A method for performing laser-ablation printing may include (i) determining an image to be printed on a printing substrate; (ii) ablating a printing material to expel a plurality of ablated printing material particles from a surface of the printing material; (iii) electrically charging the ablated printing material particles; and (iv) accelerating the electrically charged ablated printing material particles toward the printing substrate so that the accelerated particles are deposited on the printing substrate in a pattern that corresponds to the determined image.

A method for performing laser-ablation printing may include (i) determining an image to be printed on a printing substrate; (ii) ablating a printing material to expel a plurality of ablated printing material particles from a surface of the printing material; (iii) electrically charging the ablated printing material particles; and (iv) accelerating the electrically charged ablated printing material particles toward the printing substrate so that the accelerated particles are deposited on the printing substrate in a pattern that corresponds to the determined image.

A process for preparing a subassembly, the process comprising (a) defining the location of one or more grooves for receiving at least one polymer waveguide in a wafer, (b) etching the grooves into the wafer, each groove having sidewalls and a first facet at the terminal end perpendicular to the side walls, the first facet having a first angle relative to the top planar surface, (c) coating the first facet with a reflective material, and (d) disposing a fluid polymer waveguide precursor into each groove, and writing a core into the polymer material by directing at least one laser beam on the first facet by directing the laser beam into the top of the polymer material such that the beam reflects off of the first facet and down the interior of the polymer material to form the core in the polymer waveguide.

A resist composition contains (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, (C) particular an alkali soluble compound, and (D) a solvent.

A resist composition contains (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, (C) particular an alkali soluble compound, and (D) a solvent.

A method for producing a resist composition includes at least a step of filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms into (D) a solvent, through a filter.