A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described.

A fluorine-containing compound represented by the formula 1, ##STR00001## where R.sup.1 is a methyl group or trifluoromethyl group, each of R.sup.2 and R.sup.3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n6, and when at least one of R.sup.1, R.sup.2 and R.sup.3 is in a plural number, the at least one of R.sup.1, R.sup.2 and R.sup.3 may be identical with or different from each other.