METHOD FOR MANUFACTURING ELECTROMAGNETIC SHIELDING FILM

Abstract

A method for manufacturing an electromagnetic shielding film comprising providing an insulating layer, wherein the insulating layer is metallized to obtain a silver layer; and painting a conductive adhesive on a surface of the silver layer to form a conductive adhesive layer. The conductive adhesive layer comprises bisphenol A diglycidyl ether with a mass percentage between 9.8% and 10.5%, bisphenol S diglycidyl ether with a mass percentage between 4.54% and 4.86%, bisphenol F diglycidyl ether with a mass percentage between 2.27% and 2.43%, polyamide with a mass percentage between 7.11% and 7.62%, silver copper powder with a mass percentage between 48.6% and 68.3%, and silver strips with a mass percentage between 6.44% and 25.9%.

Claims

1. A method of manufacturing an electromagnetic shielding film, comprising: providing an insulating layer, wherein the insulating layer is metallized to obtain a silver layer; painting a conductive adhesive on a surface of the silver layer to form a conductive adhesive layer; wherein the conductive adhesive layer comprises bisphenol A diglycidyl ether with a mass percentage between 9.8% and 10.5%, bisphenol S diglycidyl ether with a mass percentage between 4.54% and 4.86%, bisphenol F diglycidyl ether with a mass percentage between 2.27% and 2.43%, polyamide with a mass percentage between 7.11% and 7.62%, silver copper powder with a mass percentage between 48.6% and 68.3%, and silver strips with a mass percentage between 6.44% and 25.9%; and wherein the sum of the mass percentages is 100%.

2. The method of claim 1, further comprising: metallizing a copper layer on the surface of the silver layer to form a metal thick layer, after the step of forming the silver layer and before the step of forming the conductive adhesive layer.

3. The method of claim 1, wherein a silverized reagent of the silver layer is silver nanocrystals, and a main catalyst is nanosilver.

4. The method of claim 3, wherein the silverized reagent is silver ion, and the main catalyst comprises AgNO.sub.3, Ag(NH.sub.3).sub.2NO.sub.3, AgClO.sub.4, and AgOAc.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0005] Implementations of the present disclosure will now be described, by way of example only, with reference to the attached figures.

[0006] FIG. 1 is a flowchart showing a method for manufacturing an electromagnetic shielding film in accordance with an embodiment of the present disclosure.

[0007] FIG. 2 is a cross sectional view of an insulating layer of an embodiment of the present disclosure.

[0008] FIG. 3 a cross sectional view of a metallized insulating layer (silver) of an embodiment of the present disclosure.

[0009] FIG. 4 is a top view of a conductive layer formed on the metallized layer of FIG. 3.

[0010] FIG. 5 is a cross sectional view of an electromagnetic shielding film overlaid on a circuit board.

DETAILED DESCRIPTION

[0011] It will be appreciated that for simplicity and clarity of illustration, where appropriate, reference numerals have been repeated among the different figures to indicate corresponding or analogous elements. In addition, numerous specific details are set forth in order to provide a thorough understanding of the embodiments described herein. However, it will be understood by those of ordinary skill in the art that the embodiments described herein can be practiced without these specific details.

[0012] In other instances, methods, procedures, and components have not been described in detail so as not to obscure the related relevant feature being described. Also, the description is not to be considered as limiting the scope of the embodiments described herein. The drawings are not necessarily to scale and the proportions of certain parts may be exaggerated to better illustrate details and features of the present disclosure.

[0013] One definition that applies throughout this disclosure will now be presented.

[0014] The term “substantially” is defined to be essentially conforming to the particular dimension, shape, or other feature that the term modifies, such that the component need not be exact. For example, “substantially rectangular” means that the object resembles a rectangle, but can have one or more deviations from a true rectangle.

[0015] The term “comprising,” when utilized, means “including, but not necessarily limited to”; it specifically indicates open-ended inclusion or membership in the so-described combination, assembly, series, and the like.

