An integrated circuit (IC) that is otherwise radiation tolerant implements a radiation tolerance limiting feature (RTLF) to ensure that the IC, as manufactured, will fail applicable radiation tolerance tests, thereby allowing it to be manufactured by any suitable IC foundry. Embodiments further include a programmable radiation tolerance feature (PRT) that can be actuated at an authorized actuation site after IC manufacture to override the RTLF, thereby rendering the IC radiation tolerant. The PRT and/or RTLF can include redundancy to ensure reliability. The PRT and/or RTLF can be obfuscated, encrypted, and/or password protected. Actuating the PRT can include applying a programming signal to the IC and/or uploading code to a programmable element after IC manufacture. A plurality of RTLFs can be included to ensure failure of any desired combination of applicable radiation tolerance tests, such as total radiation dosage, linear energy transfer events, radiation dose rate, and single event upset.

An integrated circuit (IC) implements a radiation tolerance limiting feature (RTLF) to ensure that the IC, as manufactured, will fail one or more applicable radiation tolerance tests, for example by reducing or eliminating a required voltage or blocking a required signal. As a result, the IC can be manufactured by any suitable IC foundry, and exported without restriction. The RTLF can include a leakage component, such as an oxide dielectric capacitor, a radiation-sensitive MOSFET or SCR, or a photocurrent generating component. The RTLF can include redundancy to ensure reliability. A plurality of RTLFs can be included to ensure failure of any desired combination of applicable radiation tolerance tests, such as total radiation dosage, linear energy transfer events, radiation dose rate, and single event upset. The RTLF can be obfuscated within the IC design. The RTLF can include a testing output to ensure its functionality.

Semiconductor devices and associated systems and methods are disclosed herein. In some embodiments, the semiconductor devices include a package substrate, a stack of dies carried by the package substrate, and one or more radiation shields configured to absorb neutrons from neutron radiation incident on the semiconductor device. The radiation shields can include one or more walls attached to a perimeter portion of the package substrate at least partially surrounding the stack of dies and/or a lid carried over the stack of dies. Each of the radiation shields can include hydrocarbon materials, boron, lithium, gadolinium, cadmium, and like materials that effectively absorb neutrons from neutron radiation. In some embodiments, the semiconductor devices also include a molding material over the stack of dies and the radiation shields, and a hydrocarbon coating over an external surface of the mold material.

A bonded wafer structure having a handle wafer, a device wafer, and an interface region with an abrupt transition between the conductivity profile of the device wafer and the handle wafer is used for making semiconductor devices. The improved doping profile of the bonded wafer structure is well suited for use in the manufacture of integrated circuits. The bonded wafer structure is especially suited for making radiation-hardened integrated circuits.

A bonded wafer structure having a handle wafer, a device wafer, and an interface region with an abrupt transition between the conductivity profile of the device wafer and the handle wafer is used for making semiconductor devices. The improved doping profile of the bonded wafer structure is well suited for use in the manufacture of integrated circuits. The bonded wafer structure is especially suited for making radiation-hardened integrated circuits.

A semiconductor device according to the present embodiment includes a wiring substrate. A semiconductor chip includes a semiconductor substrate having a first face and a second face on the opposite side to the first face, and an SRAM on the side of the first face, and is stuck to the wiring substrate on the side of the second face. The semiconductor chip includes a first metallic layer provided in the semiconductor substrate between the SRAM and the wiring substrate.

In one embodiment, a method of manufacturing a silicon-carbide (SiC) device includes receiving a selection of a specific terrestrial cosmic ray (TCR) rating at a specific applied voltage, determining a breakdown voltage for the SiC device based at least on the specific TCR rating at the specific applied voltage, determining drift layer design parameters based at least on the breakdown voltage. The drift layer design parameters include doping concentration and thickness of the drift layer. The method also includes fabricating the SiC device having a drift layer with the determined drift layer design parameters. The SiC device has the specific TCR rating at the specific applied voltage.

In one embodiment, a method of manufacturing a silicon-carbide (SiC) device includes receiving a selection of a specific terrestrial cosmic ray (TCR) rating at a specific applied voltage, determining a breakdown voltage for the SiC device based at least on the specific TCR rating at the specific applied voltage, determining drift layer design parameters based at least on the breakdown voltage. The drift layer design parameters include doping concentration and thickness of the drift layer. The method also includes fabricating the SiC device having a drift layer with the determined drift layer design parameters. The SiC device has the specific TCR rating at the specific applied voltage.

A low electrical and thermal resistance FinFET device includes a semiconductor body, a fin body on the substrate wafer, an isolation structure forming a fin connecting region, a gate dielectric on the fin body extending above the isolation structure, a FinFET gate electrode on the gate dielectric, a heavily-doped buried layer in the semiconductor body extending under said fin, and a vertical conductive region extending from the semiconductor body surface to the heavily-doped buried layer. Additionally, a fin body-to-buried layer implanted region disposed in the fin connecting region provides a low electrical and thermal resistance shunt from the fin body to the heavily-doped buried layer.

A low electrical and thermal resistance FinFET device includes a semiconductor body, a fin body on the substrate wafer, an isolation structure forming a fin connecting region, a gate dielectric on the fin body extending above the isolation structure, a FinFET gate electrode on the gate dielectric, a heavily-doped buried layer in the semiconductor body extending under said fin, and a vertical conductive region extending from the semiconductor body surface to the heavily-doped buried layer. Additionally, a fin body-to-buried layer implanted region disposed in the fin connecting region provides a low electrical and thermal resistance shunt from the fin body to the heavily-doped buried layer.