Patent classifications
H10F30/287
HETEROJUNCTION SCHOTTKY GATE BIPOLAR TRANSISTOR
Certain embodiments of the present invention may be directed to a transistor structure. The transistor structure may include a semiconductor substrate. The semiconductor substrate may include a drift region, a collector region, an emitter region, and a lightly-doped/undoped region. The lightly-doped/undoped region may be lightly-doped and/or undoped. The transistor structure may also include a heterostructure. The heterostructure forms a heterojunction with the lightly-doped/undoped region. The transistor structure may also include a collector terminal. The collector terminal is in contact with the collector region. The transistor structure may also include a gate terminal. The gate terminal is in contact with the heterostructure. The transistor structure may also include an emitter terminal. The emitter terminal is in contact with the lightly-doped/undoped region and the emitter region.
Nanostructure and optical device including the nanostructure
Provided are a nanostructure and an optical device including the nanostructure. The nanostructure is formed on a two-dimensional material layer such as graphene and includes nanopatterns having different shapes. The nanopatterns may include a first nanopattern and a second nanopattern and may be spherical; cube-shaped; or poly-pyramid-shaped, including a triangular pyramid shape; or polygonal pillar-shaped.
METHOD OF FORMING AN INFRARED PHOTODETECTOR
A low noise infrared photodetector has an epitaxial heterostructure that includes a photodiode and a transistor. The photodiode includes a high sensitivity narrow bandgap photodetector layer of first conductivity type, and a collection well of second conductivity type in contact with the photodetector layer. The transistor includes the collection well, a transfer well of second conductivity type that is spaced from the collection well and the photodetector layer, and a region of first conductivity type between the collection and transfer wells. The collection well and the transfer well are of different depths, and are formed by a single diffusion.
NANOSTRUCTURE AND OPTICAL DEVICE INCLUDING THE NANOSTRUCTURE
Provided are a nanostructure and an optical device including the nanostructure. The nanostructure is formed on a two-dimensional material layer such as graphene and includes nanopatterns having different shapes. The nanopatterns may include a first nanopattern and a second nanopattern and may be spherical; cube-shaped; or poly-pyramid-shaped, including a triangular pyramid shape; or polygonal pillar-shaped.
Nanostructure and optical device including the nanostructure
Provided are a nanostructure and an optical device including the nanostructure. The nanostructure is formed on a two-dimensional material layer such as graphene and includes nanopatterns having different shapes. The nanopattern may include a first nanopattern and a second nanopattern and may be spherical; cube-shaped; or poly-pyramid-shaped, including a triangular pyramid shape; or polygonal pillar-shaped.
PIXEL STRUCTURE
A pixel structure comprising: a diode body comprising: a base portion protruding from a substrate and a main portion on top of the base portion, wherein a footprint of the base portion is smaller than a footprint of the main portion, and wherein the main portion comprises first and second oppositely doped regions formed in a top portion of the main portion, wherein the first and second doped regions are formed in a central part and along a periphery, respectively, of the footprint of the main portion; a gate arranged to circumferentially surround the diode body, comprising a first gate portion surrounding the main portion and a second gate portion protruding inwardly from the first gate portion to undercut the main portion and surround the base portion; a gate dielectric layer arranged to separate the gate and the diode body; and first and second diode terminals, and a gate terminal.