H03H9/02653

Shear-mode chemical/physical sensor for liquid environment sensing and method for producing the same

Methods of forming a shear-mode chemical/physical sensor for liquid environment sensing on V-shaped grooves of a [100] crystal orientation Si layer and the resulting devices are provided. Embodiments include forming a set of V-shaped grooves in a [100] Si layer over a substrate; forming an acoustic resonator over and along the V-shaped grooves, the acoustic resonator including a first metal layer, a thin-film piezoelectric layer, and a second metal layer in an IDT pattern or a sheet; and forming at least one functional layer along a slope of the acoustic resonator.

Localized strain fields in epitaxial layer over cREO
11611001 · 2023-03-21 · ·

A layered structure (100) for transmission of an acoustic wave, the layered structure (100) comprising: a substrate layer (102); and a second layer (104) over the substrate layer (102), wherein the second layer (104) comprises a plurality of discrete portions (105) adjacent to each other, each discrete portion (105) of the plurality of discrete portions (105) comprising a first subregion (104A) and a second subregion (104B). Also an epitaxial layer (108), grown over the second layer (104), for transmission of the acoustic wave in a major plane of the epitaxial layer (108), wherein a periodicity (λ) of a wavelength of the acoustic wave to be transmitted through the epitaxial layer (108) is approximately equal to a sum of a width (d.sub.A) of the first subregion (104A) and a width (d.sub.B) of the second subregion (104B).

SURFACE ACOUSTIC WAVE RESONATOR, FILTER, AND COMMUNICATION DEVICE
20220173722 · 2022-06-02 ·

A surface acoustic wave resonator, a filter and a communication device are provided. The surface acoustic wave resonator includes a piezoelectric material layer, an interdigital transducer and a reflective electrode structure; the piezoelectric material layer includes a first region and two second regions arranged in a first direction; the interdigital transducer is located at a side of the piezoelectric material layer; the reflective electrode structure is arranged in the same layer as the interdigital transducer; the first region is located between two second regions, the interdigital transducer is located in the first region, the reflective electrode structure is located in the second region, and the surface acoustic wave resonator further includes a groove located in the piezoelectric material layer, the groove is located in the second region, and is located at a side of the reflective electrode structure away from the interdigital transducer in the first direction.

SURFACE ACOUSTIC WAVE RESONATOR ARRANGEMENT
20220158611 · 2022-05-19 ·

A surface acoustic wave resonator arrangement comprises a piezoelectric substrate (100) and a surface acoustic wave resonator (110) which includes an interdigital transducer (111,112) disposed on the piezoelectric substrate (100). A trench (13 0) is disposed within the piezoelectric substrate (100) facing the resonator (110). Trench (130) causes reflected waves (143,144) in response to waves (141,142) leaking from the surface acoustic wave resonator. Trench (130) is configured such that the reflected acoustic waves (143,144) achieve phases at the edge (115) of the resonator (110) such that the accumulated phases of all the reflected waves received at edge (115) is zero or substantially zero, thereby avoiding constructive interference of the reflected waves with the acoustic waves resonating in the resonator. Thereby undesired acoustic coupling between resonators or influence of waves reflected at edges of the piezoelectric substrate or dicing lines is reduced.

MICRO-ACOUSTIC DEVICE WITH REFLECTIVE PHONONIC CRYSTAL AND METHOD OF MANUFACTURE
20210367577 · 2021-11-25 ·

A micro-acoustic device comprises a confinement structure (CS) adapted to block propagation of acoustic waves of an acoustic wave resonator (TEL, PL, BEL; ES) at an operation frequency of the device to confine the acoustic waves to the acoustic path or the acoustic volume. It is proposed to use a phononic crystal material for producing the confinement structure.

RESONATOR DEVICE

A resonator device for measuring stress comprises at least two resonators, each resonator comprising an inter-digitated transducer structure arranged between two reflecting structures on or in a piezoelectric substrate, wherein the at least two resonators are arranged and positioned such that they have two different wave propagation directions, and each resonator comprises at least two parts with the area between the two parts of the at least two resonators forming a cavity, wherein the cavity is shared by the at least two resonators and wherein for at least one resonator, in particular, all resonators, the inter-digitated transducer structure comprises a first material and the reflecting structures a second material different from the first material and/or the inter-digitated transducer structure and the reflecting structures have different geometrical parameters. A differential sensing device comprises at least one resonator device as described herein.

Phasing line holders

Systems and methods for phasing line holders are described herein. In certain embodiments, an apparatus includes a groove in a conductive body. Additionally, the apparatus includes a phasing line for electrically coupling a plurality of components, the phasing line extending through the groove. Further, the apparatus includes a holder inserted into the groove, the holder maintaining the phasing line at a specific position in relation to a plurality of groove surfaces, wherein a plurality of holder surfaces apply sufficient pressure to the plurality of groove surfaces to secure the holder within the groove.

SURFACE ELASTIC WAVE FILTER WITH RESONANT CAVITIES
20230396236 · 2023-12-07 ·

A surface elastic wave filter has resonant cavities and comprises a composite substrate formed of a base substrate and a piezoelectric upper layer; at least one input electroacoustic transducer and an output electroacoustic transducer, arranged on the upper layer, and at least one internal reflecting structure, arranged between the input electroacoustic transducer and the output electroacoustic transducer. The internal reflecting structure comprises a first structure comprising at least one reflection grating having a first period and a second structure comprising at least one reflection grating having a second period, the first period being greater than the second period.

LOCALIZED STRAIN FIELDS IN EPITAXIAL LAYER OVER cREO

A layered structure (100) for transmission of an acoustic wave, the layered structure (100) comprising: a substrate layer (102); and a second layer (104) over the substrate layer (102), wherein the second layer (104) comprises a plurality of discrete portions (105) adjacent to each other, each discrete portion (105) of the plurality of discrete portions (105) comprising a first subregion (104A) and a second subregion (104B). Also an epitaxial layer (108), grown over the second layer (104), for transmission of the acoustic wave in a major plane of the epitaxial layer (108), wherein a periodicity (λ) of a wavelength of the acoustic wave to be transmitted through the epitaxial layer (108) is approximately equal to a sum of a width (d.sub.A) of the first subregion (104A) and a width (d.sub.B) of the second subregion (104B).

Ultra-wide-band saw sensor with hyperbolically frequency-modulated etched reflector
11003971 · 2021-05-11 · ·

There is disclosed a surface acoustic wave sensor. An interdigital transducer (IDT) and a first reflector are formed on a surface of a piezoelectric substrate. The first reflector is displaced from the IDT in a direction of acoustic wave propagation. The first reflector includes a plurality of elongate reflective elements including a first reflective element and N additional reflective elements, where N is a positive integer. A long axis of each of the reflective elements is perpendicular to the direction of acoustic wave propagation, and a distance between adjacent reflective elements along the direction of acoustic wave propagation is a linear function of distance from the first reflective element along the direction of acoustic wave propagation.