A three-dimensional semiconductor memory device is disclosed. The device may include a substrate including a cell array region and a connection region provided at an end portion of the cell array region, an electrode structure extending from the cell array region to the connection region, the electrode structure including electrodes sequentially stacked on the substrate, an upper insulating layer provided on the electrode structure, a first horizontal insulating layer provided in the upper insulating layer and extending along the electrodes, and first contact plugs provided on the connection region to penetrate the upper insulating layer and the first horizontal insulating layer. The first horizontal insulating layer may include a material having a better etch-resistive property than the upper insulating layer.

Embodiments of 3D memory devices and methods for forming the same are disclosed. In an example, a 3D memory device includes a substrate, a memory stack including interleaved conductive layers and dielectric layers above the substrate, and a memory string extending vertically through the memory stack. The memory string includes a single crystalline silicon plug in a lower portion of the memory string, a memory film above the single crystalline silicon plug and along a sidewall of the memory string, and a single crystalline silicon channel over the memory film and along the sidewall of the memory string.

A semiconductor device includes gate electrodes stacked to be spaced apart from each other on a substrate in a first direction, extending in a second direction, and including pad regions bent in a third direction, sacrificial insulating layers extending from the gate electrodes to be stacked alternately with the interlayer insulating layers, separation regions penetrating through the gate electrodes, extending in the second direction, and spaced apart from each other to be parallel to each other, and a through-wiring region spaced apart from the separation regions to overlap the pad regions between the separation regions adjacent to each other and including contact plugs penetrating through the pad regions. The through-wiring region includes slit regions, and each of the slit regions is disposed to penetrate through the sacrificial insulating layers on one side of a respective pad region.

A nonvolatile memory device according to an embodiment includes a substrate having an upper surface, a gate line structure disposed over the substrate, a gate dielectric layer covering one sidewall surface of the gate line structure and disposed over the substrate, a channel layer disposed to cover the gate dielectric layer and disposed over the substrate, a bit line structure and a resistance change structure to contact different portions of the channel layer over the substrate, and a source line structure disposed in the resistance change structure. The gate line structure includes at least one gate electrode layer pattern and interlayer insulation layer pattern that are alternately stacked along a first direction perpendicular to the substrate, and extends in a second direction perpendicular to the first direction.

A semiconductor device and a method of manufacturing the semiconductor device are provided. The semiconductor device includes a source structure formed on a base, an etch prevention layer formed on the source structure, bit lines, a stack structure located between the etch prevention layer and the bit lines and including conductive layers and insulating layers that are alternately stacked on each other, and a channel structure passing through the stack structure and the etch prevention layer, wherein a lower portion of the channel structure is located in the source structure and a sidewall of the lower portion of the channel structure is in direct contact with the source structure.

A semiconductor device and a method of manufacturing the semiconductor device are provided. The semiconductor device includes a source structure formed on a base, an etch prevention layer formed on the source structure, bit lines, a stack structure located between the etch prevention layer and the bit lines and including conductive layers and insulating layers that are alternately stacked on each other; and a source contact structure extending into the stack structure in a vertical direction to be coupled to the source structure, wherein the source contact structure includes polysilicon.

A semiconductor device and a method of manufacturing the semiconductor device are provided. The semiconductor device includes a source structure formed on a base, an etch prevention layer formed on the source structure, bit lines, a stack structure located between the etch prevention layer and the bit lines and including conductive layers and insulating layers that are alternately stacked on each other; and a source contact structure extending into the stack structure in a vertical direction to be coupled to the source structure, wherein the source contact structure includes polysilicon.

A semiconductor manufacturing process and semiconductor device having an airgap to isolate bottom implant portions of a substrate from upper source and drain device structure to reduce bottom current leakage and parasitic capacitance with an improved scalability on n-to-p spacing scaling. The disclosed device can be implanted to fabricate nanosheet FET and other such semiconductor device. The airgap is formed by etching into the substrate, below a trench in a vertical and horizontal direction. The trench is then filled with dielectric and upper device structure formed on either side of the dielectric filler trench.

According to one embodiment, in a semiconductor memory device, a gate electrode of a first PMOS transistor and a gate electrode of a first NMOS transistor are commonly connected, and a first contact plug is connected to the commonly-connected gate electrodes to at least partly overlap with an isolation portion when viewed in a third direction perpendicular to a first direction and a second direction. A gate electrode of a second PMOS transistor and a gate electrode of a second NMOS transistor are commonly connected, and a second contact plug is connected to the commonly-connected gate electrodes to at least partly overlap with the isolation portion when viewed in the third direction.

According to one embodiment, in a semiconductor memory device, a gate electrode of a first PMOS transistor and a gate electrode of a first NMOS transistor are commonly connected, and a first contact plug is connected to the commonly-connected gate electrodes to at least partly overlap with an isolation portion when viewed in a third direction perpendicular to a first direction and a second direction. A gate electrode of a second PMOS transistor and a gate electrode of a second NMOS transistor are commonly connected, and a second contact plug is connected to the commonly-connected gate electrodes to at least partly overlap with the isolation portion when viewed in the third direction.