[0016] Referring to the FIG. 1, a method for manufacturing an electromagnetic shielding film 100 (shown in FIG. 4) is illustrated. The method is provided by way of example, as there are a variety of ways to carry out the method. Each block shown in the figure represents one or more processes, methods, or subroutines, carried out in the method. Furthermore, the illustrated order of blocks is by example only, and the order of the blocks can change. Additional blocks may be added or fewer blocks may be utilized, without departing from this disclosure. The method can begin at block 101.

[0017] At block 101, referring to the FIG. 2, an insulating layer 10 is provided.

[0018] The insulating layer 10 comprises a first surface and a second surface. Typically, the first surface is an upper surface 12 and the second surface is a lower surface 14. The upper surface 12 and the lower surface 14 are the opposite sides of the insulating layer 10. A thickness of the insulating layer 10 is between 5 and 35 microns. In the embodiment, the insulating layer 10 is made of polyimide (PI).

[0019] At block 102, referring to the FIG. 3, the insulating layer 10 is metallized to obtain a metal layer 20. A thickness of the metal layer 20 ranges from 0.1 to 0.5 microns. In the embodiment, the metal layer 20 is a silver layer. The metallization process uses silver.

[0020] The upper surface 12 is first subjected to a surface treatment to form a metallized surface. The surface treatment comprises any combination of physical oxidation, chemical oxidation, chemical grafting, electrical grafting, photochemical grafting, and silanization modification. The metallization treatment may be any one of electrostatic adsorption or electroless plating.

[0021] When the electrostatic adsorption is used, the reactants added are silver nanocrystals (AgNPs), and main component of the catalyst is nano silver single substance. The upper surface 12 adsorbs AgNPs by charge modification to form the metal layer 20.

[0022] When an ion reaction is used, the added reactant is silver ion, and the main components of the catalyst are AgNO.sub.3, Ag(NH.sub.3).sub.2NO.sub.3, AgClO.sub.4, AgOAc. The upper surface 12 adsorbs silver ions by way of charge modification and forms a metal layer 20 on the upper surface 12 through a series of reduction reactions.

[0023] In other embodiments, when the ion reaction is used, the added reactants are silver ions and copper ions. The main components of the catalyst are AgNO.sub.3 and CuCl.sub.2, and the upper surface 12 adsorbs silver ions and copper ions through charge modification, and then a copper-silver alloy is formed on the upper surface 12 through a series of reduction reactions, to form the metal layer 20.

[0024] In other embodiments, a copper layer may be further applied on the metal layer 20 to form a thicker metal layer (not shown).

[0025] At block 103, referring to the FIG. 4, a conductive adhesive is applied on the surface of the metal layer 20 to form a conductive adhesive layer 30, thereby forming an electromagnetic shielding film 100.

[0026] A thickness of the conductive adhesive layer 30 ranges from 8 to 40 microns. In the embodiment, the conductive adhesive layer 30 comprises bisphenol A diglycidyl ether with a mass percentage between 9.8% and 10.5%, bisphenol S diglycidyl ether with a mass percentage between 4.54% and 4.86%, bisphenol F diglycidyl ether with a mass percentage between 2.27% and 2.43%, polyamide with a mass percentage between 7.11% and 7.62%, silver copper powder with a mass percentage between 48.6% and 68.3%, and strips with a mass percentage between 6.44 and 25.9%. The strips are made of silver.

[0027] Among the above, the bisphenol A diglycidyl ether is configured to increase the connectivity, flexibility, and chemical resistance of the conductive adhesive layer 30. The bisphenol S diglycidyl ether is configured to increase the connectivity and heat resistance of the conductive adhesive layer 30. The bisphenol F diglycidyl ether acts as a bifunctional diluent. The polyamide is configured as a curing agent. In other embodiments, dicyandiamide may also be selected as a curing agent. The silver copper powder and the silver strips all play a role in conducting electricity. The higher the content of the silver copper powder and the silver strips, the lower the resistivity of the conductive adhesive layer 30. However, an excessive amount of the powder may cause unsatisfactory dispersion of the conductive adhesive layer 30, and poor printing operation performance. Therefore, the content of the silver copper powder is suggested to be maintained between 48.6% and 68.3%, and the silver strips content is between 6.44% and 25.9%.

