A semiconductor device has a semiconductor substrate, and multiple first bipolar transistors on the first primary surface side of the semiconductor substrate. The first bipolar transistors have a first height between an emitter layer and an emitter electrode in the direction perpendicular to the first primary surface. The semiconductor device further has at least one second bipolar transistor on the first primary surface side of the semiconductor substrate. The second bipolar transistor have a second height, greater than the first height, between an emitter layer and an emitter electrode in the direction perpendicular to the first primary surface. Also, the semiconductor has a first bump stretching over the multiple first bipolar transistors and the at least one second bipolar transistor.

A semiconductor device includes a semiconductor substrate of a first conductivity type. The semiconductor substrate includes a first semiconductor region of a second conductivity type at a surface thereof, a second semiconductor region of the second conductivity type at the surface and surrounding the first semiconductor region, a third semiconductor region of the second conductivity type provided in the second semiconductor region at the surface and surrounding the first semiconductor region. The third semiconductor region has a concentration of a second conductivity type impurity higher than that of the second semiconductor region. A first insulating film is provided on a part of the first surface at which the second semiconductor region is provided. the first insulating film having an opening that exposes. A first electrode is provided on the first insulating film and electrically connected to the third semiconductor region via the opening.

A semiconductor arrangement is disclosed. The semiconductor arrangement includes: a semiconductor body and a temperature sensor (TES) integrated in the semiconductor body. The TES includes: a first semiconductor region of a first doping type arranged, in a vertical direction of the semiconductor body, between a second semiconductor region of a second doping type and a third semiconductor of the second doping type, and a contact plug ohmically connecting the first semiconductor region and the second semiconductor region. The first semiconductor region includes a base region section spaced apart from the contact plug in a first lateral direction of the semiconductor body and a resistor section arranged between the base region section and the contact plug. The resistor section is implemented such that an ohmic resistance of the resistor section between the base region section and the first semiconductor region is at least 1 MΩ.

A printing apparatus, comprises: a printhead substrate; an application circuit for applying a driving signal to the driving element; a ground line connected to the application circuit; a plurality of temperature sensors that detects temperature relate to the printhead substrate, wherein the cathode side of the plurality of temperature sensors connects the ground line via a resistance; a first selection circuit, on an anode side of the plurality of temperature sensors, that selects one temperature sensor; a second selection circuit, on the cathode side of the plurality of temperature sensor, that selects the one temperature sensor; and a temperature signal output circuit that outputs a temperature signal in accordance with a difference between a voltage of an anode side and a voltage of a cathode side of the selected temperature sensor.

A collector layer is disposed on a substrate. The collector layer is a continuous region when viewed in plan. A base layer is disposed on the collector layer. An emitter layer is disposed on the base layer. An emitter mesa layer is disposed on the emitter layer. Two base electrodes are located outside the emitter mesa layer and within the base layer when viewed in plan. The two base electrodes are electrically connected to the base layer. Two capacitors are disposed on or above the substrate. Each of the two capacitors is connected between a corresponding one of the two base electrodes and a first line above the substrate. Two resistance elements are disposed on or above the substrate. Each of the two resistance elements is connected between a corresponding one of the two base electrodes and a second line on or above the substrate.

A semiconductor device has a semiconductor substrate, and multiple first bipolar transistors on the first primary surface side of the semiconductor substrate. The first bipolar transistors have a first height between an emitter layer and an emitter electrode in the direction perpendicular to the first primary surface. The semiconductor device further has at least one second bipolar transistor on the first primary surface side of the semiconductor substrate. The second bipolar transistor have a second height, greater than the first height, between an emitter layer and an emitter electrode in the direction perpendicular to the first primary surface. Also, the semiconductor has a first bump stretching over the multiple first bipolar transistors and the at least one second bipolar transistor.

Examples described herein provide for single event latch-up (SEL) mitigation techniques. In an example, a circuit includes a semiconductor substrate, a first transistor, a second transistor, and a ballast resistor. The semiconductor substrate comprises a p-doped region and an n-doped region. The first transistor comprises an n+ doped source region disposed in the p-doped region of the semiconductor substrate. The second transistor comprises a p+ doped source region disposed in the n-doped region of the semiconductor substrate. The p+ doped source region, the n-doped region, the p-doped region, and the n+ doped source region form a PNPN structure. The ballast resistor is electrically connected in series with the PNPN structure between a power node and a ground node.

The present disclosure provides a semiconductor device that prevents a resistor component connected in series with a base electrode from the electrostatic damage. A semiconductor device includes, a collector layer, which is a first conductivity type semiconductor, a base layer, which is a second conductivity type semiconductor and connected with the collector layer, an emitter layer, which is the first conductivity type semiconductor and connected with the base layer, a first electrode, electrically connected to the base layer, a first resistor component, connected in series with the first electrode in a conductive path connecting the first electrode and the base layer, a second electrode, electrically connected to the emitter layer and the first resistor component; and a protection component, connected to the first electrode in parallel with the first resistor component, wherein the protection component comprises a pair of diodes formed by a pn junction and by a way of making both ends of the conductive path into a same polarity.

Disclosed examples provide fabrications methods and integrated circuits with back ballasted NPN bipolar transistors which include an n-type emitter in a P doped region, a p-type base with a first side facing the emitter, and an n-type collector laterally spaced from a second side of the base, where the collector includes a first side facing the second side of the base, an opposite second side, a silicided first collector portion and a silicide blocked second collector portion covered with a non-conductive dielectric that extends laterally between the first collector portion and the second side of the collector to provide back side ballasting for lateral breakdown and low current conduction via a deep N doped region while the vertical NPN turns on at a high voltage.

A semiconductor device includes two cell rows, each of which is formed of a plurality of transistor cells aligned in parallel to each other. Each of the plurality of transistor cells includes a collector region, a base region, and an emitter region that are disposed above a substrate. A plurality of collector extended wiring lines are each connected to the collector region of a corresponding one of the plurality of transistor cells and are extended in a direction intersecting an alignment direction of the plurality of transistor cells. A collector integrated wiring line connects the plurality of collector extended wiring lines to each other. A collector intermediate integrated wiring line that is disposed between the two cell rows in plan view connects the plurality of collector extended wring lines extended from the plurality of transistor cells that belong to one of the two cell rows to each other.