Y10S118/11

Automatic pipe doping apparatus

A pipe doping apparatus comprises a bucket assembly including a base and a bucket supported on the base and having an inside volume, a lubricating unit having at least one lubricant applicator inside the bucket; and a source of torque configured to rotate the bucket and/or the lubricating unit relative to a tubular. The apparatus may include a cleaning unit and/or a drying unit and the source of torque may be a fluid jet in either. At least one lubricant applicator may be retractable and may be actuated between a retracted position and an extended position by centripetal force. The apparatus may further include a positioning assembly supporting the base and the rotary bucket assembly and a controller connected to and controlling each of:—the positioning assembly, the cleaning unit, the drying unit, and the lubricating unit.

DEVICE FOR MODIFYING A LINEAR SUBSTRATE
20220305517 · 2022-09-29 ·

An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.

WIPER SYSTEM
20170274411 · 2017-09-28 ·

A wiper system configured to apply and wipe one or more coatings on a rigid tube includes a tapered wiper tapering between a wider end defining an inlet orifice and a narrower end defining an exit orifice. The narrower end of the tapered wiper includes a series of slits arranged circumferentially around the exit orifice. The slits define a series of resilient tabs configured to deflect radially outward when contacted by one or more formations on an outer surface of the rigid tube and configured to return to a neutral position when the one or more formations have passed through the exit orifice. The wiper system may also include a gimbal supporting the tapered wiper. The gimbal is configured to permit the tapered wiper to rotate about first and second mutually perpendicular axes when the tapered wiper is contacted by a bowed rigid tube.

DEVICE FOR MODIFYING A LINEAR SUBSTRATE
20220134376 · 2022-05-05 ·

An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.

DEVICE FOR MODIFYING A LINEAR SUBSTRATE
20220134377 · 2022-05-05 ·

An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.

Device for modifying a linear substrate

An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.

LINEAR SUBSTRATE INFUSION COMPARTMENT

A process of applying a fluid containing one or more additives to a surface of a linear substrate in a linear compartment. The process includes passing the linear substrate through first and second seals of the linear compartment, contacting the linear substrate with the fluid within a chamber within the linear compartment while an exposure gap has a first length that is greater than zero, the contacting being conducted for a time with the fluid at a temperature. The linear compartment is dimensionally reconfigurable, optionally during an infusion process.

Linear substrate processing compartment

Provided are apparatuses for the processing of one or more components of a fluid into the surface of a linear substrate. The apparatuses include a processing barrel having a chamber defined therein as well as a linear substrate inlet and a linear substrate outlet. The processing barrel also includes a fluid inlet and a fluid outlet in fluid communication with the chamber. An exposure gap is defined between the linear substrate inlet and the linear substrate outlet. The chamber is dimensionally reconfigurable so that the exposure gap can have a length from zero to greater than zero.

AUTOMATIC PIPE DOPING APPARATUS
20210187540 · 2021-06-24 ·

A pipe doping apparatus comprises a bucket assembly including a base and a bucket supported on the base and having an inside volume, a lubricating unit having at least one lubricant applicator inside the bucket; and a source of torque configured to rotate the bucket and/or the lubricating unit relative to a tubular. The apparatus may include a cleaning unit and/or a drying unit and the source of torque may be a fluid jet in either. At least one lubricant applicator may be retractable and may be actuated between a retracted position and an extended position by centripetal force. The apparatus may further include a positioning assembly supporting the base and the rotary bucket assembly and a controller connected to and controlling each of:—the positioning assembly, the cleaning unit, the drying unit, and the lubricating unit.

Auto pipe doping apparatus

A pipe doping apparatus comprises a bucket assembly including a base and a bucket supported on the base and having an inside volume, a lubricating unit having at least one lubricant applicator inside the bucket; and a source of torque configured to rotate the bucket and/or the lubricating unit relative to a tubular. The apparatus may include a cleaning unit and/or a drying unit and the source of torque may be a fluid jet in either. At least one lubricant applicator may be retractable and may be actuated between a retracted position and an extended position by centripetal force. The apparatus may further include a positioning assembly supporting the base and the rotary bucket assembly and a controller connected to and controlling each of: the positioning assembly, the cleaning unit, the drying unit, and the lubricating unit.