A semiconductor laser includes a semiconductor layer including end faces and at least one of the end faces is configured as a light emission end face. The semiconductor layer includes a waveguide and a light window structure region. The waveguide has a first width and is extended between the end faces. The light window structure region includes an opening having a second width greater than the first width arranged along the waveguide and is formed continuously or intermittently from one to another of the end faces.

A semiconductor laser includes a semiconductor layer including end faces and at least one of the end faces is configured as a light emission end face. The semiconductor layer includes a waveguide and a light window structure region. The waveguide has a first width and is extended between the end faces. The light window structure region includes an opening having a second width greater than the first width arranged along the waveguide and is formed continuously or intermittently from one to another of the end faces.

A semiconductor laser includes an active layer which emits laser light and cladding layers being formed so as to sandwich the active layer. The active layer includes a quantum dot layer including a plurality of quantum dots, which respectively confine movements of carriers in the three-dimensional directions. The laser radar device includes a light projection part which projects laser light and a light receiving part which receives reflected light of the laser light. The light projection part includes the semiconductor laser and a scanner which reflects the laser light, emitted from the semiconductor laser, to form a scanning laser light.

A distributed feedback laser, including: an output end including an active region including a grating including a λ/4 phase-shift region; and a non-output end including a reflecting region including a grating with uniform period. The length of the active region is smaller than or equal to 200 μm. The end facet of the output end of the laser is coated with an anti-reflection film.

Provided is a semiconductor light source element or an optical device including a semiconductor optical waveguide of a high-mesa semi-insulated embedded structure having a window structure made of the same material as an overclad layer at a light emission end, and a method for manufacturing thereof, in which an active layer at a portion of the window structure is removed, and then the same layer as the overclad layer is formed.

Provided is a semiconductor light source element or an optical device including a semiconductor optical waveguide of a high-mesa semi-insulated embedded structure having a window structure made of the same material as an overclad layer at a light emission end, and a method for manufacturing thereof, in which an active layer at a portion of the window structure is removed, and then the same layer as the overclad layer is formed.

A semiconductor laser device includes a laser resonator including a layered structure in which a lower cladding layer, an active layer, and an upper cladding layer are formed over a semiconductor substrate, and a ridge that is formed on the upper cladding layer. The laser resonator emits laser light having a beam profile. When viewed in plan from a direction orthogonal to the semiconductor substrate, the laser resonator has an emission area on its emission end face. When the emission end face of the laser resonator is viewed in front, a virtual line defined by the intensity being 1/e.sub.2 of the peak intensity of the beam profile of the laser light fits inside the upper cladding layer in the emission area.

In a laser system according to an aspect of the present disclosure, the following components are disposed: a first container that accommodates a first heater and a first crystal holder holding a first nonlinear crystal and includes a first light incident window via which laser light is incident and a first light exit window via which the laser light exits; a second container that accommodates a second heater and a second crystal holder holding a second nonlinear crystal and includes a second light incident window via which the laser light is incident and a second light exit window via which the laser light exits; and a stage that holds the first and second containers. A controller controls the stage to move the first nonlinear crystal away from the optical path of the laser light and inserts the second nonlinear crystal into the optical path of the laser light.

A nitride light emitter includes: a nitride semiconductor light-emitting element including an Al.sub.xGa.sub.1-xN substrate (0≤x≤1) and a multilayer structure above the Al.sub.xGa.sub.1-xN substrate; and a submount substrate on which the nitride semiconductor light-emitting element is mounted. The multilayer structure includes a first clad layer of a first conductivity type, a first light guide layer, a quantum-well active layer, a second light guide layer, and a second clad layer of a second conductivity type which are stacked sequentially from the Al.sub.xGa.sub.1-xN substrate. The multilayer structure and submount substrate are opposed to each other. The submount substrate comprises diamond. The nitride semiconductor light-emitting element has a concave warp on a surface closer to the Al.sub.xGa.sub.1-xN substrate.

A nitride light emitter includes: a nitride semiconductor light-emitting element including an Al.sub.xGa.sub.1-xN substrate (0≤x≤1) and a multilayer structure above the Al.sub.xGa.sub.1-xN substrate; and a submount substrate on which the nitride semiconductor light-emitting element is mounted. The multilayer structure includes a first clad layer of a first conductivity type, a first light guide layer, a quantum-well active layer, a second light guide layer, and a second clad layer of a second conductivity type which are stacked sequentially from the Al.sub.xGa.sub.1-xN substrate. The multilayer structure and submount substrate are opposed to each other. The submount substrate comprises diamond. The nitride semiconductor light-emitting element has a concave warp on a surface closer to the Al.sub.xGa.sub.1-xN substrate.