An integrated circuit chip includes a bimodal power N-P-Laterally Diffused Metal Oxide Semiconductor (LDMOS) device having an N-gate coupled to receive an input signal and a level shifter coupled to receive the input signal and to provide a control signal to a P-gate driver of the N-P-LDMOS device. A method of operating an N-P-LDMOS power device is also disclosed.

An apparatus includes a first drain/source region and a second drain/source region over a substrate, and a first gate adjacent to the first drain/source region, a second gate adjacent to the second drain/source region and a third gate between the first gate and the second gate, wherein the first drain/source region, the second drain/source region, the first gate, the second gate and the third gate form two back-to-back connected transistors.

A packaged unidirectional power transistor comprises a package with a number of pins which provide a voltage and/or current connection between the outside and the inside. Inside the package, a bidirectional vertical power transistor is present with a controllable bidirectional current path, through a body of the bidirectional vertical power transistor, between a first current terminal of the bidirectional vertical power transistor connected to the first current pin and a second current terminal of the bidirectional vertical power transistor connected to the second current pin. A control circuit connects the control pin to the body terminal and the control terminal to drive the body and the control terminal, which allows current through the body in a forward direction, from the first current terminal to the second terminal, as a function of the control voltage, and to block current in a reverse direction regardless of the voltage.

A semiconductor device includes: a first semiconductor layer which is formed over a substrate and is formed from a nitride semiconductor; a second semiconductor layer which is formed over the first semiconductor layer and is formed from a nitride semiconductor; a third semiconductor layer which is formed over the second semiconductor layer and is formed from a nitride semiconductor; a source electrode and a drain electrode which are formed over the third semiconductor layer; an opening which is formed in the second semiconductor layer and the third semiconductor layer between the source electrode and the drain electrode; an insulating layer which is formed on a side surface and a bottom surface of the opening; and a gate electrode which is formed in the opening through the insulating layer.

A new field-effect transistor (FET) based switch for use in/with high voltage precision instruments is provided. The switch can enable leakage compensation. A switch comprises a first FET in series with a second FET, and a buffer with an output terminal and an input terminal. The drain terminal of the first FET is connected to the source terminal of the second FET. The input terminal is coupled to the drain terminal of the second FET. At least one of: the first FET has an isolation terminal and the output terminal of the buffer is coupled to the isolation terminal of the first FET; and, the second SFET has an isolation terminal and the output terminal of the buffer is coupled to the isolation terminal of the second FET.