H05B3/68

Embossed feature for cooktop assembly

A cooktop assembly includes a burner box and a controller disposed on the burner box. A mounting panel is coupled to the burner box over the controller. The mounting panel defines a plurality of embossed features. Each of the plurality of embossed features extends vertically upward from discrete portions of the mounting panel. A plurality of coil assemblies includes individual coil assemblies. Each of the individual coil assemblies includes a coil disposed on a coil plate that defines more than one aperture. Each of the individual embossed features extends through an aperture of the more than one aperture defined by one of the coil plates when the individual coil assemblies are disposed on the mounting panel. A cooktop is disposed over the plurality of coil assemblies and coupled to the burner box.

ELECTRIC RANGE
20220381441 · 2022-12-01 ·

An electric range is provided that may include a case, a cover plate coupled to an upper side of the case, and on which an object to be heated is placed, an air blowing fan discharging air, and an air guide that communicates with the air blowing fan, and forms a flow path of air. The air guide comprises a first air guide that communicates with the air blowing fan and guides the air discharged from the air blow fan substantially horizontally, and an expansion protrusion that protrudes from the first air guide in a lengthwise direction of the air guide or in a direction perpendicular to the lengthwise direction of the air guide such that a cross section of the air guide expands.

ELECTRIC RANGE
20220381441 · 2022-12-01 ·

An electric range is provided that may include a case, a cover plate coupled to an upper side of the case, and on which an object to be heated is placed, an air blowing fan discharging air, and an air guide that communicates with the air blowing fan, and forms a flow path of air. The air guide comprises a first air guide that communicates with the air blowing fan and guides the air discharged from the air blow fan substantially horizontally, and an expansion protrusion that protrudes from the first air guide in a lengthwise direction of the air guide or in a direction perpendicular to the lengthwise direction of the air guide such that a cross section of the air guide expands.

Wafer-heating device

In a ceramic heater, a central-zone heating resistor and an outer-peripheral-zone heating resistor are embedded in a disc-like ceramic base having a wafer-mounting surface on one side. The central-zone heating resistor is a wire extending in a single continuous line from one of a pair of terminals to the other. The pair of terminals as a whole form a circular shape in plan view.

Wafer-heating device

In a ceramic heater, a central-zone heating resistor and an outer-peripheral-zone heating resistor are embedded in a disc-like ceramic base having a wafer-mounting surface on one side. The central-zone heating resistor is a wire extending in a single continuous line from one of a pair of terminals to the other. The pair of terminals as a whole form a circular shape in plan view.

Heating device and electric cooker
11516891 · 2022-11-29 · ·

A heating device for an electric cooktop has at least one long heating conductor, one support body on the top side of which the heating conductor is arranged and fitted, and one supporting means for the support body. The heating conductor is designed as a corrugated flat strip which has, on its bottom side, holding elements which are arranged at a distance from one another and integrally project downward and are pushed into the support body. The supporting means supports the support body, at least in its outer region along an outer edge, at the bottom. The support body consists, as a thin plate, of compressed and adhesively bonded mica material, for example micanite, and is therefore electrically insulating and sufficiently stable.

Heating device and electric cooker
11516891 · 2022-11-29 · ·

A heating device for an electric cooktop has at least one long heating conductor, one support body on the top side of which the heating conductor is arranged and fitted, and one supporting means for the support body. The heating conductor is designed as a corrugated flat strip which has, on its bottom side, holding elements which are arranged at a distance from one another and integrally project downward and are pushed into the support body. The supporting means supports the support body, at least in its outer region along an outer edge, at the bottom. The support body consists, as a thin plate, of compressed and adhesively bonded mica material, for example micanite, and is therefore electrically insulating and sufficiently stable.

Thermal diffuser for a semiconductor wafer holder

An electrostatic chuck is formed by depositing a diffuser layer onto an electrostatic puck and removing areas of the diffuser layer to form discrete diffuser segments separated by gaps. The discrete diffuser segments may define continuous concentric rings, discontinuous concentric rings, or a combination of continuous concentric rings and discontinuous concentric rings. The discrete diffuser segments are separated from each other by forming at least one trench in the diffuser layer. The trench may extend partially through the diffuser layer, completely through the diffuser layer to the electrostatic puck, or have a first portion that extends partially through the diffuser layer and a second portion that extends completely through the diffuser layer. Also, the trench can have a constant width or have a variable width.

Electric stovetop heater unit with integrated temperature control

An apparatus is disclosed. The apparatus includes a heater comprising a heating element having a region that does not contain a surface heating portion. The apparatus further includes a thermostat positioned in the region. The thermostat includes a contact surface disposed to make contact with an object placed on the surface heating portion. The thermostat includes a switch configured to prevent a current from conducting through the heating element when the contact surface experiences a temperature equal to or greater than a temperature limit. The apparatus further includes a medallion coupled to the thermostat and positioned below a top surface of the heating element, the medallion comprising an aperture shaped to allow the contact surface to extend through the aperture to make contact with the object. The apparatus includes an urging element configured to provide vertical movement of the medallion in response to a downward force applied from the object.

Substrate processing apparatus

A substrate processing apparatus includes a rotary table configured to hold and rotate a substrate; an electronic component provided at the rotary table and configured to be rotated along with the rotary table; a first electrode unit provided at the rotary table and configured to be rotated along with the rotary table, the first electrode unit comprising multiple first electrodes electrically connected to the electronic component via multiple first conductive lines; an electric device configured to perform a power supply to the electronic component and a transmission/reception of signals; a second electrode unit comprising multiple second electrodes electrically connected to the electric device via multiple second conductive lines and arranged at positions respectively corresponding to the multiple first electrodes to be brought into contact with the multiple first electrodes; and an electrode moving device configured to connect/disconnect the first electrode unit to/from the second electrode unit.