[0028] The following table shows three examples of the conductive adhesive layer 30 that have been tested to meet the goals described above.

TABLE-US-00001 EXAMPLE EXAMPLE EXAMPLE Range of EXAMPLE I II III Ratio DGEBA(Bisphenol 6.5 g 6.5 g 6.5 g 10.0 ± 0.3 wt % A diglycidyl ether) DGEBS (Bisphenol 3.0 g 3.0 g 3.0 g 4.7 ± 0.13 wt % S diglycidyl ether) BEF-170(Bisphenol 1.5 g 1.5 g 1.5 g 2.3 ± 0.13 wt % F diglycidyl ether) Polyamide 4.7 g 4.7 g 4.7 g  7.4 ± 0.3 wt % Silver copper powder 42.4 g  42.4 g  30.0 g 53.3 ± 15.0 wt %  Silver strip 4.0 g 8.0 g 16 g 16.0 ± 10.0 wt %  Total 62.1 g  66.1 g  61.7 g 100%

[0029] The bisphenol A diglycidyl ether, bisphenol S diglycidyl ether, bisphenol F diglycidyl ether, polyamide, silver copper powder, and silver tablets are mixed and dissolved in a solvent to form the conductive adhesive layer 30.

[0030] To satisfy the range of the proportions of each component, the parameter weight of the example can be adjusted, and is not limited thereto.

[0031] Referring to FIG. 4, the electromagnetic shielding film 100 comprises the insulating layer 10, the metal layer 20, and the conductive adhesive layer 30. The insulating layer 10 is made of polyimide. The metal layer 20 is formed on the surface of the insulating layer 10. The chemical composition of the metal layer 20 is silver. The conductive adhesive layer 30 is coated on the surface of the metal layer 20. A thickness of the electromagnetic shielding film 100 is maintained between 13 and 75 microns. The transverse tensile strength of the electromagnetic shielding film 100 is greater than 160 MPa, and the longitudinal tensile strength is greater than 130 MPa. The electromagnetic shielding film 100 can be extended between 60 and 120%. The peeling strength of the electromagnetic shielding film 100 is greater than 0.6 kg/cm. The bending limit of the electromagnetic shielding film 100 is more than 10,000 times.

[0032] Referring to FIG. 5, the electromagnetic shielding film 100 is applied to a circuit board 200 having a high drop. The circuit board 200 has a height difference, the distance is greater than 0.8 mm, and the height d is in the range of 0-100 microns. The electromagnetic shielding film 100 is attached to the circuit board 200 and covers the height difference. At this time, the conductive adhesive layer 30 is attached to the surface of the circuit board 200, and the insulating layer 10 faces away from the circuit board 200. After the electromagnetic shielding film 100 is laid on the circuit board 200, the thickness of the insulating layer is maintained between 5 and 35 microns, and the thickness of the metal layer is maintained between 0.1 and 0.5 microns. The thickness of the conductive adhesive layer is maintained between 8 and 40 microns.

[0033] The electromagnetic shielding film 100 is manufactured by metallizing silver and copper on the insulating layer 10 (polyimide) after applying the coating of conductive adhesive. The electromagnetic shielding film 100 uses the insulating layer 10 as an outer protective layer, the film 100 has good peel strength, softness, and low rebound force, so it will not crack or generate bubbles in a product component. In addition, since the elongation rate of polyimide is between 70 and 90%. High tear strength of polyimide makes it less prone to breaking during tear-off of release papers. Furthermore, PI has lower water absorption (0.3-0.4%).

[0034] The embodiments shown and described above are only examples. Many other details are often found in the art. Therefore, many such details are neither shown nor described. Even though numerous characteristics and advantages of the present disclosure have been set forth in the foregoing description, together with details of the structure and function of the present disclosure, the disclosure is illustrative only, and changes may be made in the detail, especially in matters of shape, size, and arrangement of the parts within the principles of the present disclosure, up to and including the full extent established by the broad general meaning of the terms used in the claims. It will therefore be appreciated that the embodiments described above may be modified within the scope of the claims.