Patent classifications
Y
Y10
Y10S
430/00
Y10S430/1053
Y10S430/1055
Y10S430/106
Y10S430/109
Y10S430/109
Radiation-sensitive composition
A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described.