Some embodiments include a memory device and methods of forming the memory device. One such memory device includes a first group of memory cells, each of the memory cells of the first group being formed in a cavity of a first control gate located in one device level of the memory device. The memory device also includes a second group of memory cells, each of the memory cells of the second group being formed in a cavity of a second control gate located in another device level of the memory device. Additional apparatus and methods are described.

A device includes a semiconductor substrate, an interfacial layer, a high-k dielectric layer, a first electrode, and a second electrode. The interfacial layer is over the semiconductor substrate. The high-k dielectric layer is over the interfacial layer. The first electrode is over the high-k dielectric layer. The second electrode is over the interfacial layer. The first electrode laterally surrounds the second electrode in a top view.

A memory device includes a first semiconductor layer, a stack structure comprising conductive layers and dielectric layers stacked alternatively over the first semiconductor layer, a semiconductor channel layer extending through the stack structure and the first semiconductor layer, and a functional layer extending through the stack structure and surrounding the semiconductor channel layer. The at least one of the functional layer and the semiconductor channel layer comprises deuterium elements.

Arrays of memory cells including an isolation region between first and second access lines, a first memory cell having a control gate in contact with the first access line and a charge storage node having a curved cross-section having a first end in contact with a first portion of the isolation region on a first side of the isolation region and a second end in contact with a second portion of the isolation region on the isolation region's first side, and a second memory cell having a control gate in contact with the second access line and a charge storage node having a curved cross-section having a first end in contact with the first portion of the isolation region on a second side of the isolation region and a second end in contact with the second portion of the isolation region on the isolation region's first side.

A three-dimensional (3D) memory device includes a stack structure and a channel structure. The stack structure includes interleaved conductive layers and dielectric layers. The channel structure extends through the stack structure along a first direction. The channel structure includes a semiconductor channel, and a memory film over the semiconductor channel. The memory film includes a tunneling layer over the semiconductor channel, a storage layer over the tunneling layer, and a blocking layer over the storage layer. The blocking layer and the storage layer are separated by the dielectric layers into a plurality of sections.

A microelectronic device comprises a stack structure comprising alternating conductive structures and insulative structures arranged in tiers, each of the tiers individually comprising a conductive structure and an insulative structure, strings of memory cells vertically extending through the stack structure, the strings of memory cells comprising a channel material vertically extending through the stack structure, and another stack structure vertically overlying the stack structure and comprising other tiers of alternating levels of other conductive structures and other insulative structures, the other conductive structures exhibiting a conductivity greater than a conductivity of the conductive structures of the stack structure. Related memory devices, electronic systems, and methods are also described.

In an embodiment, a device includes: a first word line over a substrate, the first word line including a first conductive material; a first bit line intersecting the first word line; a first memory film between the first bit line and the first word line; and a first conductive spacer between the first memory film and the first word line, the first conductive spacer including a second conductive material, the second conductive material having a different work function than the first conductive material, the first conductive material having a lower resistivity than the second conductive material.

A 3-dimensional array of NOR memory strings being organized by planes of NOR memory strings, in which (i) the storage transistors in the NOR memory strings situated in a first group of planes are configured to be programmed, erased, program-inhibited or read in parallel, and (ii) the storage transistors in NOR memory strings situated within a second group of planes are configured for storing resource management data relating to data stored in the storage transistors of the NOR memory strings situated within the first group of planes, wherein the storage transistors in NOR memory strings in the second group of planes are configured into sets.

A three-dimensional (3D) memory device includes a first stack structure, a first channel structure, a second stack structure, and a second channel structure. The first stack structure includes interleaved first conductive layers and first dielectric layers. The first channel structure extends through the first stack structure along a first direction. The first channel structure includes a first semiconductor channel, and a first memory film over the first semiconductor channel. The first memory film includes a storage layer. The storage layer is separated by the first dielectric layers into a plurality of sections.

A method of manufacturing a semiconductor device may include forming a stack with alternately stacked first material layers and second material layers, forming an opening passing through the stack, forming a memory layer in the opening, forming a slit passing through the stack and exposing the first material layers and the second material layers, and forming first barrier patterns, without removing the second material layers, by partially oxidizing the memory layer through the second material layers.