Systems, methods, and circuitries are provided for calibrating a heater used to heat an adjustable resistance network during a trimming procedure. In one example, a circuit is provided that includes an adjustable resistance network including first resistance segments; a heater element thermally coupled to the adjustable resistance network; a calibration resistor including second resistance segments thermally coupled to the first resistance segments; and interface circuitry coupled to the calibration resistor.

A semiconductor device including: a first S/D arrangement including a silicide-sandwiched portion of a corresponding active region having a silicide-sandwiched configuration, a first portion of a corresponding metal-to-drain/source (MD) contact structure, a first via-to-MD (VD) structure, and a first buried via-to-source/drain (BVD) structure; a gate structure over a channel portion of the corresponding active region; and a second S/D arrangement including a first doped portion of the corresponding active region; and at least one of the following: an upper contact arrangement including a first silicide layer over the first doped portion, a second portion of the corresponding MD contact structure; and a second VD structure; or a lower contact arrangement including a second silicide layer under the first doped portion, and a second BVD structure.

A high frequency circuit includes: a first wire provided on a front surface of a board and being in contact with a heat generation part; a second wire provided on the front surface of the board and connected to ground; and a chip resistor connected between the first wire and the second wire and having a thermal conductive characteristic and an electric insulation characteristic, and the first wire includes: a wire part which is disposed between the heat generation part and the chip resistor, and which has a characteristic impedance equal to an impedance as a reference for impedance matching in the first wire; and a wire part which is disposed on a low temperature side with the chip resistor being set as a boundary, and which has a thermal resistance higher than that of the chip resistor.

A semiconductor structure includes a semiconductor device (e.g., an e-fuse or photonic device) and a metallic heating element adjacent thereto. The heating element has a lower portion within a middle of the line (MOL) dielectric layer adjacent to the semiconductor device and an upper portion with a tapered top end that extends into a back end of the line (BEOL) dielectric layer. A method of forming the semiconductor structure includes forming a cavity such that it has both a lower section, which extends from a top surface of a MOL dielectric layer downward toward a semiconductor device, and an upper section, which extends from the top surface of the MOL dielectric layer upward and which is capped by an area of a BEOL dielectric layer having a concave bottom surface. A metallic fill material can then be deposited into the cavity (e.g., through via openings) to form the heating element.

A method may include thinning a silicon wafer to a particular thickness. The particular thickness may be based on a passband frequency spectrum of an adjustable optical filter. The method may also include covering a surface of the silicon wafer with an optical coating. The optical coating may filter an optical signal and may be based on the passband frequency spectrum. The method may additionally include depositing a plurality of thermal tuning components on the coated silicon wafer. The plurality of thermal tuning components may adjust a passband frequency range of the adjustable optical filter by adjusting a temperature of the coated silicon wafer. The passband frequency range may be within the passband frequency spectrum. The method may include dividing the coated silicon wafer into a plurality of silicon wafer dies. Each silicon wafer die may include multiple thermal tuning components and may be the adjustable optical filter.

Memory devices might include an array of memory cells, a plurality of access lines, and a heater. The array of memory cells might include a plurality of strings of series-connected memory cells. Each access line of the plurality of access lines might be connected to a control gate of a respective memory cell of each string of series-connected memory cells of the plurality of strings of series-connected memory cells. The heater might be adjacent to an end of each access line of the plurality of access lines.

Embodiments include a reflowable grid array (RGA) interposer, a semiconductor packaged system, and a method of forming the semiconductor packaged system. The RGA interposer includes a substrate having vias and zones, where the zones have embedded heaters. The heaters may include first traces, second traces, and via filament interconnects. The vias may have a z-height greater than a z-height of the heaters, and each of the zones may have a grid pattern. The RGA interposer may include first and second layers in the substrate, where the first layer includes the first traces, the second layer includes the second traces, and the second layer is over the first layer. The grid pattern may have parallel first traces orthogonal to parallel second traces to form a pattern of squares, where the pattern of squares has the first traces intersect the second traces substantially at right angles.

Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a package substrate, and a die, electrically coupled to the package substrate, including a silicon substrate having a first surface and an opposing second surface; a device layer at the first surface of the silicon substrate; and a dielectric layer, having a heater trace, at the second surface of the silicon substrate.

An integrated circuit includes a lead frame, a first die, and a second die. The first die is bonded to and electrically connected to the lead frame. The second die is electrically connected to and spaced apart from the first die.

The invention is notably directed to a transflective display device. The device comprises a set of pixels, wherein each of the pixels comprises a portion of bi-stable, phase change material, hereafter a PCM portion, having at least two reversibly switchable states, in which it has two different values of refractive index and/or optical absorption. The device further comprises one or more spacers, optically transmissive, and extending under PCM portions of the set of pixels. One or more reflectors extend under the one or more spacers. An energization structure is in thermal or electrical communication with the PCM portions, via the one or more spacers. Moreover, a display controller is configured to selectively energize, via the energization structure, PCM portions of the pixels, so as to reversibly switch a state of a PCM portion of any of the pixels from one of its reversibly switchable states to the other. A backlight unit is furthermore configured, in the device, to allow illumination of the PCM portions through the one or more spacers. The backlight unit is controlled by a backlight unit controller, which is configured for modulating one or more physical properties of light emitted from the backlight unit. The invention is further directed to related devices and methods of operation.