A light source system, preferably including one or more electron inputs, splitters, recombiners, and/or electron outputs, and optionally including one or more accelerator modules, input transports, radiator modules, and/or output transports. The system can optionally include one or more ancillary elements (e.g., electron optics elements). A method of operation, preferably including operating in a normal mode and/or operating in a backup mode.

A light source system, preferably including one or more electron inputs, splitters, recombiners, and/or electron outputs, and optionally including one or more accelerator modules, input transports, radiator modules, and/or output transports. The system can optionally include one or more ancillary elements (e.g., electron optics elements). A method of operation, preferably including operating in a normal mode and/or operating in a backup mode.

A light source system, preferably including one or more electron inputs, splitters, recombiners, and/or electron outputs, and optionally including one or more accelerator modules, input transports, radiator modules, and/or output transports. The system can optionally include one or more ancillary elements (e.g., electron optics elements). A method of operation, preferably including operating in a normal mode and/or operating in a backup mode.

An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.

In LPP EUV systems, sinusoidal oscillations or instabilities can occur in the generated EUV energy. This is avoided by detecting when the LPP EUV system is approaching such instability and adjusting the LPP EUV system by moving the laser beam of the LPP EUV system. Detection is done by determining when the generated EUV energy is at or above a primary threshold. Adjusting the LPP EUV system by moving the laser beam is done for a fixed period of time, until a subsequently generated EUV energy is below the primary threshold, until a subsequently generated EUV energy is below the primary threshold for a fixed period of time, or until a subsequently generated EUV energy is at or below a secondary threshold below the primary threshold.

A light source system, preferably including one or more electron inputs, splitters, recombiners, and/or electron outputs, and optionally including one or more accelerator modules, input transports, radiator modules, and/or output transports. The system can optionally include one or more ancillary elements (e.g., electron optics elements). A method of operation, preferably including operating in a normal mode and/or operating in a backup mode.

A beam diaphragm includes a diaphragm opening for allowing passage of a first portion of laser beam, a deflector for deflecting a second portion of the laser beam not allowed to pass through the diaphragm opening, a reflector for reflecting the second portion of the laser beam deflected by the deflector, and a sensor for detecting a reflex of the second portion of the laser beam.

A radiation system configured to produce radiation and comprising a droplet generator (3) configured to produce a droplet of fuel traveling towards a plasma formation region, a laser system operative to generate a pre-pulse (PP) and a main pulse (MP), wherein the pre-pulse is configured to condition the droplet for receipt of the main pulse, and wherein the main pulse is configured to convert the conditioned droplet into plasma producing the radiation and a control system configured to control a spatial offset between the pre-pulse and the droplet in a plane transverse to a propagation direction of the pre-pulse, wherein the control system is configured to adjust the spatial offset so as to maximize a velocity change of the conditioned droplet in a plane transverse to a propagation direction of the main pulse.

Example implementations described herein include a laser source and associated methods of operation that can balance or reduce uneven beam profile problem and even improve plasma heating efficiency to enhance conversion efficiency and intensity for extreme ultraviolet radiation generation. The laser source described herein generates an auxiliary laser beam to augment a pre-pulse laser beam and/or a main-pulse laser beam, such that uneven beam profiles may be corrected and/or compensated. This may improve an intensity of the laser source and also improve an energy distribution from the laser source to a droplet of a target material, effective to increase an overall operating efficiency of the laser source.

An extreme ultraviolet light generation system includes a pulse laser light sensor measuring a pulse energy of the main pulse laser light, a target detection sensor generating a passage signal of the droplet target for irradiation with the main pulse laser light, an EUV light sensor measuring a pulse energy of the extreme ultraviolet light, and a processor. The processor includes a neural network receiving log data of the pulse energy obtained from the pulse laser light sensor, log data of an irradiation pulse interval of the main pulse laser light, and log data of the pulse energy obtained from the EUV light sensor, and generating information enabling to identify which state it is in among a normal state, a state of droplet target combining failure, a state of abnormal variation of droplet target intervals, and a state of abnormal relative position between the irradiation position and the mist-like target.