A semiconductor substrate includes a p-type substrate body, an n-type buried layer on the p-type substrate body, and a p-type semiconductor layer on the n-type buried layer. A DTI region penetrates through the p-type semiconductor layer and the n-type buried layer, and reaches the p-type substrate body. An n-type semiconductor region, which is a cathode region of a Zener diode, and a p-type anode region of the Zener diode are formed in the semiconductor layer. The p-type anode region includes a p-type first semiconductor region formed under the n-type semiconductor region, and a p-type second semiconductor region formed under the p-type first semiconductor region. A PN junction is formed between the p-type first semiconductor region and the n-type semiconductor region. An impurity concentration of the p-type second semiconductor region is higher than an impurity concentration of the p-type first semiconductor region.

A semiconductor device includes a first well region, a second well region, a body region, and a cathode region. The impurity concentration of the body region is higher than the impurity concentration of the first well region, and the impurity concentration of the second well region is higher than the impurity concentration of the body region. In plan view, the body region includes the cathode region, and the cathode region includes the second well region. The cathode region configures a cathode of a Zener diode, and the first well region, the second well region, and the body region configure an anode of the Zener diode.

Diodes and fabrication methods thereof are presented. The diodes include, for instance: a first semiconductor region disposed at least partially within a substrate, the first semiconductor region having a first conductivity type; and a second semiconductor region disposed at least partially within the first semiconductor region, the second semiconductor region having a second conductivity type, wherein the first semiconductor region separates the second semiconductor region from the substrate. In one embodiment, the substrate and the first semiconductor region have U-shaped boundary. In a further embodiment, the first semiconductor region comprises an alloy of a first material and a second material, where the concentration of the second material varies from a maximum to a minimum, where the first semiconductor region adjacent to the second semiconductor region has the minimum of the concentration of the second material.

The betas of the bipolar transistors in a BiCMOS semiconductor structure are increased by forming the emitters of the bipolar transistors with two implants: a source-drain implant that forms a first emitter region at the same time that the source and drain regions are formed, and an additional implant that forms a second emitter region at the same time that another region is formed. The additional implant has an implant energy that is greater than the implant energy of the source-drain implant.

In accordance with an embodiment, semiconductor component includes a compound semiconductor material based semiconductor device coupled to a silicon based semiconductor device and a protection element, wherein the silicon based semiconductor device is a transistor. The protection element is coupled in parallel across the silicon based semiconductor device and may be a resistor, a diode, or a transistor. In accordance with another embodiment, the silicon based semiconductor device is a diode. The compound semiconductor material may be shorted to a source of potential such as, for example, ground, with a shorting element.

A transient-voltage suppressing (TVS) device disposed on a semiconductor substrate including a low-side steering diode, a high-side steering diode integrated with a main Zener diode for suppressing a transient voltage. The low-side steering diode and the high-side steering diode integrated with the Zener diode are disposed in the semiconductor substrate and each constituting a vertical PN junction as vertical diodes in the semiconductor substrate whereby reducing a lateral area occupied by the TVS device. In an exemplary embodiment, the high-side steering diode and the Zener diode are vertically overlapped with each other for further reducing lateral areas occupied by the TVS device.

The present invention is directed to a chip diode with a Zener voltage Vz of 4.0 V to 5.5 V, including a semiconductor substrate having a resistivity of 3 m.Math.cm to 5 m.Math.cm and a diffusion layer formed on a surface of the semiconductor substrate and defining a diode junction region with the semiconductor substrate therebetween, in which the diffusion layer has a depth of 0.01 m to 0.2 m from the surface of the semiconductor substrate.

A transient-voltage suppressing (TVS) device disposed on a semiconductor substrate including a low-side steering diode, a high-side steering diode integrated with a main Zener diode for suppressing a transient voltage. The low-side steering diode and the high-side steering diode integrated with the Zener diode are disposed in the semiconductor substrate and each constituting a vertical PN junction as vertical diodes in the semiconductor substrate whereby reducing a lateral area occupied by the TVS device. In an exemplary embodiment, the high-side steering diode and the Zener diode are vertically overlapped with each other for further reducing lateral areas occupied by the TVS device.

A semiconductor device includes a first nitride semiconductor layer having a first region, a second nitride semiconductor layer that is on the first nitride semiconductor layer and contains carbon and silicon, a third nitride semiconductor layer that is on the second nitride semiconductor layer and has a second region, a fourth nitride semiconductor layer on the third nitride semiconductor layer, the fourth nitride semiconductor layer having a band gap that is wider than a band gap of the third nitride semiconductor layer, a source electrode that is on the fourth nitride semiconductor layer and is electrically connected to the first region, a drain electrode that is on the fourth nitride semiconductor layer and is electrically connected to the second region, and a gate electrode that is on the fourth nitride semiconductor layer and is between the source electrode and the drain electrode.

A semiconductor device includes a P-type semiconductor substrate, a plurality of N-type buried diffusion layers that are arranged in the semiconductor substrate, an N-type first semiconductor layer that is arranged in a first region on a first buried diffusion layer, an N-type second semiconductor layer that is arranged in a second region on a second buried diffusion layer, an N-type first impurity diffusion region that surrounds the first region in plan view, a P-type second impurity diffusion region that is arranged in the second semiconductor layer, an N-type third impurity diffusion region that is arranged in the second semiconductor layer, an N-type fourth impurity diffusion region that is arranged in the first semiconductor layer. The second region is a region in which an N-type impurity diffusion region that has a higher impurity concentration than the second semiconductor layer cannot be arranged.