Y10S118/19

DEVICE FOR MODIFYING A LINEAR SUBSTRATE
20220305517 · 2022-09-29 ·

An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.

Plating adhesion amount control mechanism and method for controlling an adhesion amount by comparing a plating adhesion amount estimation value at an upstream position and a plating adhesion actual amount at a downstream position

When a portion for measuring the plating adhesion amount reaches an upstream side position, plating adhesion amount estimation values are calculated by using a plating adhesion amount estimation expression at positions away from a position that faces the distance sensors, that is, the upstream side position, by strip-width direction distances, of the surfaces of the steel strip. When the portion for measuring the plating adhesion amount reaches a downstream side position, the strip-width direction distances of the plating adhesion amount meters are matched to the strip-width direction distances, and the plating adhesion amount actual measurement values are obtained. The plating adhesion amount estimation expression is corrected on the basis of the differences between the plating adhesion amount estimation values and the plating adhesion amount actual measurement values. Accordingly, the control accuracy of the plating adhesion amount is improved.

DEVICE FOR MODIFYING A LINEAR SUBSTRATE
20220134376 · 2022-05-05 ·

An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.

DEVICE FOR MODIFYING A LINEAR SUBSTRATE
20220134377 · 2022-05-05 ·

An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.

Device for modifying a linear substrate

An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.

LINEAR SUBSTRATE INFUSION COMPARTMENT

A process of applying a fluid containing one or more additives to a surface of a linear substrate in a linear compartment. The process includes passing the linear substrate through first and second seals of the linear compartment, contacting the linear substrate with the fluid within a chamber within the linear compartment while an exposure gap has a first length that is greater than zero, the contacting being conducted for a time with the fluid at a temperature. The linear compartment is dimensionally reconfigurable, optionally during an infusion process.

Linear substrate processing compartment

Provided are apparatuses for the processing of one or more components of a fluid into the surface of a linear substrate. The apparatuses include a processing barrel having a chamber defined therein as well as a linear substrate inlet and a linear substrate outlet. The processing barrel also includes a fluid inlet and a fluid outlet in fluid communication with the chamber. An exposure gap is defined between the linear substrate inlet and the linear substrate outlet. The chamber is dimensionally reconfigurable so that the exposure gap can have a length from zero to greater than zero.

PLATING COATING AMOUNT CONTROL MECHANISM AND PLATING COATING AMOUNT CONTROL METHOD

When a portion for measuring the plating adhesion amount reaches an upstream side position, plating adhesion amount estimation values are calculated by using a plating adhesion amount estimation expression at positions away from a position that faces the distance sensors, that is, the upstream side position, by strip-width direction distances, of the surfaces of the steel strip. When the portion for measuring the plating adhesion amount reaches a downstream side position, the strip-width direction distances of the plating adhesion amount meters are matched to the strip-width direction distances, and the plating adhesion amount actual measurement values are obtained. The plating adhesion amount estimation expression is corrected on the basis of the differences between the plating adhesion amount estimation values and the plating adhesion amount actual measurement values. Accordingly, the control accuracy of the plating adhesion amount is improved.

LINEAR SUBSTRATE INFUSION COMPARTMENT

Provided are apparatuses for the infusion of one or more additives into the surface of a linear substrate. The apparatuses include a processing barrel having an infusion chamber defined therein as well as a linear substrate inlet and a linear substrate outlet. The processing barrel also includes an infusion fluid inlet and an infusion solution outlet in fluid communication with the infusion chamber. The infusion chamber is dimensionally reconfigurable, optionally during an infusion process.

DEVICE FOR MODIFYING A LINEAR SUBSTRATE
20190070629 · 2019-03-07 ·

An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.