A method and apparatus wherein the method comprises: providing at least one electrode within a semiconductor layer wherein the semiconductor layer is provided on a first side of a wafer; thinning the wafer to produce a thinned wafer; providing graphene on a second side of the thinned wafer; attaching the semiconductor layer to an electrical interface on the first side of the thinned wafer; and providing at least one electrical connection from the graphene to the electrical interface so as to form a transistor comprising the at least one electrode and the graphene.

A method for manufacturing a pressure sensitive transistor includes forming a channel region between first and second contact regions in a semiconductor substrate, forming a first isolation layer on a surface of the semiconductor substrate, forming a sacrificial structure on the first isolation layer and above the channel region, forming a semiconductor layer on the sacrificial structure and on the first isolation layer, wherein the semiconductor layer covers the sacrificial structure, removing the sacrificial structure for providing a cavity between the substrate and the semiconductor layer, wherein the semiconductor layer forms a membrane structure and forms a control electrode of the pressure sensitive transistor, forming a second isolation layer on the membrane structure and on the exposed portion of the surface of the semiconductor substrate, and forming contacting structures for the first contact region, the second contact region and the membrane structure of the pressure sensitive transistor.

A method of producing a semiconductor device includes providing a carrier structure having a semiconductor substrate; applying or introducing a precursor substance onto or into the carrier structure, treating the precursor substance for producing a porous matrix structure; introducing a functionalization substance into the porous matrix structure.

A method of producing a semiconductor device includes providing a carrier structure having a semiconductor substrate; applying or introducing a precursor substance onto or into the carrier structure, treating the precursor substance for producing a porous matrix structure; introducing a functionalization substance into the porous matrix structure.

A chemical sensor for analyte solutions utilizes AC excitation of a sample distributed in one or more micro-wells of a measurement device. The sensors utilize narrowband filtering of the measured signal(s), resulting in a large reduction in noise. Synchronous detection is utilized to provide high discrimination of the desired signal from noise or interfering sources. Conductance and by extension impedance is measured by applying a constant alternating current (AC) voltage across the electrodes of each micro-well and measuring the resulting current.

A method of producing a semiconductor device includes providing a carrier structure having a semiconductor substrate; applying or introducing a precursor substance onto or into the carrier structure, treating the precursor substance for producing a porous matrix structure; introducing a functionalization substance into the porous matrix structure.

A method and apparatus wherein the method comprises: providing at least one electrode within a semiconductor layer wherein the semiconductor layer is provided on a first side of a wafer; thinning the wafer to produce a thinned wafer; providing graphene on a second side of the thinned wafer; attaching the semiconductor layer to an electrical interface on the first side of the thinned wafer; and providing at least one electrical connection from the graphene to the electrical interface so as to form a transistor comprising the at least one electrode and the graphene.

The present invention relates to a conductive paste for bonding comprising 100 parts by weight of the metal powder, 5 to 20 parts by weight of a solvent, and 0.05 to 3 parts by weight of a polymer, wherein the polymer comprises a first polymer and a second polymer, wherein the molecular weight (Mw) of the first polymer is 5,000 to 95,000, and the molecular weight (Mw) of the second polymer is 100,000 to 300,000.

A method of manufacturing an electronic device comprising the steps of: preparing a substrate comprising an electrically conductive layer; applying a conductive paste on the electrically conductive layer; mounting an electrical component on the applied conductive paste; heating the conductive paste to bond the electrically conductive layer and the electrical component, wherein the conductive paste comprises 100 parts by weight of the metal powder, 5 to 20 parts by weight of a solvent, and 0.05 to 3 parts by weight of a polymer, wherein the polymer comprises a first polymer and a second polymer, wherein the molecular weight (Mw) of the first polymer is 5,000 to 95,000, and the molecular weight (Mw) of the second polymer is 100,000 to 300,000.