Patent classifications
H01S5/2072
PHOTONIC CRYSTAL SURFACE-EMITTING LASER
A photonic crystal surface-emitting laser includes a substrate, an n-type cladding layer, an active layer, an index matching layer and a photonic crystal structure. The n-type cladding layer is disposed over the substrate. The active layer is disposed over the n-type cladding layer. The index matching layer is disposed over the n-type cladding layer and is arranged around the active layer. The index matching layer is electrically insulating, and an effective refractive index of the index matching layer is substantially identical to an effective refractive index of the active layer. The photonic crystal structure is disposed over the active layer and the index matching layer.
OPTOELECTRONIC SEMICONDUCTOR COMPONENT, ARRANGEMENT OF OPTOELECTRONIC SEMICONDUCTOR COMPONENTS, OPTOELECTRONIC DEVICE AND METHOD FOR PRODUCING AN OPTOELECTRONIC SEMICONDUCTOR COMPONENT
The invention relates to a semiconductor laser apparatus having a layer stack which comprises a first resonator mirror, a second resonator mirror and an active zone which is arranged between the first and second resonator mirrors and which is suitable for emitting electromagnetic radiation. A charge carrier barrier is arranged around a central region of the active zone.
SEMICONDUCTOR LASER DIODE AND METHOD FOR PRODUCING A SEMICONDUCTOR LASER DIODE
The semiconductor laser diode includes a semiconductor layer sequence having an active zone. The semiconductor layer sequence has a shape of a generalized cylinder or a frustum, and a main axis of the semiconductor layer sequence is perpendicular to a main extension plane of the semiconductor layer sequence. The semiconductor layer sequence has a core region and an edge region directly adjacent to the core region. The main axis passes through the core region. The edge region borders the core region in directions perpendicular to the main axis. The semiconductor layer sequence has a larger refractive index in the core region than in the edge region.
Optical Device
An active region formed on a substrate, and a p-type region and an n-type region formed so as to sandwich the active region are provided. The p-type region and the n-type region are formed so as to sandwich the active region. Both edges of a first side being a side of the p-type region and facing a first side surface of the active region are rounded in a direction separating from the active region. Also, both edges of a second side being a side of the n-type region and facing a second side surface of the active region are rounded in a direction separating from the active region.
VERTICAL CAVITY SURFACE EMITTING LASER ELEMENT, METHOD OF PRODUCING VERTICAL CAVITY SURFACE EMITTING LASER ELEMENT, AND PHOTOELECTRIC CONVERSION APPARATUS
[Object] To provide a vertical cavity surface emitting laser element having excellent electric responsiveness and high productivity and reliability, a method of producing the vertical cavity surface emitting laser element, and a photoelectric conversion apparatus.
[Solving Means] A vertical cavity surface emitting laser element according to the present technology includes: a semiconductor stacked body. The semiconductor stacked body is a semiconductor stacked body that includes a first mirror having a first conductive type, a second mirror that has a second conductive type and causes optical resonance together with the first mirror, an active layer provided between the first mirror and the second mirror, and a confinement layer that is provided between the first mirror and the second mirror and has a non-oxidized region and an oxidized region, the non-oxidized region being formed of a first material, the oxidized region being provided around the non-oxidized region and being formed of a second material obtained by oxidizing the first material, and has a mesa having an outer peripheral surface from which end surfaces of the active layer and the confinement layer are exposed and an ion implantation region that is a region into which ions have been implanted, is formed to reach a predetermined depth in the active layer and the confinement layer from the outer peripheral surface, and is separated from the non-oxidized region.
OPTOELECTRONIC DEVICE WITH ENHANCED LATERAL LEAKAGE OF HIGH ORDER TRANSVERSE OPTICAL MODES INTO ALLOY-INTERMIXED REGIONS AND METHOD OF MAKING SAME
Optoelectronic device undergoes selective chemical transformation like alloy compositional intermixing forming a non-transformed core region and an adjacent to it periphery where transformation has occurred. Activated by selective implantation or diffusion of impurities like Zinc or Silicon, implantation or diffusion of point defects, or laser annealing, transformation results in a change of the refractive index such that the vertical profile of the refractive index at the periphery is distinct from that in the core. Therefore the optical modes of the core are no longer orthogonal to the modes of the periphery, are optically coupled to them and exhibit lateral leakage losses to the periphery. High order transverse optical modes associated to the same vertical optical mode have higher lateral leakage losses to the periphery than the fundamental transverse optical mode, thus supporting single transverse mode operation of the device. This approach applies to single transverse mode vertical cavity surface emitting lasers, edge-emitting lasers and coherently coupled arrays of such devices.
Semiconductor laser
A semiconductor laser includes a semiconductor layer including end faces and at least one of the end faces is configured as a light emission end face. The semiconductor layer includes a waveguide and a light window structure region. The waveguide has a first width and is extended between the end faces. The light window structure region includes an opening having a second width greater than the first width arranged along the waveguide and is formed continuously or intermittently from one to another of the end faces.
Mode control in vertical-cavity surface-emitting lasers
Aspects of the subject disclosure may include, for example, a first distributed Bragg reflector, a second distributed Bragg reflector, an active region with an oxide aperture between the first and second distributed Bragg reflectors, and a dielectric layer, where a positioning of the dielectric layer with respect to the first and second distributed Bragg reflectors and the oxide aperture causes suppression of higher modes of the vertical-cavity surface-emitting laser device. Other embodiments are disclosed.
Array of surface-emitting lasers with high-brightness unipolar output
An array of surface-emitting lasers is provided. The array outputs high brightness in a unipolar way. The array comprises a stress-adjustment unit and a plurality of epitaxial device units. The stress-adjustment unit is used to adjust stress. The stress from a substrate is used to select a laser mode for an aperture unit. The selection of the laser mode is enhanced for the aperture unit without sacrificing driving current. Low current operation is achieved in a single mode for effectively reducing volume and further minimizing the size of the whole array to achieve high-quality laser output. An object can be scanned by the outputted laser to obtain a clear image with a high resolution. Hence, the present invention is applicable for face recognition with high recognition and high security.
SEMICONDUCTOR LASER AND ELECTRONIC APPARATUS
A semiconductor laser according to an embodiment of the present disclosure includes a semiconductor stack section. The semiconductor stack section includes a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type, in which the second semiconductor layer is stacked on the first semiconductor layer and includes a ridge having a band shape, and an active layer. The semiconductor stack section further has an impurity region that is at least a portion of a region not facing the ridge and that is located at a position deeper than at least the active layer, in which the impurity region has an impurity concentration of the second conductivity type higher than an impurity concentration of the second conductivity type in a region, of the second semiconductor layer, facing the ridge.