Patent classifications
H10K2102/361
Light-emitting diode and method for preparing the same
Provided is a light-emitting diode and a method for preparing the same. The light-emitting diode includes an anode, a hole transport layer, a perovskite light-emitting layer, an electron transport layer and a cathode stacked in sequence, in which the perovskite light-emitting layer includes a first sublayer and a second sublayer stacked in sequence, with a material for forming the first sublayer including an inorganic perovskite material, and with a material for forming the second sublayer being an organic perovskite material.
COMPOSITE QUANTUM-DOT OPTICAL FILM AND THE METHOD TO MAKE THE SAME
A composite quantum-dot optical film comprises a quantum-dot layer and a composite structure disposed on the quantum-dot layer, wherein the composite structure comprises a first substrate, a second substrate, and a first barrier layer, wherein each of the first substrate and the second substrate comprises a polymer material, wherein the barrier layer being made of organic material and capable of being water-resistant is disposed between the first substrate and the second substrate.
MICROSTRUCTURE ARRAY AND METHOD OF MANUFACTURING THE SAME AND MICRO-LIGHT-EMITTING DIODE AND METHOD OF MANUFACTURING THE SAME AND DISPLAY DEVICE
A method of manufacturing microstructure array, a microstructure array, a micro-light-emitting diode, and a method for manufacturing the same, and a display device. The method of manufacturing microstructure array includes: preparing a red light-emitting perovskite precursor solution, a green light-emitting perovskite precursor solution, and a blue light-emitting perovskite precursor solution; coating the red light-emitting perovskite precursor solution, the green light-emitting perovskite precursor solution, and the blue light-emitting perovskite precursor solution, on a substrate having partitioned first, second, and third regions to form a red light-emitting perovskite precursor film, a green light-emitting perovskite precursor film, and a blue light-emitting perovskite precursor film, respectively; disposing a mold having a plurality of concave micropatterns on the red light-emitting perovskite precursor film, the green light-emitting perovskite precursor film, and the blue light-emitting perovskite precursor film, respectively; heat-treating the red light-emitting perovskite precursor film, the green light-emitting perovskite precursor film, and the blue light-emitting perovskite precursor film in a plurality of concave micropatterns to obtain each of red light-emitting perovskite nanocrystals, green light-emitting perovskite nanocrystals, and blue light-emitting perovskite nanocrystals, and removing the mold to form a microstructure array.
Curable high refractive index ink compositions and articles prepared from the ink compositions
Curable ink compositions include at least one aromatic (meth)acrylate, at least one multifunctional (meth)acrylate with heteroaromatic groups, fused aromatic groups, heteroalkylene groups, or a group containing both heteroalkylene and aromatic groups, and a photoinitiator. The curable ink composition is Inkjet printable, having a viscosity of 30 centipoise or less at a temperature of from room temperature to 35° C., and is free from solvents. The ink composition, when printed and cured has a refractive index of 1.55 or greater, and is optically clear. The cured ink composition, when cured to a thickness of from 1-16 micrometers, has a surface roughness of less than or equal to 5 nanometers.
FORMULATION COMPRISING A P-TYPE ORGANIC SEMICONDUCTOR MATERIAL AND AN N-TYPE SEMICONDUCTOR MATERIAL
A formulation for preparing organic electronic devices, has: a p-type organic semiconductor polymer including a conjugated aryl polymer, a conjugated heteroaryl compound, or a mixture of at least two of these compounds; an n-type semiconductor material including fullerene, substituted fullerene, or a mixture of at least two of these compounds; and a non-aqueous solvent. The concentration of the p-type organic semiconductor polymer is in the range from 4 mg/mL to 8 mg/mL per milliliter of solvent and the concentration of the p-type organic semiconductor material is in the range from 10 mg/mL to 14 mg/mL per milliliter of solvent.
LIGHT-EMITTING ELEMENT AND METHOD FOR MANUFACTURING SAME
A light-emitting element includes, in order of listing, an anode, an hole transport layer, an emission layer, and a cathode. The light-emitting element includes an reducing material disposed in at least a part between the anode and the hole transport layer, being in contact with the anode and the hole transport layer, and containing a reducing material that reduces a layer having the hole transport layer. The reducing material contains, in a structure of the reducing material, hydrogen either at a concentration ratio of 1 to 1 with resect to a base metal, or at a larger concentration ratio than the base metal.
Light-Emitting Device, Light-Emitting Apparatus, Electronic Appliance, and Lighting Device
A light-emitting device with high resistance to heat in a fabrication process is provided. The light-emitting device includes an EL layer between an anode and a cathode, and the EL layer includes at least a light-emitting layer. The light-emitting device includes, between the light-emitting layer and the cathode, a first layer in contact with the light-emitting layer. The light-emitting layer includes a light-emitting substance, a first organic compound, and a second organic compound. The first layer includes a third organic compound different from the first organic compound and the second organic compound. The light-emitting substance emits green to yellow light. The third organic compound includes a bicarbazole skeleton and a heteroaromatic ring skeleton including one selected from a pyridine ring, a diazine ring, and a triazine ring.
Organic light emitting display device and lighting apparatus for vehicles using the same
Disclosed are an organic light emitting display device and lighting apparatus for vehicles using the same. The organic light emitting display device includes a first layer including a first organic layer and a first emission layer on a first electrode, a second layer including a second emission layer and a second organic layer on the first layer, a second electrode on the second layer, and a third organic layer between the first layer and the second layer. A thickness of the first emission layer is equal to or greater than a thickness of each of the first organic layer and the second organic layer.
Method of fabricating flexible OLED display panel and flexible OLED display panel
A method of fabricating a flexible organic light-emitting diode (OLED) display panel, the method comprising the steps of: step S1, providing a rigid substrate on which a flexible base is formed; step S2, forming a thin film transistor array layer on the flexible base; step S3, forming an OLED display unit on the thin film transistor array layer; step S4, forming an encapsulation layer on the OLED display unit; step S5, forming a protective layer on the encapsulation layer, wherein the protective layer is adhered to a surface of the encapsulation layer away from the OLED display unit by a thermal sensitive adhesive; step S6, peeling off the rigid substrate, and completing a support film to be attached under the flexible base; step S7, removing the protective layer; and step S8, forming a protective cover on the encapsulation layer.
DISPLAY APPARATUS INCLUDING THERMAL SPREADING SHEET
A display apparatus includes a display panel including a display region, a non-display region adjacent to the display region, and a pixel that provides light to the display region, a thermal spreading sheet disposed below the display panel and including a first layer, a second layer, and a third layer, the second layer having a thermal conductivity less than a thermal conductivity of the first layer, and an adhesive layer disposed between the thermal spreading sheet and the display panel and including a light absorbing material. The first layer and the third layer each have a horizontal thermal resistance in a range of about 1 K/J to about 20 K/J, and the second layer has a vertical thermal resistance in a range of about 500 K/J to about 2000 K/J.