Described herein are techniques that improve the collection and readout of charge carriers in an integrated circuit. Some aspects of the present disclosure relate to integrated circuits having pixels with a plurality of charge storage regions. Some aspects of the present disclosure relate to integrated circuits configured to substantially simultaneously collect and read out charge carriers, at least in part. Some aspects of the present disclosure relate to integrated circuits having a plurality of pixels configured to transfer charge carriers between charge storage regions within each pixel substantially at the same time. Some aspects of the present disclosure relate to integrated circuits having three or more sequentially coupled charge storage regions. Some aspects of the present disclosure relate to integrated circuits capable of increased charge transfer rates. Some aspects of the present disclosure relate to techniques for manufacturing and operating integrated circuits according to the other techniques described herein.

A time of flight sensor includes at least one demodulation pixel. Each demodulation pixel includes a semiconductor substrate; a charge generation region in the semiconductor substrate, the charge generation region having a lateral extent, the charge generation region being configured to convert light into charge carriers; a light directing element in the charge generation region of the semiconductor substrate, the light directing element being configured to direct light through at least a portion of the lateral extent of the charge generation region; a collection region in the semiconductor substrate, the collection region being configured to collect the charge carriers generated in at least a portion of the lateral extent of the charge generation region, and a readout component in electrical communication with the collection region, the readout component being operable to control an electrical coupling between the charge generation region and the collection region.

A method of clocking an image sensor which eliminates well bounce effects caused by global current flow in large image sensors during frame readout and line transfer is described. During charge transfer operations in which voltages are applied to VCCD gate contacts that are adjacent to the photodiodes, a compensating voltage may be applied to the lightshield that is associated with, and at least partially formed over the photodiode. Depending on polarity, the compensating lightshield pulse allows holes to locally flow from under the VCCD gates to the photodiode P+ pinning region or vice-versa, and in such a manner to eliminate the global flow of hole current. Lightshields may also be biased during electronic shuttering operations.

A solid state imaging device having a light sensing section that performs photoelectric conversion of incident light includes: an insulating layer formed on a light receiving surface of the light sensing section; a layer having negative electric charges formed on the insulating layer; and a hole accumulation layer formed on the light receiving surface of the light sensing section.

Systems, devices, and methods are described for providing, among other things, an intra-oral x-ray imaging system configured to reduce patient exposure to x-rays, reduce amount of scatter, transmission, or re-radiation during imaging, or improve x-ray image quality. In an embodiment, an intra-oral x-ray imaging system includes an intra-oral x-ray sensor configured to communicate intra-oral x-ray sensor position information or intra-oral x-ray sensor orientation information to a remote x-ray source.

Methods of measuring and calibrating the gain of a CCD imaging system are described. Charge injectors may be present on either side of an image sensor array that provide test charges to respective calibration VCCDs. Test charges may be transferred to upper and lower HCCDs during quad-output read out or to only the lower HCCD during dual-output or single-output read out. In each quadrant of the imaging system, test charges may be transferred to an EMCCD output or to a non-EMCCD output via a charge switch based on the magnitude of the test charges. The gains of all EMCCD outputs and non-EMCCD outputs in the imaging system may be calibrated against one another by adjusting the gain at each output when a discrepancy is detected between any two outputs.

A solid-state imaging device includes a pixel having a photoelectric conversion element which generates a charge in response to incident light, a first transfer gate which transfers the charge from the photoelectric conversion element to a charge holding section, and a second transfer gate which transfers the charge from the charge holding section to a floating diffusion. The first transfer gate includes a trench gate structure having at least two trench gate sections embedded in a depth direction of a semiconductor substrate, and the charge holding section includes a semiconductor region positioned between adjacent trench gate sections.

This solid-state imaging device 100 has: a photosensitive part that includes pixel portions 211, which are disposed in a matrix, and charge transfer parts 212 for transferring, by the column, the signal charge of the pixel portions; a plurality of charge storage parts 220 that accumulate the signal charges transferred by the plurality of charge transfer parts of the photosensitive part; a relay part 240 that relays the transfer of the signal charges transferred by the plurality of charge transfer parts to each charge storage part; an output part 230 that outputs the signal charges of the plurality of charge storage parts as electric signals; a first substrate 110 at which the photosensitive unit 210 is formed; and a second substrate 120 at which the charge storage part 220 and output unit 230 are formed. The first substrate and second substrate are stacked together, and the relay part 240 electrically couples the charge transfer parts of the first substrate to the charge storage parts of the second substrate by means of a connecting parts passing through the substrates outside the photosensitive region of the photosensitive part.

Realization of an adequate hole accumulation layer and reduction in dark current are allowed to become mutually compatible. A solid-state imaging device 1 having a light-receiving portion 12 to photoelectrically convert incident light is characterized by including a film 21, which is disposed on a light-receiving surface 12s of the above-described light-receiving portion 12 and which lowers an interface state, and a film 22, which is disposed on the above-described film 21 to lower the interface state and which has a negative fixed charge, wherein a hole accumulation layer 23 is disposed on the light-receiving surface 12s side of the light-receiving portion 12.

Provided are an image sensor and a method of manufacturing the same. The method may include forming a photo-electric conversion region and a charge storage region in a semiconductor layer; forming a transistor on a front surface of the semiconductor layer; forming a recess by etching a portion of the semiconductor layer between the charge storage region and a rear surface of the semiconductor layer; and forming on a bottom surface of the recess a shield film that blocks light incident on the charge storage region.