A BID includes: a discharger (2) including a dielectric pipe (8) and a pair of electrodes (14, 16) attached on an outer wall of the dielectric pipe, the pair of electrodes (14, 16) being arranged at a distance from each other in a direction along a central axis of the dielectric pipe (8), the discharger (2) being arranged so that plasma generating gas is introduced from a first end of the dielectric pipe (8) and configured to generates dielectric barrier discharge inside the dielectric pipe (8) to generate plasma; a detection section (4) including a sample gas introduction section (31) and a collection electrode (26) for collecting ions, the detection section (4) being configured to ionize components in the sample gas using light emitted from the plasma generated in the discharger (2) and to detect the generated ions by collecting them using the collection electrode (26); and a voltage supply (6; 6′) for generating a potential difference between the pair of electrodes (14, 16).

Various embodiments relate to plasma actuators that generate fluidic flow. In one or more embodiments, a plasma actuator includes a first electrode and a second electrode. A dielectric film physically separates the first electrode and the second electrode of the plasma actuator. The dielectric film is configured to be attached to a surface to facilitate the plasma actuator providing fluidic flow for an environment. A method of using the dielectric film can include attaching the dielectric film to a surface of a machine, applying a voltage across electrodes of the dielectric film, and moving the machine based on an electrohydrodynamic (EHD) body force produced by the dielectric film.

Some embodiments of the invention include a thruster system comprising a thruster and a pulsing power supply. The thruster may include a gas inlet port; a plasma jet outlet; and a first electrode. In some embodiments, the pulsing power supply may provide an electrical potential to the first electrode with a pulse repetition frequency greater than 10 kHz, a voltage greater than 5 kilovolts. In some embodiments, the pressure downstream from the thruster can be less than 10 Torr. In some embodiments, when a plasma is produced within the thruster by energizing a gas flowing into the thruster through the gas inlet port, the plasma is expelled from the thruster through the plasma jet outlet.

The inventive concept provides a nozzle for dispensing a treatment liquid in which plasma is generated. The nozzle includes a body having an interior space, a liquid supply unit that supplies the treatment liquid into the interior space, and electrodes that generate the plasma in the interior space. The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space.

An inductively coupled plasma (ICP) torch is described that includes an injector protector to shield an injector end. A system embodiment includes, but is not limited to, a tubular sample injector configured to receive an aerosolized sample in an interior defined by walls of the tubular sample injector; an injector protector surrounding at least a portion of the tubular sample injector; an inner tube surrounding at least a portion of the injector protector to form a first annular space between the inner tube and the injector protector, the inner tube defining at least one inlet port for introduction of an auxiliary gas into the first annular space; and an outer tube surrounding at least a portion of the inner tube to form a second annular space, the outer tube defining at least one inlet port for introduction of a cooling gas into the second annular space.

The inventive concept provides a nozzle for dispensing a treatment liquid in which plasma is generated. The nozzle includes a body having an interior space, a liquid supply unit that supplies the treatment liquid into the interior space, and electrodes that generate the plasma in the interior space. The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space.

According to one embodiment of the present disclosure, there can be provided a plasma generating device for performing plasma discharge, the plasma generating device having multiple operation modes including a first mode and a second mode, and including: a first power supply capable of changing a frequency within a first frequency range; a second power supply capable of changing a frequency within a second frequency range that is at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound around the dielectric tube at least one time, a second unit coil wound around the dielectric tube at least one time, and a first capacitor connected in series between the first unit coil and the second unit coil.

A system for generating cold plasma is presented, suitable for use in in-vivo treatment of biological tissue. The system comprising: a control unit connectable to an elongated member at a first proximal end of the elongated member. The elongated member comprises a plasma generating unit at a second distal end thereof and gas and electricity transmission channels extending from said first proximal end towards said plasma generating unit. The control unit comprises a gas supply unit configured to provide predetermined flow rate of selected gas composition through said gas transmission channel and a power supply unit configured to generate selected sequence of high-frequency electrical pulses, typically in mega Hertz range, directed through said electricity transmission channel, thereby providing power and gas of said selected composition to the plasma generating unit for generating cold plasma.

Some embodiments of the invention include a thruster system comprising a thruster and a pulsing power supply. The thruster may include a gas inlet port; a plasma jet outlet; and a first electrode. In some embodiments, the pulsing power supply may provide an electrical potential to the first electrode with a pulse repetition frequency greater than 10 kHz, a voltage greater than 5 kilovolts. In some embodiments, the pressure downstream from the thruster can be less than 10 Torr. In some embodiments, when a plasma is produced within the thruster by energizing a gas flowing into the thruster through the gas inlet port, the plasma is expelled from the thruster through the plasma jet outlet.

A plasma processing device includes: a chamber; a flat-plate-shaped first electrode; a first high frequency power supply; a helical second electrode disposed outside the chamber and disposed to face the first electrode with a quartz plate forming an upper lid of the chamber therebetween; and a gas introducing unit, in which a second high frequency power supply and a third high frequency power supply are configured to be electrically connected to the second electrode, the second high frequency power supply being configured to apply an AC voltage of a second frequency to the second electrode, the third high frequency power supply being configured to apply an AC voltage of a third frequency to the second electrode, and the third frequency being higher than the second frequency; and two types of AC voltages are configured to be simultaneously applied.