An apparatus for imprint lithography can include a logic element configured to generate a fluid droplet pattern of fluid droplets of a formable material to be dispensed onto a substrate. The fluid droplet pattern includes an imprint field, wherein the imprint field has an edge and a drop edge exclusion along the edge. In another aspect, a method can be carried out using the apparatus. The apparatus and method can be useful in filling an imprint field with a formable material relatively quickly without extrusion defects or other complications. The method can include determining a fluid droplet pattern with a first row along the edge of the imprint field having a first linear density and a second row having a second linear density, where the first linear density, the amount of droplets in the first row, is different than a second linear density, amount of droplets within the second row.

A process for obtaining compositions constituted by propolis nanoparticles is disclosed. The nanoparticles are optionally associated to a substance of interest such as active ingredients, and, optionally, substances of secondary effect such as synergists and adjuvants. The process includes preparing a fraction A, which consists of propolis extract dissolved in an organic solvent, to which stabilizer and/or emulsifier may be added, and, optionally, substances of interest and/or of secondary effect; ii) preparing a fraction B, aqueous phase, constituted by: (ii.1) water; or (ii.2) an aqueous solution or dispersion, to which stabilizer and/or emulsifier may be added; (iii) dropping the fraction A onto the fraction B or vice versa; iv) homogenizing the mixture by stirring and spontaneous formation of nanoparticles with average size from 1 to 1000 nm in a dispersion; and v) optionally (v-1) removing organic solvent and/or (v-2) drying the nanodispersion.

A method for depositing high aspect ratio molecular structures (HARMS), which method comprises applying a force upon an aerosol comprising one or more HARM-structures, which force moves one or more HARM-structures based on one or more physical features and/or properties towards one or more predetermined locations for depositing one or more HARM-structures in a pattern by means of an applied force.

A preservation method of a quantum dot and a quantum dot composition are provided. The method includes the following steps. A quantum dot is mixed with a preservative to form a quantum dot composition, wherein the preservative is a long-chain unsaturated compound, and based on the total weight of the quantum dot composition, the content of the quantum dot is 5 wt % to 80 wt %, and the content of the preservative is 20 wt % to 95 wt %. The quantum dot composition is sealed for preservation.

A quantum nanomaterial having a bandgap that may be tuned to enable the quantum nanomaterial to detect IR radiation in selected regions including throughout the MWIR region and into the LWIR region is provided. The quantum nanomaterials may include tin telluride (SnTe) nanomaterials and/or lead tin telluride (Pb.sub.xSn.sub.1-xTe) nanomaterials. Additionally, a method of manufacturing nanomaterial that is tunable for detecting IR radiation in selected regions, such as throughout the MWIR region and into the LWIR region, is also provided.

A preservation method of a quantum dot and a quantum dot composition are provided. The method includes the following steps. A quantum dot is mixed with a preservative to form a quantum dot composition, wherein the preservative is a long-chain unsaturated compound, and based on the total weight of the quantum dot composition, the content of the quantum dot is 5 wt % to 80 wt %, and the content of the preservative is 20 wt % to 95 wt %. The quantum dot composition is sealed for preservation.

A multi-scale manufacturing system comprising a centrally located multi-axis and multi-dimensional first manipulating component associated with a housing for manipulating a substrate and a template, a control subsystem coupled to the first manipulating component for controlling movement thereof, a pre-alignment subsystem for pre-aligning the substrate and the template, an assembly station for applying nanomaterial to the template, an alignment station for aligning the template and the substrate together to form a workpiece assembly, and a transfer subsystem for applying pressure to the workpiece assembly for transferring the nanomaterial from the template to the substrate.

Highly luminescent nanostructures, particularly highly luminescent quantum dots, are provided. The nanostructures have high photoluminescence quantum yields and in certain embodiments emit light at particular wavelengths and have a narrow size distribution. The nanostructures can comprise ligands, including C5-C8 carboxylic acid ligands employed during shell formation and/or dicarboxylic or polycarboxylic acid ligands provided after synthesis. Processes for producing such highly luminescent nanostructures are also provided, including methods for enriching nanostructure cores with indium and techniques for shell synthesis.

A multi-scale manufacturing system comprising a centrally located multi-axis and multi-dimensional first manipulating component associated with a housing for manipulating a substrate and a template, a control subsystem coupled to the first manipulating component for controlling movement thereof, a pre-alignment subsystem for pre-aligning the substrate and the template, an assembly station for applying nanomaterial to the template, an alignment station for aligning the template and the substrate together to form a workpiece assembly, and a transfer subsystem for applying pressure to the workpiece assembly for transferring the nanomaterial from the template to the substrate.

A fungal strain Beauveria species bearing accession number MTCC 5184 is disclosed. The process for the preparation of an enzyme mix including at least one enzyme selected from, but not limited to protease, carbohydrase, and lipase from the disclosed Beauveria species and uses of the enzyme mix in various areas also disclosed.