A method and a novel flexure interface apparatus are provided for ultrahigh-vacuum (UHV) applications for precision nanopositioning systems. An ultrahigh-vacuum (UHV) metrology base is integrated with an ultrahigh-vacuum (UHV) flange together including a precision and compact flexure interface structure defining a UHV metrology base near-zero-length feedthrough. The UHV metrology base is directly mounted to a flange mounting surface in air with nanopositioning and thermal stability. The precision and compact flexure interface structure has sufficient strength to hold the vacuum force and sufficiently flexible to survive with the thermal expansion stress during bakeout process.

A connecting device (1) for a line system for passing through charged particles, the connecting device (1) having first and second flanges (2, 4) and a bellows (6). The first flange (2) and the second flange (4) are connected to each other with the interposition of the bellows (6), and the first flange (2) and the second flange (4) are movable relative to one another to compensate for displacements in the line system in a longitudinal direction (7) and in at least one transverse direction (8) angled relative thereto. A line element (10) is arranged inside the bellows (6) and connects the flanges (2, 4) electrically conductively to one another. The line element (10) is movably mounted in or on both connection elements (13, 14) of the two flanges (2, 4), and/or the line element (10) has at least one annular spring (15) or at least one helical spring (16).

A device of electric connection between two successive sections of the ring-shaped pipe of a synchrotron, including: first and second end parts capable of being fastened to the sections, each including a tubular portion with facets; electrically-conductive resilient fingers, each of which bears on each of the two tubular portions while being able to slide on one of said facets; and at least one arm bearing on each finger, each arm being fixed with respect to one of the end parts.

For the purpose of providing a transportable linear accelerator system which can restrain entering of losing ion beams deviated from a trajectory therefor, to thereby efficiently achieve reduction in radioactivity at low cost, and a transportable neutron source equipped therewith, a transportable linear accelerator system is configured to be provided with a beam chopper just before an inlet of a post-accelerator, thereby to cut off, from the proton beams pre-accelerated by a pre-accelerator, uncontrolled proton beams, and thus to radiate only the controlled proton beams to the post-accelerator, so that the proton beams are prevented from hitting an acceleration electrode, etc. of the post accelerator.

For the purpose of providing a transportable linear accelerator system which can restrain entering of losing ion beams deviated from a trajectory therefor, to thereby efficiently achieve reduction in radioactivity at low cost, and a transportable neutron source equipped therewith, a transportable linear accelerator system is configured to be provided with a beam chopper just before an inlet of a post-accelerator, thereby to cut off, from the proton beams pre-accelerated by a pre-accelerator, uncontrolled proton beams, and thus to radiate only the controlled proton beams to the post-accelerator, so that the proton beams are prevented from hitting an acceleration electrode, etc. of the post accelerator.

A system has a linear accelerator, ion pump and a compensating magnet. The ion pump includes an ion pump magnet position, an ion pump magnet shape, an ion pump magnet orientation, and an ion pump magnet magnetic field profile. The compensating magnet has a position, a shape, an orientation, and a magnetic field profile, where at least one of the position, shape, orientation, and magnetic field profile of the compensating magnet reduce at least one component of a magnetic field in the linear accelerator resulting from the ion pump magnet.

A system has a linear accelerator, ion pump and a compensating magnet. The ion pump includes an ion pump magnet position, an ion pump magnet shape, an ion pump magnet orientation, and an ion pump magnet magnetic field profile. The compensating magnet has a position, a shape, an orientation, and a magnetic field profile, where at least one of the position, shape, orientation, and magnetic field profile of the compensating magnet reduce at least one component of a magnetic field in the linear accelerator resulting from the ion pump magnet.

A charged particle accelerator for which assembly work can be simplified is provided, and a method for building the same is provided.

In a vacuum-duct joint-portion 10: a male screw 21 is engraved on an outer peripheral surface of a joint 11; a contact surface 25 to be brought into contact with an annular seal 12 is formed at the end of the inner peripheral surface 22 of the joint 11; a pressing surface 26 for pressing the annular seal 12 toward the contact surface 25 of the joint 11A is formed on the ring 15; an abutting surface 28 that abuts on the ring 15 is formed on the nut 16; and a female screw 27 to be screwed to the male screw 21 of the joint 11A is engraved on the inner peripheral surface of the nut 16.

A charged particle acceleration device, which eliminates the need for repeating alignment adjustment even in the case of repeating installation of the controllers, is provided, and a method for adjusting the same is provided.

A charged particle acceleration device 10A includes: controllers 15,15a,15b,15c configured to control a beam trajectory 12 of charged particles that pass through a duct 11 to be inserted through the controllers 15; and a stage 20 that is supported by a frame 16 fixed to a base and reversibly moves the controllers 15 in a direction of intersecting the beam trajectory 12.

A dielectric high gradient insulator device comprises a stack of at least two dielectric layers which are in physical contact with each other and which have different dielectric constants. At least two dielectric layers are configured to form a shaped electric field, when the device is placed between electrodes having a voltage difference. The shaped electric field is in a region proximal to a surface of the at least two dielectric layers, and causes deflection of negatively charged particles away from the surface, thereby inhibiting voltage breakdown of the device. A method of manufacturing the device is also presented.