductive structures so that edges of the conductive structures have protrusions; combining the chip with the substrate. The new structure design avoids the product failure of the chip and the semiconductor substrate in the molding stage, and also strengthens the weld metal bonding force between the conductive structures and the substrate.

The present disclosure relates to the technical field of semiconductor packaging, and discloses a semiconductor structure and a method for forming the same. The method includes: providing a chip, the chip having interconnect structures on its surface, the top of the interconnect structures having an exposed fusible portion; providing a substrate, the substrate having conductive structures on its surface; patterning the conductive structures so that edges of the conductive structures have protrusions; combining the chip with the substrate. The new structure design avoids the product failure of the chip and the semiconductor substrate in the molding stage, and also strengthens the weld metal bonding force between the conductive structures and the substrate.

Embodiments relate to the design of a device capable of maintaining the alignment an interconnect by resisting lateral forces acting on surfaces of the interconnect. The device comprises a first body comprising a first surface with a nanoporous metal structure protruding from the first surface. The device further comprises a second body comprising a second surface with a locking structure to resist a lateral force between the first body and the second body during or after assembly of the first body and the second body.

A semiconductor device has a plurality of interconnected modular units to form a 3D semiconductor package. Each modular unit is implemented as a vertical component or a horizontal component. The modular units are interconnected through a vertical conduction path and lateral conduction path within the vertical component or horizontal component. The vertical component and horizontal component each have an interconnect interposer or semiconductor die. A first conductive via is formed vertically through the interconnect interposer. A second conductive via is formed laterally through the interconnect interposer. The interconnect interposer can be programmable. A plurality of protrusions and recesses are formed on the vertical component or horizontal component, and a plurality of recesses on the vertical component or horizontal component. The protrusions are inserted into the recesses to interlock the vertical component and horizontal component. The 3D semiconductor package can be formed with multiple tiers of vertical components and horizontal components.

In some examples, a system comprises a set of nanoparticles and a set of nanowires extending from the set of nanoparticles.

Embodiments include transistor devices and a method of forming the transistor devices. A transistor device includes a first conductive layer over a substrate, a first transistor having first interconnects in the first conductive layer, and a second conductive layer on an insulating layer that is on the first conductive layer. The transistor device also includes a second transistor having second interconnects in the second conductive layer, and a gate electrode over the substrate, where the gate electrode has a workfunction metal that surrounds the first and second interconnects. The first and second conductive layers may include conductive materials such as an epitaxial (EPI) layer, a metal layer, or a doped-semiconductor layer. The transistor device may further include a dielectric surrounding the interconnects as the dielectric is surrounded with the workfunction metal, and a transition layer disposed between the dielectric and interconnects. The dielectric may include a high-k dielectric material.

Embodiments include transistor devices and a method of forming the transistor devices. A transistor device includes a first conductive layer over a substrate, a first transistor having first interconnects in the first conductive layer, and a second conductive layer on an insulating layer that is on the first conductive layer. The transistor device also includes a second transistor having second interconnects in the second conductive layer, and a gate electrode over the substrate, where the gate electrode has a workfunction metal that surrounds the first and second interconnects. The first and second conductive layers may include conductive materials such as an epitaxial (EPI) layer, a metal layer, or a doped-semiconductor layer. The transistor device may further include a dielectric surrounding the interconnects as the dielectric is surrounded with the workfunction metal, and a transition layer disposed between the dielectric and interconnects. The dielectric may include a high-k dielectric material.

Aspects of the present invention provide a semiconductor structure. The semiconductor structure may include a substrate having a first substrate alignment structure. The semiconductor structure may also include a first die with a first die alignment structure. The first die may be attached to the substrate with the first substrate alignment structure matched to the first die alignment structure.

A variable-stiffness module comprises a rigid structure (10) having a first stiffness, an intermediate substrate (20) having a second stiffness less than the first stiffness, and a flexible substrate (30) having a third stiffness less than the second stiffness. The rigid structure (10) is disposed on the intermediate substrate (20) and the intermediate substrate (20) is disposed on the flexible substrate (30). A conductor (40) is disposed partially on the intermediate substrate (21) and partially on the flexible substrate (30) and connected to the rigid structure (10). The conductor (40) extends from the rigid structure (10) to the intermediate substrate (21) to the flexible substrate (30). In some embodiments, a variable-stiffness module comprises any combination of multiple rigid structures, multiple intermediate substrates, and multiple conductors. The conductor (40) can be an optical conductor or an electrical conductor and can be disposed over the rigid structure (10) or between the rigid structure (10) and the intermediate substrate (21).

In some examples, a system comprises a set of nanoparticles and a set of nanowires extending from the set of nanoparticles.