A method of detecting electromagnetic radiation includes illuminating a photodiode of a pixel sensor with electromagnetic radiation, using vertical gate structures of a transfer transistor to couple a cathode of the photodiode to an internal node of the pixel sensor, thereby generating an internal node voltage level, and generating an output voltage level of the pixel sensor based on the internal node voltage level.

A method of manufacturing a transistor structure includes forming a plurality of trenches in a substrate, lining the plurality of trenches with a dielectric material, forming first and second substrate regions at opposite sides of the plurality of trenches, and filling the plurality of trenches with a conductive material. The plurality of trenches includes first and second trenches aligned between the first and second substrate regions, and filling the plurality of trenches with the conductive material includes the conductive material extending continuously between the first and second trenches.

An IC structure includes a substrate region having a first doping type and including an upper surface, first and second regions within the substrate region, each of the first and second regions having a second doping type opposite the first doping type, and a gate conductor including a plurality of conductive protrusions extending into the substrate region in a direction perpendicular to a plane of the upper surface. The conductive protrusions are electrically connected to each other, and at least a portion of each conductive protrusion is positioned between the first and second regions.

An IC structure includes a substrate region having a first doping type and including an upper surface, first and second regions within the substrate region, each of the first and second regions having a second doping type opposite the first doping type, and a gate conductor including a plurality of conductive protrusions extending into the substrate region in a direction perpendicular to a plane of the upper surface. The conductive protrusions are electrically connected to each other, and at least a portion of each conductive protrusion is positioned between the first and second regions.

A semiconductor device includes: a first chip including a plurality of first device features and a plurality of first interconnect structures disposed above the first device features; a second chip including a plurality of second device features and a plurality of second interconnect structures disposed above the second device features; and an interposer bonded to the first chip and the second chip, and disposed on an opposite side from the first and second device features with respect to the first and second interconnect structures; wherein the interposer includes a plurality of power rails configured to deliver power to the first and second chips.

A semiconductor device package includes a conductive clip that has a recess and that is configured to mount to a substrate along a first surface and a second surface that bound the recess, and that includes at least two vertical channel transistors that are of a same type and that are mounted within the recess in a same orientation such that a drain or source contact is coupled to the conductive clip, and such that a gate contact and a source or drain contact extend exposed within the recess and along a same long axis of the conductive clip.

A method of detecting electromagnetic radiation includes illuminating a photodiode of a pixel sensor with electromagnetic radiation, using vertical gate structures of a transfer transistor to couple a cathode of the photodiode to an internal node of the pixel sensor, thereby generating an internal node voltage level, and generating an output voltage level of the pixel sensor based on the internal node voltage level.

A method of manufacturing a transistor structure includes forming a plurality of trenches in a substrate, lining the plurality of trenches with a dielectric material, forming first and second substrate regions at opposite sides of the plurality of trenches, and filling the plurality of trenches with a conductive material. The plurality of trenches includes first and second trenches aligned between the first and second substrate regions, and filling the plurality of trenches with the conductive material includes the conductive material extending continuously between the first and second trenches.

A pixel sensor includes a photodiode including an anode overlying a cathode positioned in a substrate and a transfer transistor structure including a source region extending along a surface of the substrate adjacent to the anode and overlying the cathode, a floating diffusion region extending along the surface of the substrate parallel to the source region, and a gate conductor including an array of conductive protrusions extending into the substrate between the source region and the floating diffusion region.

A semiconductor structure includes a device layer having a transistor device and a PN junction structure coupled to the transistor device. The PN junction structure includes a first doped region and a second doped region, and the first doped region is electrically connected to a gate stack of the transistor device. The semiconductor structure includes a frontside interconnect structure over a frontside of the device layer, the frontside interconnect structure includes thermal path metal features electrically connected to the second doped region of the PN junction structure. The semiconductor structure includes a bonding oxide layer over the frontside interconnect structure, the bonding oxide layer embeds a thermal path metal contact electrically connected to the thermal path metal features. The semiconductor structure includes a carrier substrate over the bonding oxide layer, the carrier substrate landing on a top surface of the thermal path metal contact.