The disclosed embodiments relate to an integrated circuit structure and methods of forming them in which photonic devices are formed on the back end of fabricating a CMOS semiconductor structure containing electronic devices. Doped regions associated with the photonic devices are formed using microwave annealing for dopant activation.

An integrated circuit includes first to second transistors and a resistive device. The first transistor is coupled between a pad and a first voltage terminal that provides a first supply voltage. The second transistor is coupled in parallel with the first transistor. A breakdown voltage of the first transistor is different from a trigger voltage of the second transistor. The resistive device is coupled between the pad and a second voltage terminal that provides a second supply voltage higher than the first supply voltage, and operates with the second supply voltage in an electrostatic discharge (ESD) event when the first and second transistors discharge a ESD current between the pad and the first voltage terminal.

An integrated semiconductor device includes a silicon body that includes <111> single crystal silicon, a semiconductor device that is disposed within the silicon body, a III-nitride body disposed on the silicon body, and a III-nitride device that is disposed within the III-nitride body, wherein the semiconductor device is operatively coupled to the III-nitride device.

A device includes a first region on a substrate including a first integrated circuit, a second region on the substrate including a second integrated circuit, and a third region between the first region and the second region on the substrate. At least one of the first region and the second region includes at least one pattern that provides galvanic isolation between a first integrated circuit and a second integrated circuit on the substrate.

A substrate made of doped single-crystal silicon has an upper surface. A doped single-crystal silicon layer is formed by epitaxy on top of and in contact with the upper surface of the substrate. Either before or after forming the doped single-crystal silicon layer, and before any other thermal treatment step at a temperature in the range from 600 C. to 900 C., a denuding thermal treatment is applied to the substrate for several hours. This denuding thermal treatment is at a temperature higher than or equal to 1,000 C.

A semiconductor device includes a first metal-oxide-semiconductor (MOS) transistor and a second MOS transistor on a substrate. The second MOS transistor is electrically connected to the first MOS transistor. The first MOS transistor includes a first gate dielectric layer and a first gate electrode on the first gate dielectric layer. The second MOS transistor includes a second gate dielectric layer and a second gate electrode on the second gate dielectric layer. The second gate electrode includes a first portion of a first conductivity type and second portions of a second conductivity type on opposite sides of the first portion. The width of the first portion is less than half of the total width of the second gate electrode.

An I/O circuit is formed by combining plural types of standard cells contained in a cell library. For example, the standard cell includes a first element forming region having, formed therein, protection target elements each having a gate electrically connected to an external terminal, a second element forming region arranged in immediate proximity to the external terminal and having first protection elements formed therein, and a third element forming region arranged between the first and second element forming regions and having transistors formed therein. The transistors each have a drain connected to gates of the protection target elements and a source, gate, and back gate all connected to a power supply or ground terminal, thus functioning as a second protection element.

In described examples, an embedded thermoelectric device is formed by forming isolation trenches in a substrate, concurrently between CMOS transistors and between thermoelectric elements of the embedded thermoelectric device. Dielectric material is formed in the isolation trenches to provide field oxide which laterally isolates the CMOS transistors and the thermoelectric elements. Germanium is implanted into the substrate in areas for the thermoelectric elements, and the substrate is subsequently annealed, to provide a germanium density of at least 0.10 atomic percent in the thermoelectric elements between the isolation trenches. The germanium may be implanted before the isolation trenches are formed, after the isolation trenches are formed and before the dielectric material is formed in the isolation trenches, and/or after the dielectric material is formed in the isolation trenches.

An electrical device that in some embodiments includes a substrate including a lateral device region and a vertical device region. A lateral diffusion metal oxide semiconductor (LDMOS) device may be present in the lateral device region, wherein a drift region of the LDMOS device has a length that is parallel to an upper surface of the substrate in which the LDMOS device is formed. A vertical field effect transistor (VFET) device may be present in the vertical device region, wherein a vertical channel of the VFET has a length that is perpendicular to said upper surface of the substrate, the VFET including a gate structure that is positioned around the vertical channel.

A metal-oxide-semiconductor field-effect transistor (MOSFET) with integrated passive structures and methods of manufacturing the same is disclosed. The method includes forming a stacked structure in an active region and at least one shallow trench isolation (STI) structure adjacent to the stacked structure. The method further includes forming a semiconductor layer directly in contact with the at least one STI structure and the stacked structure. The method further includes patterning the semiconductor layer and the stacked structure to form an active device in the active region and a passive structure of the semiconductor layer directly on the at least one STI structure.